Inventor · disambiguated record
Akihiro Hosokawa
Also filed as: HOSOKAWA AKIHIRO
49 granted patents·35 pending applications·3,338 citations·filing 1990–2024
99Inventor score
Files withAPPLIED MATERIALS INC45APPLIED KOMATSU TECHNOLOGY INC6HOSOKAWA AKIHIRO5DAINIPPON SCREEN MFG3INAGAWA MAKOTO3
Top patents by PatentIndex Score
84 records- 0199US7073834B2Multiple section end effector assemblyAPPLIED MATERIALS INC·Filed 2004·Granted Jul 11, 2006·482 cites·33 claims
- 0299US7062161B2Photoirradiation thermal processing apparatus and thermal processing susceptor employed thereforDAINIPPON SCREEN MFG·Filed 2003·Granted Jun 13, 2006·476 cites·17 claims
- 0399US6917755B2Substrate supportAPPLIED MATERIALS INC·Filed 2003·Granted Jul 12, 2005·493 cites·92 claims
- 0497US7644745B2Bonding of target tiles to backing plate with patterned bonding agentAPPLIED MATERIALS INC·Filed 2005·Granted Jan 12, 2010·35 cites·18 claims
- 0597US5716133AShielded heat sensor for measuring temperatureAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Feb 10, 1998·524 cites·20 claims
- 0696US7316763B2Multiple target tiles with complementary beveled edges forming a slanted gap therebetweenAPPLIED MATERIALS INC·Filed 2005·Granted Jan 8, 2008·27 cites·15 claims
- 0796US5518593AShield configuration for vacuum chamberAPPLIED KOMATSU TECHNOLOGY INC·Filed 1994·Granted May 21, 1996·105 cites·34 claims
- 0896US5345999AMethod and apparatus for cooling semiconductor wafersAPPLIED MATERIALS INC·Filed 1993·Granted Sep 13, 1994·276 cites·20 claims
- 0995US7550055B2Elastomer bonding of large area sputtering targetAPPLIED MATERIALS INC·Filed 2005·Granted Jun 23, 2009·30 cites·29 claims
- 1093US7815782B2PVD targetAPPLIED MATERIALS INC·Filed 2006·Granted Oct 19, 2010·17 cites·4 claims
- 1192US7652223B2Electron beam welding of sputtering target tilesAPPLIED MATERIALS INC·Filed 2005·Granted Jan 26, 2010·17 cites·16 claims
- 1292US6634686B2End effector assemblyAPPLIED MATERIALS INC·Filed 2001·Granted Oct 21, 2003·56 cites·50 claims
- 1392US5855744ANon-planar magnet tracking during magnetron sputteringAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Jan 5, 1999·132 cites·42 claims
- 1491US7432184B2Integrated PVD system using designated PVD chambersAPPLIED MATERIALS INC·Filed 2005·Granted Oct 7, 2008·18 cites·7 claims
- 1591US7429718B2Heating and cooling of substrate supportAPPLIED MATERIALS INC·Filed 2005·Granted Sep 30, 2008·17 cites·6 claims
- 1691US6460369B2Consecutive deposition systemAPPLIED MATERIALS INC·Filed 2001·Granted Oct 8, 2002·53 cites·46 claims
- 1789US8500975B2Method and apparatus for sputtering onto large flat panelsLE HIEN MINH HUU·Filed 2006·Granted Aug 6, 2013·13 cites·19 claims
- 1889US6765178B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2001·Granted Jul 20, 2004·37 cites·29 claims
- 1988US8182661B2Controllable target coolingTANASE YOSHIAKI·Filed 2005·Granted May 22, 2012·11 cites·18 claims
- 2088US6936797B2Thermal processing method and thermal processing apparatus for substrate employing photoirradiationDAINIPPON SCREEN MFG·Filed 2003·Granted Aug 30, 2005·38 cites·12 claims
- 2188US6267851B1Tilted sputtering target with shield to block contaminantsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Jul 31, 2001·56 cites·23 claims
- 2288US5799860APreparation and bonding of workpieces to form sputtering targets and other assembliesAPPLIED MATERIALS INC·Filed 1995·Granted Sep 1, 1998·56 cites·16 claims
- 2387US8875547B2Washing machine, and ozone generatorSUZUKI MASAMI·Filed 2006·Granted Nov 4, 2014·13 cites·11 claims
- 2486US7976635B2Dual substrate loadlock process equipmentAPPLIED MATERIALS INC·Filed 2010·Granted Jul 12, 2011·5 cites·13 claims
- 2586US6949143B1Dual substrate loadlock process equipmentAPPLIED MATERIALS INC·Filed 1999·Granted Sep 27, 2005·57 cites·79 claims
- 2683US8783390B2Vehicle drive apparatusMAEDA YOSHINORI·Filed 2007·Granted Jul 22, 2014·18 cites·21 claims
- 2783US7442900B2Chamber for uniform heating of large area substratesAPPLIED MATERIALS INC·Filed 2006·Granted Oct 28, 2008·7 cites·20 claims
- 2883US7022948B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2004·Granted Apr 4, 2006·23 cites·11 claims
- 2981US6825447B2Apparatus and method for uniform substrate heating and contaminate collectionAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·32 cites·24 claims
- 3080US7628899B2Apparatus and method of positioning a multizone magnetron assemblyAPPLIED MATERIALS INC·Filed 2005·Granted Dec 8, 2009·4 cites·15 claims
- 3179US6773562B1Shadow frame for substrate processingAPPLIED MATERIALS INC·Filed 1998·Granted Aug 10, 2004·54 cites·2 claims
- 3278US7566900B2Integrated metrology tools for monitoring and controlling large area substrate processing chambersAPPLIED MATERIALS INC·Filed 2005·Granted Jul 28, 2009·6 cites·2 claims
- 3375US6623563B2Susceptor with bi-metal effectAPPLIED MATERIALS INC·Filed 2001·Granted Sep 23, 2003·13 cites·26 claims
- 3474US7641434B2Dual substrate loadlock process equipmentAPPLIED MATERIALS INC·Filed 2004·Granted Jan 5, 2010·11 cites·9 claims
- 3572US6998579B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2003·Granted Feb 14, 2006·14 cites·22 claims
- 3671US7879210B2Partially suspended rolling magnetronAPPLIED MATERIALS INC·Filed 2006·Granted Feb 1, 2011·2 cites·33 claims
- 3770US8961756B2Ganged scanning of multiple magnetrons, especially two level folded magnetronsINAGAWA MAKOTO·Filed 2007·Granted Feb 24, 2015·2 cites·14 claims
- 3868US9222165B2Cooled PVD shieldHOSOKAWA AKIHIRO·Filed 2012·Granted Dec 29, 2015·2 cites·20 claims
- 3968US7041939B2Thermal processing apparatus and thermal processing methodDAINIPPON SCREEN MFG·Filed 2004·Granted May 9, 2006·11 cites·10 claims
- 4067US6257045B1Automated substrate processing systems and methodsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Jul 10, 2001·31 cites·29 claims
- 4166US8574411B2Reactive sputtering chamber with gas distribution tubesWHITE JOHN M·Filed 2011·Granted Nov 5, 2013·1 cites·6 claims
- 4266US8206548B2Substrate processing apparatus and substrate processing methodKAJINO ITSUKI·Filed 2008·Granted Jun 26, 2012·5 cites·12 claims
- 4361US2007261951A1Reactive sputtering zinc oxide transparent conductive oxides onto large area substratesYE YAN·Filed 2007·Application pending·0 cites
- 4460US2012000773A1Reactive sputtering zinc oxide transparent conductive oxides onto large area substratesYE YAN·Filed 2011·Application pending·0 cites
- 4559US6205870B1Automated substrate processing systems and methodsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Mar 27, 2001·22 cites·22 claims
- 4659US5106200AApparatus for measuring temperature of waferAPPLIED MATERIALS INC·Filed 1990·Granted Apr 21, 1992·20 cites·9 claims
- 4759US2007295598A1Backing plate assemblyINAGAWA MAKOTO·Filed 2006·Application pending·0 cites
- 4858US6977788B2Method and apparatus for adjusting angular position of magnetic head unitTDK CORP·Filed 2001·Granted Dec 20, 2005·3 cites·13 claims
- 4958US2024295447A1Force detection device, force detection method, and clothes processing devicePANASONIC IP MAN CO LTD·Filed 2024·Application pending·0 cites
- 5058US2025137188A1Washing machine including damper apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 84 patent records by PatentIndex Score.
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