Inventor · disambiguated record
Takumi Toida
Also filed as: TOIDA TAKUMI
13 granted patents·9 pending applications·15 citations·filing 2015–2022
86Inventor score
Top patents by PatentIndex Score
22 records- 0186US10642156B2Resist base material, resist composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted May 5, 2020·2 cites·14 claims
- 0283US11572430B2Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2020·Granted Feb 7, 2023·1 cites·1 claims
- 0382US11243467B2Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 8, 2022·2 cites·13 claims
- 0478US11256170B2Compound, resist composition, and method for forming resist pattern using itMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Feb 22, 2022·2 cites·20 claims
- 0576US11480877B2Resist composition, method for forming resist pattern, and polyphenol compound used thereinMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 25, 2022·1 cites·21 claims
- 0675US11137686B2Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 5, 2021·2 cites·10 claims
- 0775US10747112B2Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Aug 18, 2020·2 cites·22 claims
- 0870US11143962B2Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Oct 12, 2021·1 cites·17 claims
- 0970US11130724B2Compound, resin, composition, resist pattern formation method, and circuit pattern formation methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Sep 28, 2021·1 cites·18 claims
- 1065US10437148B2Resist material, resist composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted Oct 8, 2019·1 cites·17 claims
- 1159US2025108037A1Composition containing ergothioneine for suppressing or preventing inner ear hearing lossMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1246US11911341B2Multilayer vessel, and application thereofMITSUBISHI GAS CHEMICAL CO·Filed 2017·Granted Feb 27, 2024·0 cites·26 claims
- 1345US2020262787A1Optical component forming composition and cured product thereofMITSUBISHI GAS CHEMICAL CO·Filed 2017·Application pending·0 cites
- 1442US10745372B2Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification methodMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted Aug 18, 2020·0 cites·11 claims
- 1542US2018081270A1Radiation-sensitive composition, amorphous film, and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 1641US2018284607A1Radiation-sensitive compositionMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 1738US2018029968A1Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method of compound or resinMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 1838US2020249573A1Composition for resist underlayer film formation, underlayer film for lithography, and pattern formation methodMITSUBISHI GAS CHEMICAL CO·Filed 2017·Application pending·0 cites
- 1936US2017059989A1Polymer compound, radiation sensitive composition and pattern forming methodA SCHOOL CORP KANSAI UNIV·Filed 2016·Application pending·0 cites
- 2036US2018074404A1Radiation-sensitive composition and method for forming resist patternMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 2133US11852970B2Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resinMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Dec 26, 2023·0 cites·11 claims
- 2231US2017058079A1Polymer compound, radiation sensitive composition and pattern forming methodA SCHOOL CORP KANSAI UNIV·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →