Inventor · disambiguated record
Natsuyo Morioka
Also filed as: MORIOKA NATSUYO
6 granted patents·5 pending applications·122 citations·filing 1999–2009
85Inventor score
Top patents by PatentIndex Score
11 records- 0188US7601240B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2006·Granted Oct 13, 2009·9 cites·2 claims
- 0283US6611728B1Inspection system and method for manufacturing electronic devices using the inspection systemHITACHI LTD·Filed 1999·Granted Aug 26, 2003·71 cites·17 claims
- 0382US6733618B2Disturbance-free, recipe-controlled plasma processing system and methodHITACHI LTD·Filed 2001·Granted May 11, 2004·18 cites·9 claims
- 0476US6881352B2Disturbance-free, recipe-controlled plasma processing methodHITACHI LTD·Filed 2003·Granted Apr 19, 2005·12 cites·3 claims
- 0575US7945410B2Semiconductor device yield prediction system and methodHITACHI LTD·Filed 2007·Granted May 17, 2011·8 cites·5 claims
- 0657US2009120580A1Disturbance-Free, Recipe-Controlled Plasma Processing System And MethodKAGOSHIMA AKIRA·Filed 2009·Application pending·0 cites
- 0756US6916396B2Etching system and etching methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jul 12, 2005·4 cites·12 claims
- 0853US2007193687A1Disturbance-free, recipe-controlled plasma processing system and methodKAGOSHIMA AKIRA·Filed 2007·Application pending·0 cites
- 0946US2005236364A1Etching system and etching methodKAGOSHIMA AKIRA·Filed 2005·Application pending·0 cites
- 1045US2005022932A1Disturbance-free, recipe-controlled plasma processing system and methodFiled 2004·Application pending·0 cites
- 1138US2004060659A1Etching system and etching methodFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →