Inventor · disambiguated record
William Peter Van Drent
Also filed as: VAN DRENT WILLIAM · VAN DRENT WILLIAM PETER
14 granted patents·5 pending applications·46 citations·filing 1997–2023
89Inventor score
Files withASML NETHERLANDS BV10TOYOTA MOTOR CO LTD3ZEISS CARL SMT GMBH2ADE TECHNOLOGIES INC1VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS1
Top patents by PatentIndex Score
19 records- 0196US11194256B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 7, 2021·5 cites·20 claims
- 0291US11340532B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2019·Granted May 24, 2022·5 cites·29 claims
- 0390US8570492B2Lithographic apparatusVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2012·Granted Oct 29, 2013·6 cites·20 claims
- 0489US9696638B2Lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Jul 4, 2017·3 cites·18 claims
- 0587US10852640B2Optical diffraction component for suppressing at least one target wavelength by destructive interferenceZEISS CARL SMT GMBH·Filed 2020·Granted Dec 1, 2020·2 cites·31 claims
- 0684US11846887B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·25 claims
- 0777US11556067B2Contamination trapASML NETHERLANDS BV·Filed 2020·Granted Jan 17, 2023·1 cites·14 claims
- 0872US8619235B2Lithographic apparatus and device manufacturing methodVAN DRENT WILLIAM PETER·Filed 2011·Granted Dec 31, 2013·5 cites·20 claims
- 0969US2024160109A1Prolonging optical element lifetime in an euv lithography systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1064US11982947B2Contamination trapASML NETHERLANDS BV·Filed 2022·Granted May 14, 2024·0 cites·19 claims
- 1163US2025344311A1Droplet generator nozzleASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1260US9229340B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jan 5, 2016·0 cites·20 claims
- 1360US2025021026A1Apparatus for supplying liquid target material to a radiation sourceASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1454US11022902B2Sensor, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jun 1, 2021·0 cites·14 claims
- 1553US5822063AApparatus for measuring magneto-optical effectTOYOTA MOTOR CO LTD·Filed 1997·Granted Oct 13, 1998·17 cites·20 claims
- 1641US2002027836A1Magneto-optical recording medium and magneto-optical recorder using the mediumFiled 2000·Application pending·0 cites
- 1740US2010002326A1Method and system for perpendicular magnetic media metrologyADE TECHNOLOGIES INC·Filed 2006·Application pending·0 cites
- 1832US6096446AMagnetooptical recording medium and method of producing the sameTOYOTA MOTOR CO LTD·Filed 1998·Granted Aug 1, 2000·1 cites·8 claims
- 1930US6163509AMagneto-optical recording medium and magneto-optical recorder using the mediumTOYOTA MOTOR CO LTD·Filed 1998·Granted Dec 19, 2000·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →