Inventor · disambiguated record
Tadao Yasuzato
Also filed as: YASUZATO TADAO
23 granted patents·1 pending application·644 citations·filing 1990–2015
96Inventor score
Top patents by PatentIndex Score
24 records- 0195US5827623AOptical proximity correction halftone type phase shift photomaskNEC CORP·Filed 1996·Granted Oct 27, 1998·132 cites·12 claims
- 0294US5060843AProcess of forming bump on electrode of semiconductor chip and apparatus used thereforNEC CORP·Filed 1990·Granted Oct 29, 1991·103 cites·3 claims
- 0389US6355382B1Photomask and exposure method using a photomaskNEC CORP·Filed 1999·Granted Mar 12, 2002·94 cites·39 claims
- 0485US7910266B2Pattern forming method and maskELPIDA MEMORY INC·Filed 2008·Granted Mar 22, 2011·7 cites·7 claims
- 0584US8994151B2Semiconductor device having plural patterns extending in the same directionELPIDA MEMORY INC·Filed 2013·Granted Mar 31, 2015·3 cites·16 claims
- 0683US5750290APhoto mask and fabrication process thereforNEC CORP·Filed 1996·Granted May 12, 1998·49 cites·33 claims
- 0783US5644390AIntensity distribution simulating methodNEC CORP·Filed 1995·Granted Jul 1, 1997·52 cites·18 claims
- 0878US6004699APhotomask used for projection exposure with phase shifted auxiliary patternNEC CORP·Filed 1998·Granted Dec 21, 1999·40 cites·17 claims
- 0974US7810066B2Irradiation pattern data generation method, mask fabrication method, and plotting systemELPIDA MEMORY INC·Filed 2007·Granted Oct 5, 2010·3 cites·14 claims
- 1072US6150059APhotomask and method of exposure using sameNEC CORP·Filed 1998·Granted Nov 21, 2000·32 cites·16 claims
- 1169US7923179B2Exposure mask and pattern forming method thereforELPIDA MEMORY INC·Filed 2009·Granted Apr 12, 2011·2 cites·14 claims
- 1269US7681173B2Mask data generation method and maskELPIDA MEMORY INC·Filed 2007·Granted Mar 16, 2010·3 cites·20 claims
- 1369US5792596APattern forming methodNEC CORP·Filed 1996·Granted Aug 11, 1998·33 cites·14 claims
- 1469US5439767APhase shift mask and its inspection methodNEC CORP·Filed 1994·Granted Aug 8, 1995·22 cites·10 claims
- 1568US7691543B2Mask data creation methodELPIDA MEMORY INC·Filed 2006·Granted Apr 6, 2010·2 cites·13 claims
- 1664US7955761B2Exposure mask, pattern formation method, and exposure mask fabrication methodELPIDA MEMORY INC·Filed 2008·Granted Jun 7, 2011·1 cites·8 claims
- 1762US7632614B2Circuit pattern exposure method and maskELPIDA MEMORY INC·Filed 2007·Granted Dec 15, 2009·2 cites·10 claims
- 1856US5908718APhase shifting photomask with two different transparent regionsNEC CORP·Filed 1997·Granted Jun 1, 1999·15 cites·8 claims
- 1956US5636005AOptical projection aligner equipped with rotatable fly-eye lens unitNEC CORP·Filed 1995·Granted Jun 3, 1997·16 cites·10 claims
- 2052US9209245B2Semiconductor device having plural patterns extending in the same directionPS4 LUXCO SARL·Filed 2015·Granted Dec 8, 2015·0 cites·14 claims
- 2152US5935738APhase-shifting mask, exposure method and method for measuring amount of spherical aberrationNEC CORP·Filed 1998·Granted Aug 10, 1999·12 cites·7 claims
- 2252US5532497AOptical aligner equipped with luminance sensor on movable stageNEC CORP·Filed 1994·Granted Jul 2, 1996·12 cites·8 claims
- 2348US2009148780A1Method for correcting mask pattern, and exposure maskELPIDA MEMORY INC·Filed 2008·Application pending·0 cites
- 2438US5619304AReduction exposure apparatus with improved resolution characteristic and raised light intensityNEC CORP·Filed 1994·Granted Apr 8, 1997·9 cites·9 claims
Join the waitlist — get patent alerts
Get an alert when Tadao Yasuzato files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →