Inventor · disambiguated record
Dongyun Yeo
Also filed as: YEO DONGYUN
5 granted patents·4 pending applications·10 citations·filing 2017–2023
69Inventor score
Files withSAMSUNG ELECTRONICS CO LTD9
Top patents by PatentIndex Score
9 records- 0190US10522374B2Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Dec 31, 2019·7 cites·12 claims
- 0284US10854485B2Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 1, 2020·3 cites·5 claims
- 0354US2024162014A1Process chamber, substrate treating apparatus including the same, and operating method of the substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0453US2024100639A1Electrostatic chuckSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0553US2024162017A1Substrate supporting device, a substrate processing apparatus including the same, and a substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0650US2023187185A1Plasma baffle, substrate processing apparatus including the same, and substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 0742US11404252B2Electrostatic chuck and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Aug 2, 2022·0 cites·11 claims
- 0841US11984344B2Lift apparatus and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 14, 2024·0 cites·20 claims
- 0938US12362216B2Plasma processing apparatus and semiconductor fabrication method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jul 15, 2025·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →