Inventor · disambiguated record
Christopher F. Lyons
Also filed as: LYONS CHRISTOPHER F · LYONS CHRISTOPHER FRANCIS
147 granted patents·6 pending applications·4,497 citations·filing 1981–2013
99Inventor score
Files withADVANCED MICRO DEVICES INC134IBM11SPANSION LLC2CHRISTOPHER F LYONS1CLARIANT FINANCE BVI LTD1
Top patents by PatentIndex Score
153 records- 0198US6773998B1Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterningADVANCED MICRO DEVICES INC·Filed 2003·Granted Aug 10, 2004·208 cites·22 claims
- 0298US6623893B1Pellicle for use in EUV lithography and a method of making such a pellicleADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 23, 2003·115 cites·20 claims
- 0397US6383952B1RELACS process to double the frequency or pitch of small feature formationADVANCED MICRO DEVICES INC·Filed 2001·Granted May 7, 2002·140 cites·10 claims
- 0496US6541360B1Bi-layer trim etch process to form integrated circuit gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 1, 2003·101 cites·26 claims
- 0596US6184128B1Method using a thin resist mask for dual damascene stop layer etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 6, 2001·139 cites·20 claims
- 0695US6534418B1Use of silicon containing imaging layer to define sub-resolution gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·97 cites·20 claims
- 0794US6057080ATop antireflective coating filmIBM·Filed 1997·Granted May 2, 2000·86 cites·17 claims
- 0893US6656763B1Spin on polymers for organic memory devicesADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 2, 2003·98 cites·20 claims
- 0992US6440640B1Thin resist with transition metal hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 27, 2002·53 cites·20 claims
- 1092US6291137B1Sidewall formation for sidewall patterning of sub 100 nm structuresADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 18, 2001·132 cites·20 claims
- 1192US5482817AMid and deep-uv antireflection coatings and methods for use thereofIBM·Filed 1994·Granted Jan 9, 1996·70 cites·9 claims
- 1291US8436289B1System and method for detecting particles with a semiconductor deviceHOSSAIN TIMOTHY Z·Filed 2010·Granted May 7, 2013·14 cites·15 claims
- 1391US6764949B2Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 20, 2004·53 cites·18 claims
- 1490US6825060B1Photosensitive polymeric memory elementsADVANCED MICRO DEVICES INC·Filed 2003·Granted Nov 30, 2004·55 cites·20 claims
- 1590US6787458B1Polymer memory device formed in via openingADVANCED MICRO DEVICES INC·Filed 2003·Granted Sep 7, 2004·63 cites·20 claims
- 1690US6773954B1Methods of forming passive layers in organic memory cellsADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 10, 2004·62 cites·23 claims
- 1790US6654660B1Controlling thermal expansion of mask substrates by scatterometryADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 25, 2003·36 cites·26 claims
- 1890US6417084B1T-gate formation using a modified conventional poly processADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 9, 2002·50 cites·19 claims
- 1990US6037671AStepper alignment mark structure for maintaining alignment integrityADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 14, 2000·107 cites·21 claims
- 2090US5744537AAntireflective coating filmsIBM·Filed 1997·Granted Apr 28, 1998·72 cites·5 claims
- 2190US5401614AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1993·Granted Mar 28, 1995·68 cites·5 claims
- 2290US5380621AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1993·Granted Jan 10, 1995·57 cites·7 claims
- 2389US6593035B1Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer filmsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·33 cites·20 claims
- 2488US6829040B1Lithography contrast enhancement technique by varying focus with wavelength modulationADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 7, 2004·32 cites·18 claims
- 2588US6403456B1T or T/Y gate formation using trim etch processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 11, 2002·48 cites·20 claims
- 2688US6020269AUltra-thin resist and nitride/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Feb 1, 2000·92 cites·20 claims
- 2788US5554485AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1994·Granted Sep 10, 1996·56 cites·20 claims
- 2887US6790790B1High modulus filler for low k materialsADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 14, 2004·37 cites·21 claims
- 2987US6686270B1Dual damascene trench depth monitoringADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 3, 2004·38 cites·20 claims
- 3087US6605413B1Chemical treatment to strengthen photoresists to prevent pattern collapseADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 12, 2003·27 cites·43 claims
- 3187US6589711B1Dual inlaid process using a bilayer resistADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 8, 2003·45 cites·30 claims
- 3287US6270929B1Damascene T-gate using a relacs flowADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 7, 2001·37 cites·20 claims
- 3386US8748800B2Charge storage device for detecting alpha particlesSPANSION LLC·Filed 2013·Granted Jun 10, 2014·6 cites·4 claims
- 3486US7008832B1Damascene process for a T-shaped gate electrodeADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 7, 2006·40 cites·19 claims
- 3585US6864556B1CVD organic polymer film for advanced gate patterningADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 8, 2005·30 cites·18 claims
- 3685US6803267B1Silicon containing material for patterning polymeric memory elementADVANCED MICRO DEVICES INC·Filed 2003·Granted Oct 12, 2004·41 cites·21 claims
- 3785US6548423B1Multilayer anti-reflective coating process for integrated circuit fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 15, 2003·32 cites·20 claims
- 3885US6358856B1Bright field image reversal for contact hole patterningADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 19, 2002·34 cites·13 claims
- 3985US5930645AShallow trench isolation formation with reduced polish stop thicknessADVANCED MICRO DEVICES INC·Filed 1997·Granted Jul 27, 1999·87 cites·17 claims
- 4084US6239031B1Stepper alignment mark structure for maintaining alignment integrityADVANCED MICRO DEVICES INC·Filed 2000·Granted May 29, 2001·39 cites·3 claims
- 4183US6989332B1Ion implantation to modulate amorphous carbon stressADVANCED MICRO DEVICES INC·Filed 2002·Granted Jan 24, 2006·26 cites·20 claims
- 4282US6878961B2Photosensitive polymeric memory elementsADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 12, 2005·27 cites·20 claims
- 4382US6171962B1Shallow trench isolation formation without planarization maskADVANCED MICRO DEVICES INC·Filed 1997·Granted Jan 9, 2001·68 cites·11 claims
- 4481US6255202B1Damascene T-gate using a spacer flowADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 3, 2001·28 cites·20 claims
- 4580US6771356B1Scatterometry of grating structures to monitor wafer stressADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 3, 2004·24 cites·18 claims
- 4680US6309926B1Thin resist with nitride hard mask for gate etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 30, 2001·58 cites·28 claims
- 4779US6654659B1Quartz crystal monitor wafer for lithography and etch process monitoringADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 25, 2003·21 cites·31 claims
- 4879US6544693B2Pellicle for use in small wavelength lithography and a method for making such a pellicleADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 8, 2003·16 cites·24 claims
- 4979US6165695AThin resist with amorphous silicon hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 26, 2000·57 cites·32 claims
- 5078US6635409B1Method of strengthening photoresist to prevent pattern collapseADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 21, 2003·16 cites·19 claims
Showing the top 50 of 153 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →