Inventor · disambiguated record
Daniel P. Aubin
Also filed as: AUBIN DANIEL · AUBIN DANIEL P
16 granted patents·190 citations·filing 1992–1998
93Inventor score
Top patents by PatentIndex Score
16 records- 0177US5476750AMetal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresistsHOECHST CELANESE CORP·Filed 1992·Granted Dec 19, 1995·32 cites·7 claims
- 0275US5521052AMetal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefromHOECHST CELANESE CORP·Filed 1994·Granted May 28, 1996·39 cites·9 claims
- 0363US5688893AMethod of using a Lewis base to control molecular weight of novolak resinsHOECHST CELANESE CORP·Filed 1996·Granted Nov 18, 1997·18 cites·5 claims
- 0459US5739265AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromCLARIANT FINANCE BVI LTD·Filed 1995·Granted Apr 14, 1998·13 cites·20 claims
- 0556US5837417AQuinone diazide compositions containing low metals p-cresol oligomers and process of producing the compositionCLARIANT FINANCE BVI LTD·Filed 1994·Granted Nov 17, 1998·11 cites·9 claims
- 0653US5962183AMetal ion reduction in photoresist compositions by chelating ion exchange resinCLARIANT FINANCE BVI LTD·Filed 1995·Granted Oct 5, 1999·14 cites·9 claims
- 0753US5750632AIsolation of novolak resin by low temperature sub surface forced steam distillationCLARIANT FINANCE BVI LTD·Filed 1994·Granted May 12, 1998·9 cites·10 claims
- 0852US5665517AAcidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefromHOECHST CELANESE CORP·Filed 1996·Granted Sep 9, 1997·15 cites·8 claims
- 0948US5750031AProcess for producing surfactant having a low metal ion level and developer produced therefromCLARIANT FINANCE BVI LTD·Filed 1995·Granted May 12, 1998·11 cites·8 claims
- 1048US5693749AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromHOECHST CELANESE CORP·Filed 1995·Granted Dec 2, 1997·11 cites·23 claims
- 1141US5853947AQuinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetateCLARIANT FINANCE BVI LTD·Filed 1995·Granted Dec 29, 1998·7 cites·12 claims
- 1236US5656413ALow metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefromHOECHST CELANESE CORP·Filed 1995·Granted Aug 12, 1997·5 cites·19 claims
- 1335US5858627AImage formation utilizing photosensitive compositions containing low metal content p-cresol oligomersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Jan 12, 1999·3 cites·12 claims
- 1432US5976761AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromCLARIANT FINANCE BVI LTD·Filed 1998·Granted Nov 2, 1999·1 cites·8 claims
- 1532US5614349AUsing a Lewis base to control molecular weight of novolak resinsHOECHST CELANESE CORP·Filed 1992·Granted Mar 25, 1997·1 cites·6 claims
- 1630US6165675AIsolation of novolak resin by low temperature sub surface forced steam distillationCLARIANT FINANCE BVI LTD·Filed 1998·Granted Dec 26, 2000·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →