Inventor · disambiguated record
Kinya Ueno
Also filed as: UENO KINYA
20 granted patents·1 pending application·1,149 citations·filing 1976–2007
97Inventor score
Top patents by PatentIndex Score
21 records- 0197US5882433ASpin cleaning methodTOKYO ELECTRON LTD·Filed 1996·Granted Mar 16, 1999·349 cites·23 claims
- 0294US6299696B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2000·Granted Oct 9, 2001·69 cites·5 claims
- 0392US5940985AApparatus and method for drying substratesTOKYO ELECTRON LTD·Filed 1997·Granted Aug 24, 1999·129 cites·27 claims
- 0490US4106449AEGR systemTOYOTA MOTOR CO LTD·Filed 1976·Granted Aug 15, 1978·54 cites·10 claims
- 0589US6342104B1Method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 2000·Granted Jan 29, 2002·37 cites·13 claims
- 0688US6613692B1Substrate processing method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Sep 2, 2003·35 cites·13 claims
- 0786US6394110B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted May 28, 2002·30 cites·17 claims
- 0884US6001191ASubstrate washing method, substrate washing-drying method, substrate washing apparatus and substrate washing-drying apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Dec 14, 1999·76 cites·8 claims
- 0983US6746543B2Apparatus for and method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 2001·Granted Jun 8, 2004·23 cites·7 claims
- 1083US6050275AApparatus for and method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 1997·Granted Apr 18, 2000·53 cites·19 claims
- 1179US6131588AApparatus for and method of cleaning object to be processedTOKYO ELECTRON LTD·Filed 1998·Granted Oct 17, 2000·45 cites·39 claims
- 1278US5421905AMethod for washing wafersTOKYO ELECTRON LTD·Filed 1993·Granted Jun 6, 1995·58 cites·6 claims
- 1377US6554010B1Substrate cleaning tool, having permeable cleaning headTOKYO ELECTRON LTD·Filed 2000·Granted Apr 29, 2003·23 cites·21 claims
- 1477US6491045B2Apparatus for and method of cleaning object to be processedTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·15 cites·9 claims
- 1571US5261431AWashing apparatusTOKYO ELECTRON LTD·Filed 1992·Granted Nov 16, 1993·42 cites·11 claims
- 1670US6045624AApparatus for and method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 1997·Granted Apr 4, 2000·37 cites·16 claims
- 1762US7191785B2Substrate processing apparatus for resist film removalTOKYO ELECTRON LTD·Filed 2003·Granted Mar 20, 2007·6 cites·14 claims
- 1858US6413355B1Apparatus for and method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 1997·Granted Jul 2, 2002·22 cites·15 claims
- 1958US5236515ACleaning deviceTOKYO ELECTRON LTD·Filed 1991·Granted Aug 17, 1993·29 cites·22 claims
- 2057US6319329B1Method of cleaning objects to be processedTOKYO ELECTRON LTD·Filed 1999·Granted Nov 20, 2001·17 cites·18 claims
- 2153US2007204885A1Substrate processing apparatus for resist film removalTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
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