Inventor · disambiguated record
Patrick Lawrence Morse
Also filed as: MORSE PATRICK · MORSE PATRICK LAWRENCE
13 granted patents·6 pending applications·11 citations·filing 2008–2024
85Inventor score
Files withSPUTTERING COMPONENTS INC9ARIZONA THIN FILM RES LLC3BUEHLER AG1Bühler AG1GENERAL PLASMA INC1
Top patents by PatentIndex Score
19 records- 0183US9388490B2Rotary magnetron magnet bar and apparatus containing the same for high target utilizationMADOCKS JOHN E·Filed 2010·Granted Jul 12, 2016·3 cites·8 claims
- 0278US10699885B2Dual power feed rotary sputtering cathodeBUEHLER AG·Filed 2015·Granted Jun 30, 2020·1 cites·10 claims
- 0375US9198274B2Ion control for a plasma sourceSPUTTERING COMPONENTS INC·Filed 2013·Granted Nov 24, 2015·1 cites·14 claims
- 0472US9312108B2Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2014·Granted Apr 12, 2016·2 cites·19 claims
- 0569US9406487B2Plasma enhanced chemical vapor deposition (PECVD) sourceSPUTTERING COMPONENTS INC·Filed 2013·Granted Aug 2, 2016·2 cites·20 claims
- 0669US8535490B2Rotatable magnetron sputtering with axially movable target electrode tubeMADOCKS JOHN·Filed 2008·Granted Sep 17, 2013·2 cites·19 claims
- 0767US2025029820A1Actively cooled anode for sputtering processesINTEVAC INC·Filed 2024·Application pending·0 cites
- 0865US2020266038A1Dual power feed rotary sputtering cathodeBühler AG·Filed 2020·Application pending·0 cites
- 0963US10273570B2Rotary magnetron magnet bar and apparatus containing the same for high target utilizationGENERAL PLASMA INC·Filed 2016·Granted Apr 30, 2019·0 cites·4 claims
- 1060US2024263297A1Laser induced ionization of inert and reactive gasses for magnetron sputteringARIZONA THIN FILM RES LLC·Filed 2024·Application pending·0 cites
- 1156US11908669B2Thermally controlled magnetic fields optimization system for sputter deposition processesARIZONA THIN FILM RES LLC·Filed 2022·Granted Feb 20, 2024·0 cites·7 claims
- 1251US2016225591A1Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2016·Application pending·0 cites
- 1350US10727034B2Magnetic force release for sputtering sources with magnetic target materialsSPUTTERING COMPONENTS INC·Filed 2017·Granted Jul 28, 2020·0 cites·10 claims
- 1446US9758862B2Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2013·Granted Sep 12, 2017·0 cites·20 claims
- 1544US12134125B2Systems and methods for casting sputtering targetsJUNORA LTD·Filed 2021·Granted Nov 5, 2024·0 cites·6 claims
- 1644US11603589B2Systems and methods for additive manufacturing for the deposition of metal and ceramic materialsARIZONA THIN FILM RES LLC·Filed 2018·Granted Mar 14, 2023·0 cites·6 claims
- 1744US9418823B2Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2013·Granted Aug 16, 2016·0 cites·19 claims
- 1843US2015120001A1Decentralized process controllerSPUTTERING COMPONENTS INC·Filed 2013·Application pending·0 cites
- 1932US2016064191A1Ion control for a plasma sourceSPUTTERING COMPONENTS INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →