Inventor · disambiguated record
Christopher Dennis Bencher
Also filed as: BENCHER CHRISTOPHER · BENCHER CHRISTOPHER D · BENCHER CHRISTOPHER DENNIS
105 granted patents·31 pending applications·4,066 citations·filing 1998–2025
99Inventor score
Files withAPPLIED MATERIALS INC124BENCHER CHRISTOPHER D3BALSEANU MIHAELA1BENCHER CHRISTOPHER DENNIS1CHEN HUI W1
Top patents by PatentIndex Score
136 records- 0199US7807578B2Frequency doubling using spacer maskAPPLIED MATERIALS INC·Filed 2007·Granted Oct 5, 2010·774 cites·10 claims
- 0299US6924191B2Method for fabricating a gate structure of a field effect transistorAPPLIED MATERIALS INC·Filed 2003·Granted Aug 2, 2005·452 cites·20 claims
- 0399US6541397B1Removable amorphous carbon CMP stopAPPLIED MATERIALS INC·Filed 2002·Granted Apr 1, 2003·360 cites·22 claims
- 0498US6573030B1Method for depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2000·Granted Jun 3, 2003·1.3k cites·129 claims
- 0597US10571809B1Half tone scheme for maskless lithographyAPPLIED MATERIALS INC·Filed 2019·Granted Feb 25, 2020·9 cites·20 claims
- 0697US9377692B2Electric/magnetic field guided acid diffusionAPPLIED MATERIALS INC·Filed 2014·Granted Jun 28, 2016·18 cites·12 claims
- 0797US7709396B2Integral patterning of large features along with array using spacer mask patterning process flowAPPLIED MATERIALS INC·Filed 2008·Granted May 4, 2010·115 cites·22 claims
- 0896US12117732B2Image stabilization for digital lithographyAPPLIED MATERIALS INC·Filed 2020·Granted Oct 15, 2024·3 cites·15 claims
- 0996US6780753B2Airgap for semiconductor devicesAPPLIED MATERIALS INC·Filed 2002·Granted Aug 24, 2004·126 cites·18 claims
- 1095US10503076B1Reserving spatial light modulator sections to address field non-uniformitiesAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·4 cites·19 claims
- 1195US7335462B2Method of depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2007·Granted Feb 26, 2008·24 cites·20 claims
- 1295US6841341B2Method of depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2002·Granted Jan 11, 2005·78 cites·19 claims
- 1394US9798240B2Controlling photo acid diffusion in lithography processesAPPLIED MATERIALS INC·Filed 2014·Granted Oct 24, 2017·7 cites·12 claims
- 1494US7811924B2Air gap formation and integration using a patterning capAPPLIED MATERIALS INC·Filed 2008·Granted Oct 12, 2010·28 cites·18 claims
- 1593US10416550B2Method to reduce line wavinessAPPLIED MATERIALS INC·Filed 2018·Granted Sep 17, 2019·3 cites·20 claims
- 1693US9791786B1Method to reduce line wavinessAPPLIED MATERIALS INC·Filed 2016·Granted Oct 17, 2017·4 cites·20 claims
- 1793US7332262B2Photolithography scheme using a silicon containing resistAPPLIED MATERIALS INC·Filed 2005·Granted Feb 19, 2008·23 cites·20 claims
- 1893US7223526B2Method of depositing an amorphous carbon layerAPPLIED MATERIALS INC·Filed 2004·Granted May 29, 2007·50 cites·20 claims
- 1993US6355571B1Method and apparatus for reducing copper oxidation and contamination in a semiconductor deviceAPPLIED MATERIALS INC·Filed 1999·Granted Mar 12, 2002·98 cites·14 claims
- 2092US9748148B2Localized stress modulation for overlay and EPEAPPLIED MATERIALS INC·Filed 2015·Granted Aug 29, 2017·8 cites·15 claims
- 2192US9411237B2Resist hardening and development processes for semiconductor device manufacturingAPPLIED MATERIALS INC·Filed 2014·Granted Aug 9, 2016·11 cites·18 claims
- 2292US8148269B2Boron nitride and boron-nitride derived materials deposition methodBALSEANU MIHAELA·Filed 2009·Granted Apr 3, 2012·22 cites·5 claims
- 2392US7718081B2Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemesAPPLIED MATERIALS INC·Filed 2006·Granted May 18, 2010·17 cites·20 claims
- 2492US6365518B1Method of processing a substrate in a processing chamberAPPLIED MATERIALS INC·Filed 2001·Granted Apr 2, 2002·95 cites·31 claims
- 2591US9478421B2Optically tuned hardmask for multi-patterning applicationsAPPLIED MATERIALS INC·Filed 2015·Granted Oct 25, 2016·6 cites·13 claims
- 2691US6852647B2Removable amorphous carbon CMP stopAPPLIED MATERIALS INC·Filed 2003·Granted Feb 8, 2005·35 cites·22 claims
- 2790US12224272B2Manufacturing micro-LED displays to reduce subpixel crosstalkAPPLIED MATERIALS INC·Filed 2022·Granted Feb 11, 2025·1 cites·15 claims
- 2890US10256382B2Collimated OLED light field displayAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·5 cites·19 claims
- 2989US11899198B2Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systemsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 13, 2024·1 cites·20 claims
- 3089US9177796B2Optically tuned hardmask for multi-patterning applicationsAPPLIED MATERIALS INC·Filed 2014·Granted Nov 3, 2015·7 cites·12 claims
- 3188US6967072B2Photolithography scheme using a silicon containing resistAPPLIED MATERIALS INC·Filed 2001·Granted Nov 22, 2005·41 cites·49 claims
- 3288US6946401B2Plasma treatment for copper oxide reductionAPPLIED MATERIALS INC·Filed 2003·Granted Sep 20, 2005·28 cites·13 claims
- 3386US10495979B1Half tone scheme for maskless lithographyAPPLIED MATERIALS INC·Filed 2019·Granted Dec 3, 2019·2 cites·20 claims
- 3486US6927178B2Nitrogen-free dielectric anti-reflective coating and hardmaskAPPLIED MATERIALS INC·Filed 2003·Granted Aug 9, 2005·32 cites·20 claims
- 3586US6853043B2Nitrogen-free antireflective coating for use with photolithographic patterningAPPLIED MATERIALS INC·Filed 2002·Granted Feb 8, 2005·41 cites·32 claims
- 3686US6635583B2Silicon carbide deposition for use as a low-dielectric constant anti-reflective coatingAPPLIED MATERIALS INC·Filed 1998·Granted Oct 21, 2003·72 cites·19 claims
- 3785US12372779B2Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systemsAPPLIED MATERIALS INC·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 3885US9484274B2Methods for reducing semiconductor substrate strain variationAPPLIED MATERIALS INC·Filed 2015·Granted Nov 1, 2016·6 cites·20 claims
- 3984US8084310B2Self-aligned multi-patterning for advanced critical dimension contactsMEBARKI BENCHERKI·Filed 2009·Granted Dec 27, 2011·11 cites·16 claims
- 4084US2025021016A1Image stabilization for digital lithographyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4183US12243864B2Micro-LED displays to reduce subpixel crosstalkAPPLIED MATERIALS INC·Filed 2023·Granted Mar 4, 2025·0 cites·11 claims
- 4283US9915621B2Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereofAPPLIED MATERIALS INC·Filed 2014·Granted Mar 13, 2018·4 cites·12 claims
- 4383US8357618B2Frequency doubling using a photo-resist template maskAPPLIED MATERIALS INC·Filed 2008·Granted Jan 22, 2013·9 cites·20 claims
- 4482US10474041B1Digital lithography with extended depth of focusAPPLIED MATERIALS INC·Filed 2019·Granted Nov 12, 2019·3 cites·20 claims
- 4581US9927696B2Method to reduce line wavinessAPPLIED MATERIALS INC·Filed 2017·Granted Mar 27, 2018·1 cites·20 claims
- 4680US7507677B2Removable amorphous carbon CMP stopAPPLIED MATERIALS INC·Filed 2006·Granted Mar 24, 2009·4 cites·20 claims
- 4779US10559730B2Collimated LED light field displayAPPLIED MATERIALS INC·Filed 2019·Granted Feb 11, 2020·2 cites·20 claims
- 4878US2025167190A1Micro-led array with reduced pixel crosstalkAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4978US2025201790A1Manufacturing micro-led displays to reduce subpixel crosstalkAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 5077US6913868B2Conductive bi-layer e-beam resist with amorphous carbonAPPLIED MATERIALS INC·Filed 2003·Granted Jul 5, 2005·14 cites·21 claims
Showing the top 50 of 136 patent records by PatentIndex Score.
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