Inventor · disambiguated record
Shao-Chi Wei
Also filed as: WEI SHAO-CHI
13 granted patents·3 pending applications·9 citations·filing 2003–2025
84Inventor score
Top patents by PatentIndex Score
16 records- 0190US11209736B2Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 28, 2021·5 cites·20 claims
- 0281US10508953B2Method and system for processing substrate by chemical solution in semiconductor manufacturing fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 17, 2019·3 cites·20 claims
- 0378US2024152057A1Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0474US2025216791A1Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0573US12282260B2Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 22, 2025·0 cites·20 claims
- 0672US12463029B2Cleaning method, semiconductor manufacturing method and a system thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·20 claims
- 0772US10845699B2Method for forming photomask and photolithography methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 24, 2020·1 cites·20 claims
- 0870US11914303B2Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2021·Granted Feb 27, 2024·0 cites·17 claims
- 0968US11774870B2Method for removing a particle from a mask systemZEISS CARL SMT GMBH·Filed 2022·Granted Oct 3, 2023·0 cites·24 claims
- 1064US11307492B2Method for forming photomask and photolithography methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 19, 2022·0 cites·20 claims
- 1157US11600484B2Cleaning method, semiconductor manufacturing method and a system thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 7, 2023·0 cites·20 claims
- 1252US10101651B1Photo mask assembly and optical apparatus including the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 16, 2018·0 cites·20 claims
- 1347US10816891B2Photomask and fabrication method thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 27, 2020·0 cites·20 claims
- 1442US10459332B2Mask blank and fabrication method thereof, and method of fabricating photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 29, 2019·0 cites·20 claims
- 1542US7223503B2Method for repairing opaque defects on semiconductor mask reticlesTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted May 29, 2007·0 cites·20 claims
- 1631US2005260503A1Reticle film stabilizing methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →