Inventor · disambiguated record
Don Powell
Also filed as: POWELL DON · POWELL DON C · POWELL DON CARL
53 granted patents·8 pending applications·814 citations·filing 1998–2014
99Inventor score
Files withMICRON TECHNOLOGY INC54AFRICA ROBERT1DEBOER SCOTT J1INSULATION TECHNOLOGY CORP1MERCALDI GARRY A1
Top patents by PatentIndex Score
61 records- 0199US6348380B1Use of dilute steam ambient for improvement of flash devicesMICRON TECHNOLOGY INC·Filed 2000·Granted Feb 19, 2002·325 cites·35 claims
- 0295US7245010B2System and device including a barrier layerMICRON TECHNOLOGY INC·Filed 2005·Granted Jul 17, 2007·20 cites·2 claims
- 0390US6617624B2Metal gate electrode stack with a passivating metal nitride layerMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 9, 2003·44 cites·10 claims
- 0490US6475883B2Method for forming a barrier layerMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 5, 2002·29 cites·22 claims
- 0590US6458714B1Method of selective oxidation in semiconductor manufactureMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 1, 2002·53 cites·53 claims
- 0690US6410968B1Semiconductor device with barrier layerMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 25, 2002·31 cites·11 claims
- 0788US7015151B2Transistor fabrication methods comprising selective wet oxidationMICRON TECHNOLOGY INC·Filed 2005·Granted Mar 21, 2006·10 cites·26 claims
- 0887US7678678B2Method to chemically remove metal impurities from polycide gate sidewallsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 16, 2010·8 cites·25 claims
- 0987US6471780B1Process for fabricating films of uniform properties on semiconductor devicesMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 29, 2002·21 cites·27 claims
- 1086US7129188B2Transistor fabrication methodsMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 31, 2006·8 cites·26 claims
- 1182US6265297B1Ammonia passivation of metal gate electrodes to inhibit oxidation of metalMICRON TECHNOLOGY INC·Filed 1999·Granted Jul 24, 2001·50 cites·28 claims
- 1277US6734531B2Use of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2003·Granted May 11, 2004·13 cites·32 claims
- 1375US6576979B2Use of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2002·Granted Jun 10, 2003·11 cites·20 claims
- 1475US6555487B1Method of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2000·Granted Apr 29, 2003·12 cites·49 claims
- 1574US7092233B2Capacitor electrode having an interface layer of different chemical composition formed on a bulk layerMICRON TECHNOLOGY INC·Filed 2005·Granted Aug 15, 2006·4 cites·15 claims
- 1674US6890867B2Transistor fabrication methods comprising selective wet-oxidationMICRON TECHNOLOGY INC·Filed 2003·Granted May 10, 2005·12 cites·75 claims
- 1773US6670231B2Method of forming a dielectric layer in a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2002·Granted Dec 30, 2003·10 cites·9 claims
- 1873US6649278B2Process for fabricating films of uniform properties on semiconductor devicesMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 18, 2003·7 cites·29 claims
- 1972US6949789B2Use of dilute steam ambient for improvement of flash devicesMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 27, 2005·10 cites·19 claims
- 2072US6620742B2In-situ use of dichloroethene and NH3 in an H2O steam based oxidation system to provide a source of chlorineMICRON TECHNOLOGY INC·Filed 2002·Granted Sep 16, 2003·14 cites·11 claims
- 2168US7235497B2Selective oxidation methods and transistor fabrication methodsMICRON TECHNOLOGY INC·Filed 2003·Granted Jun 26, 2007·11 cites·51 claims
- 2267US6423617B1In-situ use of dichloroethene and NH3 in an H2O steam based oxidation system to provide a source of chlorineMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 23, 2002·11 cites·9 claims
- 2365US8429765B2Breatheable padding for cycling glovesAFRICA ROBERT·Filed 2005·Granted Apr 30, 2013·8 cites·5 claims
- 2465US8294192B2Use of dilute steam ambient for improvement of flash devicesWEIMER RONALD A·Filed 2011·Granted Oct 23, 2012·1 cites·14 claims
- 2565US7060514B2Process for fabricating films of uniform properties on semiconductor devicesMICRON TECHNOLOGY INC·Filed 2004·Granted Jun 13, 2006·4 cites·28 claims
- 2664US7358171B2Method to chemically remove metal impurities from polycide gate sidewallsMICRON TECHNOLOGY INC·Filed 2001·Granted Apr 15, 2008·6 cites·16 claims
- 2764US6787479B2Method for producing water for use in manufacturing semiconductorsMICRON TECHNOLOGY INC·Filed 2002·Granted Sep 7, 2004·5 cites·14 claims
- 2863US6784124B2Methods of selective oxidation conditions for dielectric conditioningMICRON TECHNOLOGY INC·Filed 2003·Granted Aug 31, 2004·5 cites·51 claims
- 2962US9334661B2Insulation blowing machineINSULATION TECHNOLOGY CORP·Filed 2014·Granted May 10, 2016·5 cites·3 claims
- 3062US6537677B1Process for fabricating films of uniform properties on semiconductor devicesMICRON TECHNOLOGY INC·Filed 1999·Granted Mar 25, 2003·13 cites·49 claims
- 3162US6440382B1Method for producing water for use in manufacturing semiconductorsMICRON TECHNOLOGY INC·Filed 1999·Granted Aug 27, 2002·16 cites·18 claims
- 3261US7651956B1Process for fabricating films of uniform properties on semiconductor devicesMICRON TECHNOLOGY INC·Filed 2000·Granted Jan 26, 2010·3 cites·53 claims
- 3359US6576964B1Dielectric layer for a semiconductor device having less current leakage and increased capacitanceMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 10, 2003·4 cites·16 claims
- 3458US6774443B2System and device including a barrier layerMICRON TECHNOLOGY INC·Filed 2002·Granted Aug 10, 2004·3 cites·11 claims
- 3557US7989870B2Use of dilute steam ambient for improvement of flash devicesMICRON TECHNOLOGY INC·Filed 2009·Granted Aug 2, 2011·0 cites·18 claims
- 3657US7071117B2Semiconductor devices and methods for depositing a dielectric filmMICRON TECHNOLOGY INC·Filed 2004·Granted Jul 4, 2006·4 cites·39 claims
- 3757US6837938B2Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates thereinMICRON TECHNOLOGY INC·Filed 2003·Granted Jan 4, 2005·2 cites·15 claims
- 3855US6825522B1Capacitor electrode having an interface layer of different chemical composition formed on a bulk layerMICRON TECHNOLOGY INC·Filed 2000·Granted Nov 30, 2004·4 cites·9 claims
- 3954US7585725B2Use of dilute steam ambient for improvement of flash devicesMICRON TECHNOLOGY INC·Filed 2008·Granted Sep 8, 2009·0 cites·20 claims
- 4054US7015111B2Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2003·Granted Mar 21, 2006·3 cites·15 claims
- 4154US2006261415A1Method to chemically remove metal impurities from polycide gate sidewallsMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 4254US2006175673A1System and device including a barrier layerPOWELL DON C·Filed 2006·Application pending·0 cites
- 4354US2006000414A1Semiconductor processing equipment for forming films of uniform properties on semiconductor substratesMERCALDI GARRY A·Filed 2005·Application pending·0 cites
- 4452US7429514B2Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor deviceMICRON TECHNOLOGY INC·Filed 2006·Granted Sep 30, 2008·0 cites·20 claims
- 4552US7247584B2System and method for selectively increasing surface temperature of an objectMICRON TECHNOLOGY INC·Filed 2004·Granted Jul 24, 2007·2 cites·26 claims
- 4651US2006246658A1A capacitor electrode having an interface layer of different chemical composition formed on a bulk layerDEBOER SCOTT J·Filed 2006·Application pending·0 cites
- 4750US7432546B2Apparatus having a memory device with floating gate layer grain boundaries with oxidized portionsMICRON TECHNOLOGY INC·Filed 2005·Granted Oct 7, 2008·0 cites·23 claims
- 4850US2006148269A1Semiconductor devices and methods for depositing a dielectric filmMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 4947US7442655B2Selective oxidation methods and transistor fabrication methodsMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 28, 2008·0 cites·16 claims
- 5047US7071120B2Method for producing water for use in manufacturing semiconductorsMICRON TECHNOLOGY INC·Filed 2003·Granted Jul 4, 2006·0 cites·18 claims
Showing the top 50 of 61 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →