Inventor · disambiguated record
Shintaro Kawata
Also filed as: KAWATA SHINTARO
19 granted patents·3 pending applications·460 citations·filing 1993–2007
95Inventor score
Top patents by PatentIndex Score
22 records- 0193US6087667ACharged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB sourceNIKON CORP·Filed 1997·Granted Jul 11, 2000·78 cites·38 claims
- 0293US6038015AElectron-beam-projection-exposure apparatus with integrated mask inspection and cleaning portionsNIKON CORP·Filed 1998·Granted Mar 14, 2000·85 cites·38 claims
- 0388US5396067AScan type electron microscopeNIKON CORP·Filed 1993·Granted Mar 7, 1995·63 cites·14 claims
- 0486US6140021ACharged particle beam transfer methodNAKASUJI MAMORU·Filed 1999·Granted Oct 31, 2000·51 cites·20 claims
- 0571US6620558B2Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portionNIKON CORP·Filed 2001·Granted Sep 16, 2003·9 cites·15 claims
- 0669US6830852B2Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticlesNIKON CORP·Filed 2002·Granted Dec 14, 2004·7 cites·32 claims
- 0767US5728492AMask for projection system using charged particle beamNIKON CORP·Filed 1996·Granted Mar 17, 1998·26 cites·18 claims
- 0866US6403268B1Reticles for charged-particle beam microlithographyNIKON CORP·Filed 2000·Granted Jun 11, 2002·8 cites·7 claims
- 0966US5876881AManufacturing method for mask for charged-particle-beam transfer or mask for x-ray transferNIKON CORP·Filed 1997·Granted Mar 2, 1999·26 cites·15 claims
- 1065US6403971B1Beam-adjustment methods and apparatus for charged-particle-beam microlithographyNIKON CORP·Filed 1999·Granted Jun 11, 2002·18 cites·22 claims
- 1163US5798194AMasks for charged-particle beam microlithographyNIKON CORP·Filed 1997·Granted Aug 25, 1998·22 cites·21 claims
- 1261US5969362AHigh-throughput direct-write electron-beam exposure system and methodNIKON CORP·Filed 1998·Granted Oct 19, 1999·15 cites·24 claims
- 1360US6657207B2Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposuresNIKON CORP·Filed 2001·Granted Dec 2, 2003·7 cites·18 claims
- 1459US5563411AScanning photoelectron microscopeNIKON CORP·Filed 1995·Granted Oct 8, 1996·13 cites·20 claims
- 1557US6894291B2Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography systemNIKON CORP·Filed 2001·Granted May 17, 2005·3 cites·12 claims
- 1655US6277542B1Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current densityNIKON CORP·Filed 1999·Granted Aug 21, 2001·11 cites·26 claims
- 1753US6124718ACharged-particle-beam projection-exposure apparatus with integrated reticle and substrate inspectionNIKON CORP·Filed 1997·Granted Sep 26, 2000·14 cites·13 claims
- 1844US2007279605A1Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the likeNIKON CORP·Filed 2007·Application pending·0 cites
- 1942US6767691B2Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portionNIKON CORP·Filed 2003·Granted Jul 27, 2004·0 cites·3 claims
- 2040US2002053353A1Methods and apparatus for cleaning an object using an electron beam, and device-fabrication apparatus comprising sameFiled 2001·Application pending·0 cites
- 2138US5446282AScanning photoelectron microscopeNIKON CORP·Filed 1994·Granted Aug 29, 1995·4 cites·14 claims
- 2238US2003049546A1Charged-particle-beam microlithography reticles including exposure alignment marks associated with individual subfieldsNIKON CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →