Inventor · disambiguated record
Chih-Yuh Yang
Also filed as: YANG CHIH Y · YANG CHIH YUH
71 granted patents·2 pending applications·2,851 citations·filing 1997–2015
99Inventor score
Files withADVANCED MICRO DEVICES INC61SPANSION LLC7CHENG NING1CHRISTOPHER F LYONS1GLOBALFOUNDRIES INC1
Top patents by PatentIndex Score
73 records- 0199US6835618B1Epitaxially grown fin for FinFETADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 28, 2004·229 cites·15 claims
- 0299US6645797B1Method for forming fins in a FinFET device using sacrificial carbon layerADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 11, 2003·273 cites·20 claims
- 0398US6773998B1Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterningADVANCED MICRO DEVICES INC·Filed 2003·Granted Aug 10, 2004·208 cites·22 claims
- 0498US6211044B1Process for fabricating a semiconductor device component using a selective silicidation reactionADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 3, 2001·242 cites·27 claims
- 0596US6787854B1Method for forming a fin in a finFET deviceADVANCED MICRO DEVICES INC·Filed 2003·Granted Sep 7, 2004·113 cites·5 claims
- 0696US6184128B1Method using a thin resist mask for dual damascene stop layer etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 6, 2001·139 cites·20 claims
- 0795US6451647B1Integrated plasma etch of gate and gate dielectric and low power plasma post gate etch removal of high-K residualADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 17, 2002·92 cites·18 claims
- 0893US6563183B1Gate array with multiple dielectric properties and method for forming sameADVANCED MICRO DEVICES INC·Filed 2002·Granted May 13, 2003·113 cites·4 claims
- 0992US6750127B1Method for fabricating a semiconductor device using amorphous carbon having improved etch resistanceADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 15, 2004·61 cites·9 claims
- 1092US6440640B1Thin resist with transition metal hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 27, 2002·53 cites·20 claims
- 1191US6764949B2Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 20, 2004·53 cites·18 claims
- 1291US6653735B1CVD silicon carbide layer as a BARC and hard mask for gate patterningADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 25, 2003·57 cites·3 claims
- 1388US6790782B1Process for fabrication of a transistor gate including high-K gate dielectric with in-situ resist trim, gate etch, and high-K dielectric removalADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 14, 2004·42 cites·20 claims
- 1488US6020269AUltra-thin resist and nitride/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Feb 1, 2000·92 cites·20 claims
- 1587US7183152B1Epitaxially grown fin for FinFETADVANCED MICRO DEVICES INC·Filed 2004·Granted Feb 27, 2007·34 cites·17 claims
- 1686US6579809B1In-situ gate etch process for fabrication of a narrow gate transistor structure with a high-k gate dielectricADVANCED MICRO DEVICES INC·Filed 2002·Granted Jun 17, 2003·34 cites·20 claims
- 1785US7029958B2Self aligned damascene gateADVANCED MICRO DEVICES INC·Filed 2003·Granted Apr 18, 2006·31 cites·17 claims
- 1885US6864556B1CVD organic polymer film for advanced gate patterningADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 8, 2005·30 cites·18 claims
- 1984US6653231B2Process for reducing the critical dimensions of integrated circuit device featuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 25, 2003·31 cites·20 claims
- 2083US6589709B1Process for preventing deformation of patterned photoresist featuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 8, 2003·31 cites·20 claims
- 2182US7732281B1Methods for fabricating dual bit flash memory devicesSPANSION LLC·Filed 2006·Granted Jun 8, 2010·8 cites·18 claims
- 2281US6764966B1Spacers with a graded dielectric constant for semiconductor devices having a high-K dielectricADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 20, 2004·28 cites·5 claims
- 2380US6960804B1Semiconductor device having a gate structure surrounding a finADVANCED MICRO DEVICES INC·Filed 2003·Granted Nov 1, 2005·22 cites·18 claims
- 2480US6787476B1Etch stop layer for etching FinFET gate over a large topographyADVANCED MICRO DEVICES INC·Filed 2003·Granted Sep 7, 2004·21 cites·20 claims
- 2580US6309926B1Thin resist with nitride hard mask for gate etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 30, 2001·58 cites·28 claims
- 2679US6797552B1Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devicesADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 28, 2004·22 cites·8 claims
- 2779US6165695AThin resist with amorphous silicon hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 26, 2000·57 cites·32 claims
- 2878US6127070AThin resist with nitride hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 3, 2000·53 cites·2 claims
- 2977US6630288B2Process for forming sub-lithographic photoresist features by modification of the photoresist surfaceADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 7, 2003·19 cites·15 claims
- 3077US6107172AControlled linewidth reduction during gate pattern formation using an SiON BARCADVANCED MICRO DEVICES INC·Filed 1997·Granted Aug 22, 2000·54 cites·19 claims
- 3175US6200907B1Ultra-thin resist and barrier metal/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 13, 2001·46 cites·20 claims
- 3274US6140023AMethod for transferring patterns created by lithographyADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 31, 2000·33 cites·30 claims
- 3373US5990524ASilicon oxime spacer for preventing over-etching during local interconnect formationADVANCED MICRO DEVICES INC·Filed 1997·Granted Nov 23, 1999·40 cites·20 claims
- 3473US5965461AControlled linewidth reduction during gate pattern formation using a spin-on barcADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 12, 1999·45 cites·20 claims
- 3571US7675104B2Integrated circuit memory system employing silicon rich layersSPANSION LLC·Filed 2006·Granted Mar 9, 2010·3 cites·10 claims
- 3671US6171763B1Ultra-thin resist and oxide/nitride hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 9, 2001·38 cites·26 claims
- 3768US6828259B2Enhanced transistor gate using E-beam radiationADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 7, 2004·16 cites·20 claims
- 3868US6306560B1Ultra-thin resist and SiON/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 23, 2001·34 cites·28 claims
- 3967US6606738B1Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technologyADVANCED MICRO DEVICES INC·Filed 2001·Granted Aug 12, 2003·13 cites·12 claims
- 4066US6162587AThin resist with transition metal hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 19, 2000·27 cites·14 claims
- 4165US7951675B2SI trench between bitline HDP for BVDSS improvementSPANSION LLC·Filed 2007·Granted May 31, 2011·3 cites·19 claims
- 4265US7005386B1Method for reducing resist height erosion in a gate etch processADVANCED MICRO DEVICES INC·Filed 2003·Granted Feb 28, 2006·9 cites·11 claims
- 4365US6913958B1Method for patterning a feature using a trimmed hardmaskADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 5, 2005·9 cites·5 claims
- 4465US6905971B1Treatment of dielectric material to enhance etch rateADVANCED MICRO DEVICES INC·Filed 2002·Granted Jun 14, 2005·9 cites·20 claims
- 4565US6764947B1Method for reducing gate line deformation and reducing gate line widths in semiconductor devicesADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 20, 2004·9 cites·13 claims
- 4664US7915160B1Methods for forming small contactsGLOBALFOUNDRIES INC·Filed 2007·Granted Mar 29, 2011·1 cites·10 claims
- 4763US6849530B2Method for semiconductor gate line dimension reductionADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 1, 2005·10 cites·6 claims
- 4862US6599766B1Method for determining an anti reflective coating thickness for patterning a thin film semiconductor layerADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 29, 2003·7 cites·16 claims
- 4961US7696038B1Methods for fabricating flash memory devicesSPANSION LLC·Filed 2006·Granted Apr 13, 2010·4 cites·22 claims
- 5061US6514871B1Gate etch process with extended CD trim capabilityADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 4, 2003·7 cites·4 claims
Showing the top 50 of 73 patent records by PatentIndex Score.
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