Inventor · disambiguated record
Katsuya Fukae
Also filed as: FUKAE KATSUYA
5 granted patents·4 pending applications·14 citations·filing 2001–2022
72Inventor score
Top patents by PatentIndex Score
9 records- 0184US7919141B2Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articlesKANTO DENKA KOGYO KK·Filed 2005·Granted Apr 5, 2011·8 cites·26 claims
- 0272US11814726B2Dry etching method or dry cleaning methodKANTO DENKA KOGYO KK·Filed 2022·Granted Nov 14, 2023·0 cites·12 claims
- 0371US11584989B2Dry etching method or dry cleaning methodKANTO DENKA KOGYO KK·Filed 2018·Granted Feb 21, 2023·1 cites·16 claims
- 0456US2023109353A1Fluorine-containing copolymer compositionKANTO DENKA KOGYO KK·Filed 2021·Application pending·0 cites
- 0554US6787053B2Cleaning gases and etching gasesASAHI GLASS CO LTD·Filed 2001·Granted Sep 7, 2004·5 cites·27 claims
- 0653US2010206480A1Processes and equipments for preparing f2-containing gases, as well as processes and equipments for modifying the surfaces of articlesKANTO DENKA KOGYO KK·Filed 2010·Application pending·0 cites
- 0748US11183393B2Atomic layer etching using acid halideKANTO DENKA KOGYO KK·Filed 2018·Granted Nov 23, 2021·0 cites·7 claims
- 0834US2021285100A1Method for cleaning semiconductor production chamberNAT UNIV CORP YOKOHAMA NAT UNIV·Filed 2017·Application pending·0 cites
- 0932US2003143846A1Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon- containing compoundsFiled 2001·Application pending·0 cites
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