Inventor · disambiguated record
Hideto Tateno
Also filed as: TATENO HIDETO
23 granted patents·7 pending applications·132 citations·filing 2014–2024
94Inventor score
Top patents by PatentIndex Score
30 records- 0193US11869764B2Substrate processing apparatus, substrate processing method and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Granted Jan 9, 2024·1 cites·15 claims
- 0292US11476112B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Oct 18, 2022·6 cites·10 claims
- 0390USD741823SVaporizer for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2014·Granted Oct 27, 2015·49 cites·1 claims
- 0486US9190299B2Apparatus for manufacturing semiconductor device, method of manufacturing semiconductor device, and recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Nov 17, 2015·7 cites·14 claims
- 0585US9816182B2Substrate processing apparatus, method for manufacturing semiconductor device, and recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Granted Nov 14, 2017·6 cites·10 claims
- 0682US12368043B2Substrate processing apparatus, processing method, and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2023·Granted Jul 22, 2025·0 cites·19 claims
- 0780US9587313B2Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Granted Mar 7, 2017·3 cites·14 claims
- 0875US9793112B2Method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2016·Granted Oct 17, 2017·2 cites·11 claims
- 0972USD788038SHeat insulating unit for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted May 30, 2017·14 cites·1 claims
- 1069US12087598B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2018·Granted Sep 10, 2024·1 cites·17 claims
- 1167US2023041284A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2022·Application pending·0 cites
- 1264USD778458SReaction tubeHITACHI INT ELECTRIC INC·Filed 2015·Granted Feb 7, 2017·10 cites·1 claims
- 1361USD788706SHeat insulating unit for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Jun 6, 2017·9 cites·1 claims
- 1460US2023193465A1Substrate processing method, method of manufacturing semiconductor device and substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2023·Application pending·0 cites
- 1560US2024186156A1Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1659US11499224B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Nov 15, 2022·0 cites·14 claims
- 1759USD778457SReaction tubeHITACHI INT ELECTRIC INC·Filed 2015·Granted Feb 7, 2017·8 cites·1 claims
- 1858USD1053156SFurnace for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2022·Granted Dec 3, 2024·2 cites·1 claims
- 1958US9502239B2Substrate processing method, substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Granted Nov 22, 2016·1 cites·5 claims
- 2053US12334401B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2021·Granted Jun 17, 2025·0 cites·15 claims
- 2153USD788705SHeat insulating unit for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Jun 6, 2017·6 cites·1 claims
- 2249USD1070797SFurnace for substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2022·Granted Apr 15, 2025·1 cites·1 claims
- 2346USD788704SHeat insulating unit for substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Jun 6, 2017·4 cites·1 claims
- 2445US11538716B2Substrate processing apparatus, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Dec 27, 2022·0 cites·9 claims
- 2544US2014302687A1Substrate Processing Device, Method for Manufacturing Semiconductor Device, and VaporizerHITACHI INT ELECTRIC INC·Filed 2014·Application pending·0 cites
- 2643US2014235068A1Method of manufacturing semiconductor device, apparatus for manufacturing semiconductor device, and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Application pending·0 cites
- 2740US2019003047A1Vaporizer and Substrate Processing ApparatusKOKUSAI ELECTRIC CORP·Filed 2018·Application pending·0 cites
- 2838USD837706SExhaust pipeHITACHI INT ELECTRIC INC·Filed 2016·Granted Jan 8, 2019·2 cites·1 claims
- 2934US2016002789A1Substrate processing apparatus, method for manufacturing semiconductor device, and recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
- 3029USD813065SGas sampling cellHITACHI INT ELECTRIC INC·Filed 2016·Granted Mar 20, 2018·0 cites·1 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →