Inventor · disambiguated record
Kimiko Mashimo
Also filed as: MASHIMO KIMIKO
5 granted patents·9 pending applications·79 citations·filing 2001–2016
77Inventor score
Top patents by PatentIndex Score
14 records- 0196US10083830B2Substrate cleaning method for removing oxide filmCANON ANELVA CORP·Filed 2016·Granted Sep 25, 2018·67 cites·18 claims
- 0290US8663437B2Deposition apparatus and electronic device manufacturing methodYAMAGUCHI NOBUO·Filed 2010·Granted Mar 4, 2014·7 cites·6 claims
- 0378US9322092B2Sputtering apparatus and method of manufacturing electronic deviceYAMAGUCHI NOBUO·Filed 2012·Granted Apr 26, 2016·5 cites·8 claims
- 0465US9593412B2Deposition apparatus and electronic device manufacturing methodCANON ANELVA CORP·Filed 2013·Granted Mar 14, 2017·0 cites·2 claims
- 0551US8524094B2Masking material for dry etchingNAKATANI ISAO·Filed 2008·Granted Sep 3, 2013·0 cites·2 claims
- 0646US2009298288A1Silicide forming method and system thereofCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 0746US2010221895A1Surface treatment apparatus and surface treatment methodCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 0846US2010255667A1Substrate cleaning method for removing oxide filmCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 0946US2007119811A1Masking material for dry etchingNAKATANI ISAO·Filed 2006·Application pending·0 cites
- 1037US2011312179A1Substrate processing method and substrate processing apparatusNAKAGAWA TAKASHI·Filed 2011·Application pending·0 cites
- 1135US2010326818A1Method of manufacturing semiconductor device and sputtering apparatusCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 1235US2002038681A1Masking material for dry etchingFiled 2001·Application pending·0 cites
- 1335US2010133092A1Sputtering method and sputtering apparatusCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 1431US2012258582A1Method and apparatus for selectively growing doped epitaxial filmSEINO TAKUYA·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →