Inventor · disambiguated record
Harbans S. Sachdev
Also filed as: SACHDEV HARBANS · SACHDEV HARBANS S · SACHDEV HARBANS SINGH
28 granted patents·1,292 citations·filing 1980–2005
98Inventor score
Top patents by PatentIndex Score
28 records- 0194US4599243AUse of plasma polymerized organosilicon films in fabrication of lift-off masksIBM·Filed 1984·Granted Jul 8, 1986·73 cites·29 claims
- 0292US5114826APhotosensitive polyimide compositionsIBM·Filed 1989·Granted May 19, 1992·98 cites·23 claims
- 0392US4692205ASilicon-containing polyimides as oxygen etch stop and dual dielectric coatingsIBM·Filed 1986·Granted Sep 8, 1987·149 cites·14 claims
- 0491US5312717AResidue free vertical pattern transfer with top surface imaging resistsIBM·Filed 1992·Granted May 17, 1994·78 cites·4 claims
- 0591US4562091AUse of plasma polymerized orgaosilicon films in fabrication of lift-off masksIBM·Filed 1984·Granted Dec 31, 1985·55 cites·4 claims
- 0689US5422223ASilicon-containing positive resist and use in multilayer metal structuresIBM·Filed 1994·Granted Jun 6, 1995·50 cites·4 claims
- 0788US5385804ASilicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymerIBM·Filed 1992·Granted Jan 31, 1995·44 cites·3 claims
- 0888US4493855AUse of plasma polymerized organosilicon films in fabrication of lift-off masksIBM·Filed 1982·Granted Jan 15, 1985·48 cites·6 claims
- 0987US5094769ACompliant thermally conductive compoundIBM·Filed 1988·Granted Mar 10, 1992·76 cites·45 claims
- 1087US4519872AUse of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processesIBM·Filed 1984·Granted May 28, 1985·64 cites·24 claims
- 1184US5322765ADry developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Jun 21, 1994·47 cites·23 claims
- 1283US5338818ASilicon containing positive resist for DUV lithographyIBM·Filed 1992·Granted Aug 16, 1994·44 cites·4 claims
- 1383US5296332ACrosslinkable aqueous developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Mar 22, 1994·49 cites·24 claims
- 1483US4978594AFluorine-containing base layer for multi-layer resist processesIBM·Filed 1988·Granted Dec 18, 1990·39 cites·13 claims
- 1581US5976710ALow TCE polyimides as improved insulator in multilayer interconnect structuresIBM·Filed 1997·Granted Nov 2, 1999·72 cites·31 claims
- 1681US4826564AMethod of selective reactive ion etching of substratesIBM·Filed 1987·Granted May 2, 1989·33 cites·12 claims
- 1781US4772346AMethod of bonding inorganic particulate materialIBM·Filed 1987·Granted Sep 20, 1988·65 cites·18 claims
- 1878US5240812ATop coat for acid catalyzed resistsIBM·Filed 1991·Granted Aug 31, 1993·35 cites·8 claims
- 1977US5399462AMethod of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxaneIBM·Filed 1994·Granted Mar 21, 1995·33 cites·11 claims
- 2072US5213704AProcess for making a compliant thermally conductive compoundIBM·Filed 1991·Granted May 25, 1993·26 cites·6 claims
- 2172US4665006APositive resist system having high resistance to oxygen reactive ion etchingIBM·Filed 1985·Granted May 12, 1987·21 cites·13 claims
- 2270US6635118B2Aqueous cleaning of polymer apply equipmentIBM·Filed 2001·Granted Oct 21, 2003·16 cites·35 claims
- 2368US4525722AChemical heat amplification in thermal transfer printingIBM·Filed 1984·Granted Jun 25, 1985·25 cites·22 claims
- 2465US5115090AViscosity stable, essentially gel-free polyamic acid compositionsSACHDEV KRISHNA G·Filed 1990·Granted May 19, 1992·39 cites·13 claims
- 2560US7670961B2Reduction of cracking in low-k spin-on dielectric filmsNXP BV·Filed 2005·Granted Mar 2, 2010·3 cites·24 claims
- 2637US4371565AProcess for adhering an organic resin to a substrate by means of plasma polymerized phosphinesIBM·Filed 1981·Granted Feb 1, 1983·4 cites·5 claims
- 2736US4286989AFormulations for ink jet printingIBM·Filed 1980·Granted Sep 1, 1981·6 cites·7 claims
- 2828US6153696AProcess for forming carbonates of hydroxyaromatic compoundsIBM·Filed 1993·Granted Nov 28, 2000·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →