Inventor · disambiguated record
Panya Wongsenakhum
Also filed as: WONGSENAKHUM PANYA
22 granted patents·10 pending applications·1,490 citations·filing 1998–2024
97Inventor score
Top patents by PatentIndex Score
32 records- 0198US7655567B1Methods for improving uniformity and resistivity of thin tungsten filmsNOVELLUS SYSTEMS INC·Filed 2007·Granted Feb 2, 2010·91 cites·14 claims
- 0298US7589017B2Methods for growing low-resistivity tungsten filmNOVELLUS SYSTEMS INC·Filed 2005·Granted Sep 15, 2009·103 cites·21 claims
- 0398US6692575B1Apparatus for supporting a substrate in a reaction chamberCVC PRODUCTS INC·Filed 2000·Granted Feb 17, 2004·565 cites·22 claims
- 0497US8048805B2Methods for growing low-resistivity tungsten filmNOVELLUS SYSTEMS INC·Filed 2009·Granted Nov 1, 2011·47 cites·18 claims
- 0597US7754604B2Reducing silicon attack and improving resistivity of tungsten nitride filmNOVELLUS SYSTEMS INC·Filed 2006·Granted Jul 13, 2010·56 cites·20 claims
- 0697US7141494B2Method for reducing tungsten film roughness and improving step coverageNOVELLUS SYSTEMS INC·Filed 2003·Granted Nov 28, 2006·147 cites·32 claims
- 0796US8101521B1Methods for improving uniformity and resistivity of thin tungsten filmsGAO JUWEN·Filed 2009·Granted Jan 24, 2012·61 cites·20 claims
- 0895US7262125B2Method of forming low-resistivity tungsten interconnectsNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 28, 2007·91 cites·32 claims
- 0995US6508197B1Apparatus for dispensing gas for fabricating substratesCVC PRODUCTS INC·Filed 2000·Granted Jan 21, 2003·70 cites·23 claims
- 1095US6190732B1Method and system for dispensing process gas for fabricating a device on a substrateCVC PRODUCTS INC·Filed 1998·Granted Feb 20, 2001·126 cites·24 claims
- 1192US9082589B2Hybrid impedance matching for inductively coupled plasma systemTHOMAS GEORGE·Filed 2012·Granted Jul 14, 2015·16 cites·17 claims
- 1292US6544341B1System for fabricating a device on a substrate with a process gasCVC PRODUCTS INC·Filed 2000·Granted Apr 8, 2003·41 cites·24 claims
- 1392US6274495B1Method for fabricating a device on a substrateCVC PRODUCTS INC·Filed 2000·Granted Aug 14, 2001·40 cites·23 claims
- 1490US9918376B2Hybrid impedance matching for inductively coupled plasma systemNOVELLUS SYSTEMS INC·Filed 2015·Granted Mar 13, 2018·9 cites·20 claims
- 1588US8262800B1Methods and apparatus for cleaning deposition reactorsWONGSENAKHUM PANYA·Filed 2008·Granted Sep 11, 2012·21 cites·23 claims
- 1683US12460294B2Heater design solutions for chemical delivery systemsLAM RES CORP·Filed 2021·Granted Nov 4, 2025·2 cites·20 claims
- 1780US10113232B2Azimuthal mixerLAM RES CORP·Filed 2015·Granted Oct 30, 2018·3 cites·21 claims
- 1877US2025137125A1Vapor accumulator for corrosive gases with purgingLAM RES CORP·Filed 2024·Application pending·0 cites
- 1967US10090174B2Apparatus for purging semiconductor process chamber slit valve openingLAM RES CORP·Filed 2016·Granted Oct 2, 2018·1 cites·23 claims
- 2061US2025146132A1Active temperature control of showerheads for high temperature processesLAM RES CORP·Filed 2022·Application pending·0 cites
- 2160US12227842B2Vapor accumulator for corrosive gases with purgingLAM RES CORP·Filed 2020·Granted Feb 18, 2025·0 cites·22 claims
- 2256US2024295026A1Hybrid showerhead with separate faceplate for high temperature processLAM RES CORP·Filed 2021·Application pending·0 cites
- 2355US2023383406A1Axially cooled metal showerheads for high temperature processesLAM RES CORP·Filed 2021·Application pending·0 cites
- 2454US10872787B2Apparatus for purging semiconductor process chamber slit valve openingLAM RES CORP·Filed 2018·Granted Dec 22, 2020·0 cites·9 claims
- 2553US12492469B2Sublimation control using downstream pressure sensingLAM RES CORP·Filed 2021·Granted Dec 9, 2025·0 cites·20 claims
- 2652US2024110279A1Atomic layer deposition with multiple uniformly heated charge volumesLAM RES CORP·Filed 2021·Application pending·0 cites
- 2751US2025305124A1In situ treatment of molybdenum oxyhalide byproducts in semiconductor processing equipmentLAM RES CORP·Filed 2023·Application pending·0 cites
- 2844US10132413B2Gas inlet valve with incompatible materials isolationLAM RES CORP·Filed 2016·Granted Nov 20, 2018·0 cites·21 claims
- 2941US2014069459A1Methods and apparatus for cleaning deposition chambersNOVELLUS SYSTEMS INC·Filed 2012·Application pending·0 cites
- 3040US2013000848A1Pedestal with edge gas deflector for edge profile controlNOVELLUS SYSTEMS INC·Filed 2012·Application pending·0 cites
- 3136US2017342562A1Vapor manifold with integrated vapor concentration sensorLAM RES CORP·Filed 2016·Application pending·0 cites
- 3235US2016343595A1Corrosion resistant gas distribution manifold with thermally controlled faceplateLAM RES CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →