Inventor · disambiguated record
Pary Baluswamy
Also filed as: BALUSWAMY PARY
17 granted patents·6 pending applications·124 citations·filing 2000–2011
93Inventor score
Top patents by PatentIndex Score
23 records- 0182US7790338B2Optical compensation devices, systems, and methodsMICRON TECHNOLOGY INC·Filed 2007·Granted Sep 7, 2010·5 cites·39 claims
- 0282US6484060B1Layout for measurement of overlay errorMICRON TECHNOLOGY INC·Filed 2000·Granted Nov 19, 2002·31 cites·22 claims
- 0380US6432591B1Overlay target design method with pitch determination to minimize impact of lens aberrationsMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 13, 2002·14 cites·19 claims
- 0478US7268869B2In-situ spectrograph and method of measuring light wavelength characteristics for photolithographyMICRON TECHNOLOGY INC·Filed 2004·Granted Sep 11, 2007·15 cites·64 claims
- 0576US6675053B2Layout for measurement of overlay errorMICRON TECHNOLOGY INC·Filed 2002·Granted Jan 6, 2004·21 cites·15 claims
- 0675US6822342B2Raised-lines overlay semiconductor targets and method of making the sameMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 23, 2004·14 cites·9 claims
- 0771US6914017B1Residue free overlay targetMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 5, 2005·10 cites·6 claims
- 0867US8062814B2Optical compensation devices, systems, and methodsLEI XINYA·Filed 2010·Granted Nov 22, 2011·1 cites·37 claims
- 0964US7223674B2Methods for forming backside alignment markers useable in semiconductor lithographyMICRON TECHNOLOGY INC·Filed 2004·Granted May 29, 2007·7 cites·69 claims
- 1061US6756167B2Overlay target design method to minimize impact of lens aberrationsMICRON TECHNOLOGY INC·Filed 2002·Granted Jun 29, 2004·4 cites·25 claims
- 1152US8323859B2Optical compensation devices, systems, and methodsLEI XINYA·Filed 2011·Granted Dec 4, 2012·0 cites·20 claims
- 1252US7655384B2Methods for reducing spherical aberration effects in photolithographyMICRON TECHNOLOGY INC·Filed 2006·Granted Feb 2, 2010·0 cites·7 claims
- 1351US2006017074A1Raised-lines overlay semiconductor targets and method of making the sameBALUSWAMY PARY·Filed 2005·Application pending·0 cites
- 1450US7862964B2Methods for photo-processing photo-imageable materialMICRON TECHNOLOGY INC·Filed 2010·Granted Jan 4, 2011·0 cites·7 claims
- 1550US2006093927A1Pattern mask with features to minimize the effect of aberrationsBALUSWAMY PARY·Filed 2005·Application pending·0 cites
- 1649US7767363B2Methods for photo-processing photo-imageable materialMICRON TECHNOLOGY INC·Filed 2005·Granted Aug 3, 2010·0 cites·8 claims
- 1749US2006226118A1Methods for forming backside alignment markers useable in semiconductor lithographyBALUSWAMY PARY·Filed 2006·Application pending·0 cites
- 1848US6514643B2Overlay target exposure device utilizing pitch determination to minimize impact of lens aberrationsMICRON TECHNOLOGY INC·Filed 2002·Granted Feb 4, 2003·1 cites·5 claims
- 1947US6803157B2Pattern mask with features to minimize the effect of aberrationsMICRON TECHNOLOGY INC·Filed 2002·Granted Oct 12, 2004·1 cites·10 claims
- 2044US7105278B2Pattern mask with features to minimize the effect of aberrationsMICRON TECHNOLOGY INC·Filed 2004·Granted Sep 12, 2006·0 cites·20 claims
- 2144US2005070069A1Raised-lines overlay semiconductor targets and method of making the sameFiled 2004·Application pending·0 cites
- 2240US2005048412A1Methods for reducing spherical aberration effects in photolithographyFiled 2003·Application pending·0 cites
- 2338US2005250291A1Methods for clearing alignment markers useable in semiconductor lithographyBALUSWAMY PARY·Filed 2004·Application pending·0 cites
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