Inventor · disambiguated record
Takeshi Koshiba
Also filed as: KOSHIBA TAKESHI
15 granted patents·14 pending applications·278 citations·filing 1995–2023
91Inventor score
Top patents by PatentIndex Score
29 records- 0194US9381540B2Pattern forming methodTOSHIBA KK·Filed 2015·Granted Jul 5, 2016·6 cites·19 claims
- 0289US6040840AVirtual clay system and its method of simulationFUJITSU LTD·Filed 1998·Granted Mar 21, 2000·116 cites·17 claims
- 0383US6330539B1Dialog interface systemFUJITSU LTD·Filed 1999·Granted Dec 11, 2001·113 cites·30 claims
- 0479US8907346B2Imprint apparatus, imprint method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2013·Granted Dec 9, 2014·4 cites·15 claims
- 0577US9389513B2Method of forming pattern, system for calculating resist coating distribution and program for calculating the sameKOSHIBA TAKESHI·Filed 2010·Granted Jul 12, 2016·3 cites·23 claims
- 0677US9046763B2Pattern forming methodKOSHIBA TAKESHI·Filed 2010·Granted Jun 2, 2015·3 cites·4 claims
- 0771US8423926B2Acceptance determining method of blank for EUV mask and manufacturing method of EUV maskKOSHIBA TAKESHI·Filed 2011·Granted Apr 16, 2013·2 cites·16 claims
- 0865US7985958B2Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing programTOSHIBA KK·Filed 2005·Granted Jul 26, 2011·1 cites·5 claims
- 0964US8178366B2Pattern forming method, manufacturing method of semiconductor device, and template manufacturing methodMIYOSHI SEIRO·Filed 2011·Granted May 15, 2012·2 cites·10 claims
- 1053US12414345B2Manufacturing method of semiconductor device and semiconductor waferDENSO CORP·Filed 2023·Granted Sep 9, 2025·0 cites·10 claims
- 1152US7482604B2Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor deviceTOSHIBA KK·Filed 2006·Granted Jan 27, 2009·0 cites·20 claims
- 1252US7257224B2Cryptographical pseudo-random number generation apparatus and programFUJITSU LTD·Filed 2003·Granted Aug 14, 2007·3 cites·15 claims
- 1351US2009206280A1Charged-beam exposure apparatus having an improved alignment precision and exposure methodKOSHIBA TAKESHI·Filed 2009·Application pending·0 cites
- 1450US7459705B2Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted Dec 2, 2008·0 cites·16 claims
- 1550US2009095711A1Microfabrication apparatus and device manufacturing methodKOSHIBA TAKESHI·Filed 2008·Application pending·0 cites
- 1649US7889910B2Character pattern extracting method, charged particle beam drawing method, and character pattern extracting programTOSHIBA KK·Filed 2007·Granted Feb 15, 2011·0 cites·20 claims
- 1749US2008001077A1Charged particle beam drawing apparatus, charged particle beam drawing method and semiconductor device manufacturing methodNAKASUGI TETSURO·Filed 2007·Application pending·0 cites
- 1848US5787426AData sorting, data sorting tree creating, derivative extracting and thesaurus creating apparatus and method, or data processing systemFUJITSU LTD·Filed 1995·Granted Jul 28, 1998·25 cites·25 claims
- 1948US2010029084A1Pattern forming method and pattern forming deviceKOSHIBA TAKESHI·Filed 2009·Application pending·0 cites
- 2047US2010022036A1Method for forming pattern, and templateYONEDA IKUO·Filed 2008·Application pending·0 cites
- 2145US2014349219A1Exposure method, reflection type mask, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2243US2013220970A1Method for fabricating templateKOSHIBA TAKESHI·Filed 2012·Application pending·0 cites
- 2342US2014319700A1Semiconductor device and method of manufacturing sameTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2437US2011012297A1Pattern transfer methodKOBIKI AYUMI·Filed 2010·Application pending·0 cites
- 2536US2012009791A1Pattern formation methodZHANG YINGKANG·Filed 2011·Application pending·0 cites
- 2635US2011143271A1Pattern generating method and process determining methodKOSHIBA TAKESHI·Filed 2010·Application pending·0 cites
- 2734US2016260643A1Semiconductor device and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2834US2010187714A1Pattern generation method, recording medium, and pattern formation methodKOBIKI AYUMI·Filed 2010·Application pending·0 cites
- 2930US2011194751A1Pattern verification method, pattern generating method, device fabrication method, pattern verification program, and pattern verification systemTAKIMOTO MICHIYA·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →