Inventor · disambiguated record
Mark I. Wagner
Also filed as: WAGNER MARK · WAGNER MARK I · WAGNER MARK IAN
18 granted patents·3 pending applications·239 citations·filing 1999–2010
93Inventor score
Files withMICELL TECHNOLOGIES INC10WAGNER MARK I2WAGNER MARK IAN23M INNOVATIVE PROPERTIES CO1DEYOUNG JAMES P1
Top patents by PatentIndex Score
21 records- 0196US6669785B2Methods and compositions for etch cleaning microelectronic substrates in carbon dioxideMICELL TECHNOLOGIES INC·Filed 2002·Granted Dec 30, 2003·102 cites·8 claims
- 0294US6905555B2Methods for transferring supercritical fluids in microelectronic and other industrial processesMICELL TECHNOLOGIES INC·Filed 2003·Granted Jun 14, 2005·78 cites·22 claims
- 0373US7235347B2Low pH development solutions for chemically amplified photoresistsMICELL TECHNOLOGIES INC·Filed 2005·Granted Jun 26, 2007·4 cites·20 claims
- 0473US6953041B2Compositions of transition metal species in dense phase carbon dioxide and methods of use thereofMICELL TECHNOLOGIES INC·Filed 2002·Granted Oct 11, 2005·15 cites·48 claims
- 0572US7786011B2Composition and methods for forming metal films on semiconductor substrates using supercritical solventsLAM RES CORP·Filed 2008·Granted Aug 31, 2010·3 cites·16 claims
- 0668US7410751B2Compositions and methods for image development of conventional chemically amplified photoresistsMICELL TECHNOLOGIES INC·Filed 2005·Granted Aug 12, 2008·2 cites·8 claims
- 0767US9004086B2Methods and apparatus for displacing fluids from substrates using supercritical CO2NIXON RONDA K·Filed 2010·Granted Apr 14, 2015·4 cites·15 claims
- 0867US6989172B2Method of coating microelectronic substratesMICELL TECHNOLOGIES INC·Filed 2003·Granted Jan 24, 2006·10 cites·6 claims
- 0964US8153533B2Methods and systems for preventing feature collapse during microelectronic topography fabricationDEYOUNG JAMES P·Filed 2008·Granted Apr 10, 2012·3 cites·31 claims
- 1060US7141496B2Method of treating microelectronic substratesMICELL TECHNOLOGIES INC·Filed 2004·Granted Nov 28, 2006·7 cites·19 claims
- 1158US9620410B1Methods for preventing precipitation of etch byproducts during an etch process and/or subsequent rinse processWAGNER MARK I·Filed 2009·Granted Apr 11, 2017·1 cites·20 claims
- 1258US8961701B2Method and system of drying a microelectronic topographyWAGNER MARK I·Filed 2009·Granted Feb 24, 2015·1 cites·28 claims
- 1357US8617301B2Compositions and methods for forming and depositing metal films on semiconductor substrates using supercritical solventsWAGNER MARK IAN·Filed 2007·Granted Dec 31, 2013·1 cites·20 claims
- 1450US7592035B2Method of coating microelectronic substratesMICELL TECHNOLOGIES INC·Filed 2005·Granted Sep 22, 2009·0 cites·17 claims
- 1549US7329483B2Low pH development solutions for chemically amplified photoresistsMICELL TECHNOLOGIES INC·Filed 2007·Granted Feb 12, 2008·0 cites·2 claims
- 1648US2010184301A1Methods for Preventing Precipitation of Etch Byproducts During an Etch Process and/or Subsequent Rinse ProcessLAM RES·Filed 2009·Application pending·0 cites
- 1743US7648818B2Compositions and methods for image development of conventional chemically amplified photoresistsMICELL TECHNOLOGIES INC·Filed 2006·Granted Jan 19, 2010·0 cites·14 claims
- 1842US8623764B2Composition and methods for forming metal films on semiconductor substrates using supercritical solventsWAGNER MARK IAN·Filed 2010·Granted Jan 7, 2014·0 cites·15 claims
- 1942US2004045588A1Methods and compositions for etch cleaning microelectronic substrates in carbon dioxideFiled 2003·Application pending·0 cites
- 2038US6355735B1Semi-interpenetrating polymer network from epoxy monomer and olefin3M INNOVATIVE PROPERTIES CO·Filed 1999·Granted Mar 12, 2002·8 cites·16 claims
- 2138US2005227183A1Compositions and methods for image development of conventional chemically amplified photoresistsWAGNER MARK·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →