Inventor · disambiguated record
Jason A. Kenney
Also filed as: KENNEY JASON · KENNEY JASON A · KENNEY JASON ANDREW
18 granted patents·10 pending applications·134 citations·filing 2008–2024
93Inventor score
Top patents by PatentIndex Score
28 records- 0195USD797691SComposite edge ringAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·59 cites·1 claims
- 0294US9745663B2Symmetrical inductively coupled plasma source with symmetrical flow chamberAPPLIED MATERIALS INC·Filed 2012·Granted Aug 29, 2017·8 cites·18 claims
- 0391US10170279B2Multiple coil inductively coupled plasma source with offset frequencies and double-walled shieldingAPPLIED MATERIALS INC·Filed 2014·Granted Jan 1, 2019·11 cites·14 claims
- 0490US10249470B2Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shieldingAPPLIED MATERIALS INC·Filed 2013·Granted Apr 2, 2019·10 cites·13 claims
- 0588US10811226B2Symmetrical plural-coil plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2018·Granted Oct 20, 2020·4 cites·21 claims
- 0686US10131994B2Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flowAPPLIED MATERIALS INC·Filed 2012·Granted Nov 20, 2018·4 cites·13 claims
- 0786US9928987B2Inductively coupled plasma source with symmetrical RF feedAPPLIED MATERIALS INC·Filed 2013·Granted Mar 27, 2018·5 cites·16 claims
- 0886US9896769B2Inductively coupled plasma source with multiple dielectric windows and window-supporting structureAPPLIED MATERIALS INC·Filed 2012·Granted Feb 20, 2018·4 cites·15 claims
- 0986US9082590B2Symmetrical inductively coupled plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·8 cites·19 claims
- 1084US9111722B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Aug 18, 2015·6 cites·20 claims
- 1183US9449794B2Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antennaAPPLIED MATERIALS INC·Filed 2014·Granted Sep 20, 2016·5 cites·15 claims
- 1280US9082591B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·4 cites·20 claims
- 1379US9870897B2Symmetrical plural-coil plasma source with side RF feeds and RF distribution platesAPPLIED MATERIALS INC·Filed 2014·Granted Jan 16, 2018·4 cites·20 claims
- 1475US8398814B2Tunable gas flow equalizerBALAKRISHNA AJIT·Filed 2009·Granted Mar 19, 2013·2 cites·20 claims
- 1566US2019085467A1Plasma Reactor Having Radial Struts for Substrate SupportAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1663US2017350017A1Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow ChamberAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1763US2024047195A1Delayed pulsing for plasma processing of wafersAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1863US2017350018A1Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting StructureAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1960US2018218873A1Inductively coupled plasma source with symmetrical rf feed and reactance elementsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2060US2018211811A1Plasma source with symmetrical rf feedAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2160US2025292991A1Shielding for immersed plasma sourceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2260US2022084794A1Plasma chamber with a multiphase rotating modulated cross-flowAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2353US12237149B2Reducing aspect ratio dependent etch with direct current bias pulsingAPPLIED MATERIALS INC·Filed 2022·Granted Feb 25, 2025·0 cites·19 claims
- 2452US11551965B2Apparatus to reduce polymers depositionAPPLIED MATERIALS INC·Filed 2019·Granted Jan 10, 2023·0 cites·20 claims
- 2548US11817312B2Delayed pulsing for plasma processing of wafersAPPLIED MATERIALS INC·Filed 2018·Granted Nov 14, 2023·0 cites·13 claims
- 2646US2010101729A1Process kit having reduced erosion sensitivityAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2740US11049760B2Universal process kitAPPLIED MATERIALS INC·Filed 2017·Granted Jun 29, 2021·0 cites·20 claims
- 2840US2018323042A1Method to modulate the wafer edge sheath in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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