Inventor · disambiguated record
Sung-Min Huh
Also filed as: HUH SUNG-MIN
10 granted patents·7 pending applications·37 citations·filing 2004–2011
85Inventor score
Top patents by PatentIndex Score
17 records- 0176US7389491B2Methods, systems and computer program products for correcting photomask using aerial images and boundary regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 17, 2008·5 cites·19 claims
- 0274US7745072B2Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 29, 2010·4 cites·24 claims
- 0373US7563547B2Photomask and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 21, 2009·17 cites·16 claims
- 0472US7642017B2Reflective photomask, method of fabricating the same, and reflective blank photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jan 5, 2010·3 cites·49 claims
- 0566US7601467B2Method of manufacturing EUVL alternating phase-shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 13, 2009·2 cites·18 claims
- 0662US7855034B2Reflecting mask, apparatus for fixing the reflecting mask and method of fixing the reflecting maskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Dec 21, 2010·1 cites·4 claims
- 0761US7927767B2Reflective photomasks and methods of determining layer thicknesses of the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Apr 19, 2011·4 cites·20 claims
- 0861US7745068B2Binary photomask having a compensation layerSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 29, 2010·1 cites·20 claims
- 0947US7754398B2Photo mask having assist pattern and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 13, 2010·0 cites·26 claims
- 1045US8072679B2Microscope and method of providing image data using the sameKIM DONG-WAN·Filed 2008·Granted Dec 6, 2011·0 cites·18 claims
- 1143US2007111112A1Systems and methods for fabricating photo masksSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1243US2008088810A1EUV exposure apparatus for in-situ exposing of substrate and cleaning of optical element included apparatus and method of cleaning optical element included in apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1342US2006177745A1Phase shift masksSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1438US2008090157A1Photo mask with improved contrast and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1536US2005123845A1Method of adjusting deviation of critical dimension of patternsFiled 2005·Application pending·0 cites
- 1634US2012127444A1Reflection Mask For EUV Lithography, System For EUV Lithography, And Method Of Fixing The Reflection Mask For EUV LithographyHUH SUNG-MIN·Filed 2011·Application pending·0 cites
- 1734US2007224522A1Substrate including deformed portions and method of adjusting a curvature of a substrateLEE MYOUNG-SOO·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →