Inventor · disambiguated record
Jorge Ivaldi
Also filed as: IVALDI JORGE · IVALDI JORGE S
14 granted patents·2 pending applications·319 citations·filing 2000–2007
94Inventor score
Top patents by PatentIndex Score
16 records- 0190US6507390B1Method and apparatus for a reticle with purged pellicle-to-reticle gapASML US INC·Filed 2000·Granted Jan 14, 2003·42 cites·28 claims
- 0290US6411426B1Apparatus, system, and method for active compensation of aberrations in an optical systemASML US INC·Filed 2000·Granted Jun 25, 2002·58 cites·10 claims
- 0389US7249925B2System and method for reticle protection and transportASML HOLDING NV·Filed 2005·Granted Jul 31, 2007·14 cites·20 claims
- 0489US6556281B1Flexible piezoelectric chuck and method of using the sameASML US INC·Filed 2000·Granted Apr 29, 2003·36 cites·5 claims
- 0588US6398373B1Pneumatic control system and method for shaping deformable mirrors in lithographic projection systemsASML US INC·Filed 2000·Granted Jun 4, 2002·47 cites·13 claims
- 0686US6822731B1Method and apparatus for a pellicle frame with heightened bonding surfacesASML HOLDING NV·Filed 2003·Granted Nov 23, 2004·21 cites·30 claims
- 0786US6619903B2System and method for reticle protection and transportFiled 2001·Granted Sep 16, 2003·33 cites·9 claims
- 0882US6991416B2System and method for reticle protection and transportASML HOLDING NV·Filed 2002·Granted Jan 31, 2006·23 cites·22 claims
- 0976US7339653B2System for a pellicle frame with heightened bonding surfacesASML HOLDING NV·Filed 2007·Granted Mar 4, 2008·3 cites·6 claims
- 1074US6559922B2Method and apparatus for a non-contact scavenging sealFiled 2001·Granted May 6, 2003·22 cites·13 claims
- 1168US6847434B2Method and apparatus for a pellicle frame with porous filtering insertsASML HOLDING NV·Filed 2002·Granted Jan 25, 2005·9 cites·23 claims
- 1263US7173689B2Method and system for a pellicle frame with heightened bonding surfacesASML HOLDING NV·Filed 2004·Granted Feb 6, 2007·5 cites·20 claims
- 1353US6757110B2Catadioptric lithography system and method with reticle stage orthogonal to wafer stageASML HOLDING NV·Filed 2002·Granted Jun 29, 2004·4 cites·14 claims
- 1447US6977716B2Catadioptric lithography system and method with reticle stage orthogonal to wafer stageASML HOLDING NV·Filed 2004·Granted Dec 20, 2005·2 cites·17 claims
- 1544US2005151955A1Method and apparatus for a reticle with purged pellicle-to-reticle gapASML HOLDING NV·Filed 2005·Application pending·0 cites
- 1637US2002089734A1Apparatus, system, and method for active compensation of aberrations in an optical systemFiled 2002·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Jorge Ivaldi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →