Inventor · disambiguated record
Mamoru Yakushiji
Also filed as: YAKUSHIJI MAMORU
13 granted patents·8 pending applications·41 citations·filing 2001–2022
87Inventor score
Top patents by PatentIndex Score
21 records- 0195US8889024B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 18, 2014·17 cites·6 claims
- 0289US9150967B2Plasma processing apparatus and sample stageWATANABE TOMOYUKI·Filed 2010·Granted Oct 6, 2015·7 cites·8 claims
- 0367US8801951B2Plasma processing methodINOUE YOSHIHARU·Filed 2011·Granted Aug 12, 2014·2 cites·8 claims
- 0458US12142489B2Semiconductor device manufacturing method and plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Granted Nov 12, 2024·0 cites·14 claims
- 0557US7009714B2Method of dry etching a sample and dry etching systemHITACHI HIGH TECH CORP·Filed 2003·Granted Mar 7, 2006·7 cites·18 claims
- 0655US8092637B2Manufacturing method in plasma processing apparatusKOUZUMA YUTAKA·Filed 2008·Granted Jan 10, 2012·1 cites·8 claims
- 0754US8741166B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2012·Granted Jun 3, 2014·0 cites·6 claims
- 0852US6444087B2Plasma etching systemHITACHI LTD·Filed 2001·Granted Sep 3, 2002·3 cites·16 claims
- 0951US7122479B2Etching processing methodHITACHI HIGH TECH CORP·Filed 2002·Granted Oct 17, 2006·4 cites·10 claims
- 1051US2025029818A1Plasma processing method and plasma processing deviceHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1149US2008170969A1Plasma processing apparatusYOSHIOKA KEN·Filed 2007·Application pending·0 cites
- 1247US8580131B2Plasma etching methodWATANABE TOMOYUKI·Filed 2012·Granted Nov 12, 2013·0 cites·4 claims
- 1346US2012000774A1Plasma Processing ApparatusYOSHIOKA KEN·Filed 2011·Application pending·0 cites
- 1446US2008236614A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 1545US2009321017A1Plasma Processing Apparatus and Plasma Processing MethodTSUBONE TSUNEHIKO·Filed 2008·Application pending·0 cites
- 1644US11887814B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Jan 30, 2024·0 cites·8 claims
- 1744US2008237184A1Method and apparatus for plasma processingYAKUSHIJI MAMORU·Filed 2007·Application pending·0 cites
- 1839US8282848B2Plasma processing method and plasma processing apparatusOHMOTO YUTAKA·Filed 2008·Granted Oct 9, 2012·0 cites·1 claims
- 1939US2002011464A1Method of plasma etchingFiled 2001·Application pending·0 cites
- 2038US2005011612A1Plasma etching apparatus and plasma etching methodFiled 2004·Application pending·0 cites
- 2136US7026252B2Etching aftertreatment methodHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 11, 2006·0 cites·4 claims
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