Inventor · disambiguated record
Geun-Young Yeom
Also filed as: YEOM GEUN Y · YEOM GEUN YOUNG
25 granted patents·28 pending applications·1,016 citations·filing 2000–2024
96Inventor score
Files withRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV17UNIV SUNGKYUNKWAN8UNIV SUNGKYUNKWAN FOUND6YEOM GEUN YOUNG4SAMSUNG ELECTRONICS CO LTD3
Top patents by PatentIndex Score
53 records- 0198US7799706B2Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the sameUNIV SUNGKYUNKWAN FOUND·Filed 2008·Granted Sep 21, 2010·420 cites·4 claims
- 0295US7919142B2Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the sameUNIV SUNGKYUNKWAN FOUND·Filed 2006·Granted Apr 5, 2011·426 cites·9 claims
- 0390US6818532B2Method of etching substratesORIOL INC·Filed 2002·Granted Nov 16, 2004·50 cites·47 claims
- 0485US9245752B2Method for etching atomic layer of grapheneUNIV SUNGKYUNKWAN RES & BUS·Filed 2014·Granted Jan 26, 2016·10 cites·20 claims
- 0583US10593819B2Semiconductor device, photoelectronic device, and method for manufacturing transition-metal dichalcogenide thin filmRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2018·Granted Mar 17, 2020·2 cites·8 claims
- 0682US12148626B2Dry etching method using potential control of grid and substrateRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2022·Granted Nov 19, 2024·1 cites·12 claims
- 0781US7012012B2Method of etching substratesLG ELECTRONICS INC·Filed 2004·Granted Mar 14, 2006·22 cites·20 claims
- 0881US6685523B2Method of fabricating capillary discharge plasma display panel using lift-off processPLASMION DISPLAYS LLC·Filed 2001·Granted Feb 3, 2004·17 cites·19 claims
- 0979US7220601B2Method of forming nano-sized MTJ cell without contact holeSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted May 22, 2007·7 cites·21 claims
- 1075US7842159B2Inductively coupled plasma processing apparatus for very large area using dual frequencyUNIV SUNGKYUNKWAN FOUND·Filed 2006·Granted Nov 30, 2010·4 cites·3 claims
- 1174US6926799B2Etching apparatus using neutral beamUNIV SUNGKYUNKWAN·Filed 2002·Granted Aug 9, 2005·19 cites·11 claims
- 1266US7397099B2Method of forming nano-sized MTJ cell without contact holeSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jul 8, 2008·2 cites·1 claims
- 1365US6933495B13-grid neutral beam source used for etching semiconductor deviceUNIV SUNGKYUNKWAN·Filed 2004·Granted Aug 23, 2005·14 cites·8 claims
- 1463US10916670B2Semiconductor device, photoelectronic device, and method for manufacturing transition-metal dichalcogenide thin filmRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2020·Granted Feb 9, 2021·0 cites·6 claims
- 1562US2024186126A1Monitoring system, apparatus, and method for determining maintenance cycle of processing chamberRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 1658US7094702B2Layer-by-layer etching apparatus using neutral beam and method of etching using the sameUNIV SUNGKYUNKWAN·Filed 2003·Granted Aug 22, 2006·6 cites·11 claims
- 1758US2024412979A1Method for dry etching using plasmaRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2024·Application pending·0 cites
- 1858US2024203747A1Isotropic eching method for two-dimensional semiconductor materialsRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 1956US7338577B2Inductively coupled plasma processing apparatus having internal linear antenna for large area processingSUNGKYUKWAN UNIVERSITY·Filed 2003·Granted Mar 4, 2008·4 cites·7 claims
- 2056US7060931B2Neutral beam source having electromagnet used for etching semiconductor deviceUNIV SUNGKYUNKWAN·Filed 2004·Granted Jun 13, 2006·7 cites·8 claims
- 2156US2007101938A1Inductively coupled plasma processing apparatus having internal linear antenna for large area processingUNIV SUNGKYUNKWAN·Filed 2006·Application pending·0 cites
- 2256US2025046581A1External magnetic field-coupled plasma atomic layer deposition device and atomic layer deposition methodRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2024·Application pending·0 cites
- 2356US2024096596A1Plasma etching method and plasma etching deviceRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 2456US2011162581A1Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the sameUNIV SUNGKYUNKWAN FOUND·Filed 2011·Application pending·0 cites
- 2555US6874443B2Layer-by-layer etching apparatus using neutral beam and etching method using the sameUNIV SUNGKYUNKWAN·Filed 2002·Granted Apr 5, 2005·5 cites·7 claims
- 2654US11424375B2Photoelectronic device, photodiode, and phototransistorRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2020·Granted Aug 23, 2022·0 cites·7 claims
- 2754US2024177972A1Method for etching atomic layerRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 2854US2025046629A1Ion beam etching apparatus, method for manufacturing semiconductor device using the same, and method for treating substrate using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2954US2024194448A1Atomic layer deposition device using multiple pulses to fill gap of semiconductor structure with high aspect ratio and atomic layer deposition method using the sameRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 3054US2024234146A9Method of manufacturing electronic device using cyclic doping process, and electronic device manufactured by the sameRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 3152US2025014868A1Etching plasma processing apparatus including consumable metal memberRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2023·Application pending·0 cites
- 3250US11127570B2Plasma source and plasma generation apparatus using the sameRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2018·Granted Sep 21, 2021·0 cites·10 claims
- 3350US2010117096A1Vertical structure semiconductor devices with improved light outputVERTICLE INC·Filed 2010·Application pending·0 cites
- 3448US2006006554A1Vertical structure semiconductor devices with improved light outputYOO MYUNG C·Filed 2005·Application pending·0 cites
- 3547US2023395386A1Etching processing apparatus and etching processing methodDAEJEON UNIV INDUSTRY UNIV COOPERATION FOUNDATION·Filed 2023·Application pending·0 cites
- 3647US2021384374A1Semiconductor light emitting device and method for manufacturing the sameRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2021·Application pending·0 cites
- 3746US8974630B2Inductively coupled plasma processing apparatus having internal linear antenna for large area processingYEOM GEUN-YOUNG·Filed 2008·Granted Mar 10, 2015·0 cites·8 claims
- 3846US8293069B2Inductively coupled plasma apparatusYEOM GEUN-YOUNG·Filed 2008·Granted Oct 23, 2012·0 cites·6 claims
- 3946US2009203221A1Apparatus and method for incorporating composition into substrate using neutral beamsUNIV SUNGKYUNKWAN FOUND·Filed 2008·Application pending·0 cites
- 4044US2008315188A1Apparatus and method for depositing thin filmHWANG TAE-HYUNG·Filed 2007·Application pending·0 cites
- 4142US2004016876A1Method of etching semiconductor device using neutral beam and apparatus for etching the sameFiled 2003·Application pending·0 cites
- 4239US10784082B2Apparatus for generating plasma and apparatus for treating substrate having the sameRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2019·Granted Sep 22, 2020·0 cites·13 claims
- 4339US2002060201A1Method of etching semiconductor device using neutral beam and apparatus for etching the sameFiled 2001·Application pending·0 cites
- 4439US2005199186A1Inductively coupled plasma apparatus using magnetic fieldUNIV SUNGKYUNKWAN·Filed 2004·Application pending·0 cites
- 4537US11120975B2Ion beam etching apparatusRESEARCH & BUSINESS FOUND SUNGKYUNKWAN UNIV·Filed 2018·Granted Sep 14, 2021·0 cites·13 claims
- 4637US2004060662A1Inductively coupled plasma processing apparatus having internal linear antenna for large area processingUNIV SUNGKYUNKWAN·Filed 2003·Application pending·0 cites
- 4735US2004182415A1Cleaning method of apparatus for manufacturing semiconductor deviceFiled 2004·Application pending·0 cites
- 4835US2002127942A1Method of fabricating capillary discharge plasma display panel using combination of laser and wet etchingsPLASMION DISPLAYS LLC·Filed 2001·Application pending·0 cites
- 4933US2012129347A1Apparatus and Method For Incorporating Composition Into Substrate Using Neutral BeamsYEOM GEUN-YOUNG·Filed 2011·Application pending·0 cites
- 5033US2013049592A1Method for controlling synchronization of pulsed plasma by applying dc powerYEOM GEUN YOUNG·Filed 2012·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →