Inventor · disambiguated record
Shankar Chandran
Also filed as: CHANDRAN SHANKAR · CHANDRAN SHANKAR W
6 granted patents·2 pending applications·161 citations·filing 1998–2003
85Inventor score
Files withAPPLIED MATERIALS INC7
Top patents by PatentIndex Score
8 records- 0185US6218268B1Two-step borophosphosilicate glass deposition process and related devices and apparatusAPPLIED MATERIALS INC·Filed 1998·Granted Apr 17, 2001·80 cites·22 claims
- 0280US6814087B2Accelerated plasma cleanAPPLIED MATERIALS INC·Filed 2002·Granted Nov 9, 2004·20 cites·12 claims
- 0376US6596343B1Method and apparatus for processing semiconductor substrates with hydroxyl radicalsAPPLIED MATERIALS INC·Filed 2000·Granted Jul 22, 2003·13 cites·8 claims
- 0467US6170492B1Cleaning process end point determination using throttle valve positionAPPLIED MATERIALS INC·Filed 1998·Granted Jan 9, 2001·34 cites·9 claims
- 0558US6514882B2Aggregate dielectric layer to reduce nitride consumptionAPPLIED MATERIALS INC·Filed 2001·Granted Feb 4, 2003·7 cites·15 claims
- 0657US7638161B2Method and apparatus for controlling dopant concentration during BPSG film deposition to reduce nitride consumptionAPPLIED MATERIALS INC·Filed 2001·Granted Dec 29, 2009·7 cites·3 claims
- 0747US2003221621A1Method and apparatus for processing semiconductor substrates with hydroxyl radicalsAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 0832US2003111438A1Process operation supplementation with oxygenFiled 2001·Application pending·0 cites
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