Inventor · disambiguated record
Marco Jan-Jaco Wieland
Also filed as: WIELAND MARCO · WIELAND MARCO JAN-JACO
89 granted patents·45 pending applications·1,166 citations·filing 2002–2025
99Inventor score
Files withASML NETHERLANDS BV57MAPPER LITHOGRAPHY IP BV25WIELAND MARCO JAN-JACO21STRAUMANN HOLDING AG8MYOPOWERS MEDICAL TECH FRANCE SAS6
Top patents by PatentIndex Score
134 records- 0198US9460954B2Method of clamping a substrate and clamp preparation unit using capillary clamping forceDE JONG HENDRIK JAN·Filed 2010·Granted Oct 4, 2016·283 cites·37 claims
- 0298US7091504B2Electron beam exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2005·Granted Aug 15, 2006·50 cites·36 claims
- 0398US6897458B2Electron beam exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2003·Granted May 24, 2005·144 cites·36 claims
- 0497US8502174B2Method of and system for exposing a targetWIELAND MARCO JAN-JACO·Filed 2010·Granted Aug 6, 2013·34 cites·30 claims
- 0596US10600733B2Fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2019·Granted Mar 24, 2020·6 cites·20 claims
- 0696US8089056B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2009·Granted Jan 3, 2012·29 cites·20 claims
- 0795US11821859B2Charged particle optical device, objective lens assembly, detector, detector array, and methodsASML NETHERLANDS BV·Filed 2021·Granted Nov 21, 2023·3 cites·20 claims
- 0895US7084414B2Charged particle beamlet exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2004·Granted Aug 1, 2006·118 cites·23 claims
- 0994US9691589B2Dual pass scanningVAN DE PEUT TEUNIS·Filed 2011·Granted Jun 27, 2017·11 cites·24 claims
- 1094US9184026B2Proximity effect correction in a charged particle lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2015·Granted Nov 10, 2015·12 cites·20 claims
- 1194US8859983B2Method of and system for exposing a targetMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Oct 14, 2014·15 cites·20 claims
- 1294US8618496B2Charged particle system comprising a manipulator device for manipulation of one or more charged particle beamsWIELAND MARCO JAN-JACO·Filed 2012·Granted Dec 31, 2013·38 cites·36 claims
- 1394US8598544B2Method of generating a two-level pattern for lithographic processing and pattern generator using the sameVAN DE PEUT TEUNIS·Filed 2011·Granted Dec 3, 2013·24 cites·28 claims
- 1494US7868300B2Lithography system, sensor and measuring methodMAPPER LITHOGRAPHY IP BV·Filed 2006·Granted Jan 11, 2011·30 cites·37 claims
- 1593US9978562B2Method for exposing a waferMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted May 22, 2018·13 cites·22 claims
- 1693US8258484B2Beamlet blanker arrangementWIELAND MARCO JAN JACO·Filed 2010·Granted Sep 4, 2012·16 cites·19 claims
- 1793US7842936B2Lithography system and projection methodMAPPER LITHOGRAPHY IP BV·Filed 2007·Granted Nov 30, 2010·20 cites·15 claims
- 1893US7718100B2Dental device and method to manufacture the sameSTRAUMANN HOLDING AG·Filed 2005·Granted May 18, 2010·21 cites·21 claims
- 1992US8653485B2Projection lens arrangementWIELAND MARCO JAN-JACO·Filed 2012·Granted Feb 18, 2014·13 cites·21 claims
- 2091US10079206B2Fabricating unique chips using a charged particle multi-beamlet lithography systemMAPPER LITHOGRAPHY IP BV·Filed 2016·Granted Sep 18, 2018·5 cites·21 claims
- 2191US8492731B2Charged particle multi-beamlet lithography system with modulation deviceWIELAND MARCO JAN-JACO·Filed 2010·Granted Jul 23, 2013·9 cites·24 claims
- 2291US8445869B2Projection lens arrangementWIELAND MARCO JAN-JACO·Filed 2010·Granted May 21, 2013·12 cites·14 claims
- 2391US7019908B2Modulator circuitryMAPPER LITHOGRAPHY IP BV·Filed 2004·Granted Mar 28, 2006·88 cites·27 claims
- 2490US8558196B2Charged particle lithography system with aperture array coolingWIELAND MARCO JAN-JACO·Filed 2011·Granted Oct 15, 2013·11 cites·32 claims
- 2589US9165693B2Multi-electrode cooling arrangementMAPPER LITHOGRAPHY IP BV·Filed 2014·Granted Oct 20, 2015·7 cites·32 claims
- 2689US8586949B2Charged particle lithography system with intermediate chamberDINU-GUERTLER LAURA·Filed 2011·Granted Nov 19, 2013·17 cites·16 claims
- 2789US7709815B2Lithography system and projection methodMAPPER LITHOGRAPHY IP BV·Filed 2006·Granted May 4, 2010·19 cites·22 claims
- 2886US11798783B2Charged particle assessment tool, inspection methodASML NETHERLANDS BV·Filed 2020·Granted Oct 24, 2023·1 cites·20 claims
- 2986US10418324B2Fabricating unique chips using a charged particle multi-beamlet lithography systemASML NETHERLANDS BV·Filed 2016·Granted Sep 17, 2019·3 cites·21 claims
- 3086US8987677B2Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereofWIELAND MARCO JAN-JACO·Filed 2010·Granted Mar 24, 2015·11 cites·29 claims
- 3186US8029283B2Abutment with a hydroxylated surfaceSTRAUMANN HOLDING AG·Filed 2007·Granted Oct 4, 2011·18 cites·9 claims
- 3285US8502176B2Imaging systemWIELAND MARCO JAN-JACO·Filed 2009·Granted Aug 6, 2013·8 cites·9 claims
- 3384US8890094B2Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Nov 18, 2014·6 cites·19 claims
- 3484US8604411B2Charged particle beam modulatorWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 10, 2013·6 cites·31 claims
- 3583US12422387B2Charged particle optical device, objective lens assembly, detector, detector array, and methodsASML NETHERLANDS BV·Filed 2023·Granted Sep 23, 2025·0 cites·20 claims
- 3683US7827694B2Method for manufacturing one-piece dental deviceSTRAUMANN HOLDING AG·Filed 2005·Granted Nov 9, 2010·11 cites·17 claims
- 3782US8916837B2Charged particle lithography system with intermediate chamberMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Dec 23, 2014·4 cites·23 claims
- 3881US10078274B2Method and arrangement for handling and processing substratesMAPPER LITHOGRAPHY IP BV·Filed 2016·Granted Sep 18, 2018·2 cites·17 claims
- 3980US11961627B2Vacuum chamber arrangement for charged particle beam generatorASML NETHERLANDS BV·Filed 2023·Granted Apr 16, 2024·0 cites·20 claims
- 4080US11331167B2Implant system with hydroxylated soft tissue contact surfaceSTRAUMANN HOLDING AG·Filed 2018·Granted May 17, 2022·1 cites·15 claims
- 4180US8921758B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 30, 2014·4 cites·30 claims
- 4279US12125671B2Multi-source charged particle illumination apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 22, 2024·1 cites·20 claims
- 4378USRE48046ELithography system, sensor and measuring methodASML NETHERLANDS BV·Filed 2014·Granted Jun 9, 2020·2 cites·57 claims
- 4478US8884255B2Data path for lithography apparatusDERKS HENK·Filed 2011·Granted Nov 11, 2014·6 cites·30 claims
- 4577US8242467B2Lithography system and projection methodJAGER REMCO·Filed 2010·Granted Aug 14, 2012·5 cites·20 claims
- 4676US12505978B2Charged particle assessment tool, inspection methodASML NETHERLANDS BV·Filed 2022·Granted Dec 23, 2025·0 cites·19 claims
- 4775US12387903B2Aberration correction in charged particle systemASML NETHERLANDS BV·Filed 2022·Granted Aug 12, 2025·0 cites·20 claims
- 4875US11348756B2Aberration correction in charged particle systemASML NETHERLANDS BV·Filed 2018·Granted May 31, 2022·1 cites·27 claims
- 4975US8841636B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2010·Granted Sep 23, 2014·2 cites·23 claims
- 5074US11984295B2Charged particle assessment tool, inspection methodASML NETHERLANDS BV·Filed 2020·Granted May 14, 2024·0 cites·20 claims
Showing the top 50 of 134 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →