Inventor · disambiguated record
Katsumasa Kawasaki
Also filed as: KAWASAKI KATSUMASA
19 granted patents·2 pending applications·351 citations·filing 2010–2023
94Inventor score
Top patents by PatentIndex Score
21 records- 0198US11694876B2Apparatus and method for delivering a plurality of waveform signals during plasma processingAPPLIED MATERIALS INC·Filed 2022·Granted Jul 4, 2023·10 cites·26 claims
- 0298US9872373B1Smart multi-level RF pulsing methodsAPPLIED MATERIALS INC·Filed 2017·Granted Jan 16, 2018·102 cites·20 claims
- 0397US9788405B2RF power delivery with approximated saw tooth wave pulsingAPPLIED MATERIALS INC·Filed 2015·Granted Oct 10, 2017·47 cites·20 claims
- 0497US9754767B2RF pulse reflection reduction for processing substratesAPPLIED MATERIALS INC·Filed 2016·Granted Sep 5, 2017·33 cites·20 claims
- 0596US9614524B1Automatic impedance tuning with RF dual level pulsingAPPLIED MATERIALS INC·Filed 2016·Granted Apr 4, 2017·25 cites·17 claims
- 0696US8962488B2Synchronized radio frequency pulsing for plasma etchingAPPLIED MATERIALS INC·Filed 2013·Granted Feb 24, 2015·30 cites·15 claims
- 0794US10593518B1Methods and apparatus for etching semiconductor structuresAPPLIED MATERIALS INC·Filed 2019·Granted Mar 17, 2020·9 cites·20 claims
- 0894US8404598B2Synchronized radio frequency pulsing for plasma etchingLIAO BRYAN·Filed 2010·Granted Mar 26, 2013·77 cites·20 claims
- 0987US9741539B2RF power delivery regulation for processing substratesAPPLIED MATERIALS INC·Filed 2015·Granted Aug 22, 2017·4 cites·15 claims
- 1087US9269587B2Methods for etching materials using synchronized RF pulsesAPPLIED MATERIALS INC·Filed 2013·Granted Feb 23, 2016·8 cites·19 claims
- 1186US10790126B2Smart RF pulsing tuning using variable frequency generatorsAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·3 cites·20 claims
- 1278US12482633B2Apparatus and method for delivering a plurality of waveform signals during plasma processingAPPLIED MATERIALS INC·Filed 2023·Granted Nov 25, 2025·0 cites·20 claims
- 1374US10468233B2RF power delivery regulation for processing substratesAPPLIED MATERIALS INC·Filed 2017·Granted Nov 5, 2019·1 cites·20 claims
- 1472US10424467B2Smart RF pulsing tuning using variable frequency generatorsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 24, 2019·1 cites·14 claims
- 1571US11164723B2Methods and apparatus for etching semiconductor structuresAPPLIED MATERIALS INC·Filed 2021·Granted Nov 2, 2021·0 cites·20 claims
- 1671US10854427B2Radio frequency (RF) pulsing impedance tuning with multiplier modeAPPLIED MATERIALS INC·Filed 2018·Granted Dec 1, 2020·1 cites·20 claims
- 1768US10930471B2Methods and apparatus for etching semiconductor structuresAPPLIED MATERIALS INC·Filed 2020·Granted Feb 23, 2021·0 cites·20 claims
- 1865US12046449B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Granted Jul 23, 2024·0 cites·20 claims
- 1945US12476081B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Granted Nov 18, 2025·0 cites·6 claims
- 2042US2014342570A1Etch process having adaptive control with etch depth of pressure and powerAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2134US2012000888A1Methods and apparatus for radio frequency (rf) plasma processingKAWASAKI KATSUMASA·Filed 2011·Application pending·0 cites
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