Inventor · disambiguated record
Yun-Kwang Jeon
Also filed as: JEON YUN K · JEON YUN-KWANG
16 granted patents·6 pending applications·49 citations·filing 2005–2021
91Inventor score
Top patents by PatentIndex Score
22 records- 0191US10395900B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 27, 2019·7 cites·12 claims
- 0290US10522374B2Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Dec 31, 2019·7 cites·12 claims
- 0386US10224228B2Electrostatic chucks and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 5, 2019·4 cites·17 claims
- 0485US10103043B2Apparatus for transferring substrate and apparatus for processing substrate including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Oct 16, 2018·6 cites·20 claims
- 0584US10854485B2Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 1, 2020·3 cites·5 claims
- 0684US7285788B2Ion beam extractorSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 23, 2007·10 cites·25 claims
- 0779US10481005B2Semiconductor substrate measuring apparatus and plasma treatment apparatus using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 19, 2019·3 cites·20 claims
- 0876US10971333B2Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 6, 2021·2 cites·17 claims
- 0976US10229818B2Apparatus for monitoring process chamberSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Mar 12, 2019·2 cites·20 claims
- 1074US10896838B2Electrostatic chucks and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 19, 2021·1 cites·19 claims
- 1168US7282702B2Ion neutralizerSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 16, 2007·4 cites·20 claims
- 1260US10903053B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 26, 2021·0 cites·14 claims
- 1359US12327709B2Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
- 1457US10971343B2Apparatus for monitoring process chamberSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Apr 6, 2021·0 cites·20 claims
- 1550US10566221B2Apparatus for transferring substrate and apparatus for processing substrate including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Feb 18, 2020·0 cites·20 claims
- 1646US2008156771A1Etching apparatus using neutral beam and method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1743US10861724B2Substrate inspection apparatus and substrate processing system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Dec 8, 2020·0 cites·20 claims
- 1843US2007068624A1Apparatus to treat a substrate and method thereofJEON YUN-KWANG·Filed 2006·Application pending·0 cites
- 1939US2006180968A1Semiconductor manufacturing apparatusKIM KYUNG S·Filed 2005·Application pending·0 cites
- 2037US2014224426A1Substrate support unit and plasma etching apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 2134US2016379802A1Apparatus for monitoring vacuum ultraviolet and plasma process equipment including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 2229US2015206716A1Plasma generating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yun-Kwang Jeon files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →