Inventor · disambiguated record
Akitaka Shimizu
Also filed as: SHIMIZU AKITAKA
40 granted patents·22 pending applications·142 citations·filing 2002–2021
96Inventor score
Top patents by PatentIndex Score
62 records- 0196US8236109B2Component cleaning method and storage mediumMORIYA TSUYOSHI·Filed 2009·Granted Aug 7, 2012·43 cites·12 claims
- 0295US11557486B2Etching method, damage layer removal method, and storage mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jan 17, 2023·3 cites·20 claims
- 0392US10541145B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Jan 21, 2020·8 cites·18 claims
- 0489US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 0588US9245776B2Plasma processing apparatusHIMORI SHINJI·Filed 2010·Granted Jan 26, 2016·9 cites·18 claims
- 0686US7811939B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 12, 2010·12 cites·14 claims
- 0783US10053773B2Method of cleaning plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 21, 2018·3 cites·13 claims
- 0882US7514277B2Etching method and apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Apr 7, 2009·6 cites·6 claims
- 0980US7527016B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 5, 2009·16 cites·11 claims
- 1077US10903083B2Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·2 cites·9 claims
- 1177US7871532B2Plasma processing method and post-processing methodTOKYO ELECTRON LTD·Filed 2006·Granted Jan 18, 2011·6 cites·12 claims
- 1271US9208997B2Method of etching copper layer and maskTOKYO ELECTRON LTD·Filed 2013·Granted Dec 8, 2015·2 cites·3 claims
- 1370US8642136B2Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition processKUSHIBIKI MASATO·Filed 2009·Granted Feb 4, 2014·3 cites·5 claims
- 1470US7604908B2Fine pattern forming methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 20, 2009·3 cites·12 claims
- 1569US10734201B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·1 cites·8 claims
- 1669US9984892B2Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming systemTOKYO ELECTRON LTD·Filed 2017·Granted May 29, 2018·1 cites·14 claims
- 1769US9214364B2Substrate cleaning apparatus and vacuum processing systemDOBASHI KAZUYA·Filed 2012·Granted Dec 15, 2015·3 cites·13 claims
- 1866US8383517B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Feb 26, 2013·2 cites·9 claims
- 1964US7432172B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2006·Granted Oct 7, 2008·2 cites·14 claims
- 2063US9139901B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 22, 2015·1 cites·13 claims
- 2161US10975468B2Method of cleaning plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 13, 2021·0 cites·6 claims
- 2260US12237173B2Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Feb 25, 2025·0 cites·5 claims
- 2359US11328904B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 10, 2022·0 cites·5 claims
- 2459USRE43652ESubstrate processing control method and storage mediumSAITO SUSUMU·Filed 2011·Granted Sep 11, 2012·1 cites·8 claims
- 2558US10985029B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 20, 2021·0 cites·17 claims
- 2656US10923329B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Feb 16, 2021·0 cites·14 claims
- 2756US7824931B2Substrate processing control method and storage mediumTOKYO ELECTRON LTD·Filed 2009·Granted Nov 2, 2010·0 cites·8 claims
- 2856US2007227663A1Substrate processing apparatus and side wall componentTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2954US12165848B2Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistorTOKYO ELECTRON LTD·Filed 2020·Granted Dec 10, 2024·0 cites·20 claims
- 3054US2007221258A1Etching method and apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3153US2009206053A1Plasma etching method, plasma etching apparatus, control program and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3252US11024514B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jun 1, 2021·0 cites·16 claims
- 3352US2015132970A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3452US2013295774A1Plasma etching methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3551US12500091B2Etching method, method of removing etching residue, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Granted Dec 16, 2025·0 cites·27 claims
- 3650US2012037314A1Substrate processing apparatus and side wall componentENDOH SHOSUKE·Filed 2011·Application pending·0 cites
- 3750US2006132318A1Self-propelled cleaner and self-propelled traveling apparatusFUNAI ELECTRIC CO·Filed 2005·Application pending·0 cites
- 3849US2011217796A1Etching method and apparatusTOKYO ELECTRON LIMTED·Filed 2011·Application pending·0 cites
- 3948US2022189783A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4048US2006037170A1Self-propelling cleanerFUNAI ELECTRIC CO·Filed 2005·Application pending·0 cites
- 4148US2011220609A1Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 4247US2007187363A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 4347US2006088204A1Cleaner with security function and travel device with security functionFUNAI ELECTRIC CO·Filed 2005·Application pending·0 cites
- 4447US2023124597A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4545US7256135B2Etching method and computer storage medium storing program for controlling sameTOKYO ELECTRON LTD·Filed 2004·Granted Aug 14, 2007·1 cites·15 claims
- 4644US11443952B2Etching method and etching deviceTOKYO ELECTRON LTD·Filed 2018·Granted Sep 13, 2022·0 cites·19 claims
- 4744US10254669B2Method for manufacturing toner for electrostatic image developmentKAO CORP·Filed 2015·Granted Apr 9, 2019·0 cites·18 claims
- 4844US7897498B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·0 cites·9 claims
- 4944US7179752B2Dry etching methodTOKYO ELECTRON LTD·Filed 2002·Granted Feb 20, 2007·1 cites·10 claims
- 5044US2014284308A1Plasma etching method and plasma etching apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
Showing the top 50 of 62 patent records by PatentIndex Score.
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