Inventor · disambiguated record
Robert Ditizio
Also filed as: DITIZIO ROBERT · DITIZIO ROBERT A · DITIZIO ROBERT ANTHONY
11 granted patents·4 pending applications·609 citations·filing 1998–2016
92Inventor score
Top patents by PatentIndex Score
15 records- 0197US9708707B2Nanolayer deposition using bias power treatmentDITIZIO ROBERT ANTHONY·Filed 2010·Granted Jul 18, 2017·464 cites·35 claims
- 0293US6006694APlasma reactor with a deposition shieldTEGAL CORP·Filed 1998·Granted Dec 28, 1999·60 cites·2 claims
- 0389US7645618B2Dry etch stop process for eliminating electrical shorting in MRAM device structuresTEGAL CORP·Filed 2007·Granted Jan 12, 2010·19 cites·64 claims
- 0487US7955870B2Dry etch stop process for eliminating electrical shorting in MRAM device structuresOEM GROUP INC·Filed 2009·Granted Jun 7, 2011·17 cites·37 claims
- 0581US9121098B2NanoLayer Deposition process for composite filmsDITIZIO ROBERT ANTHONY·Filed 2011·Granted Sep 1, 2015·2 cites·35 claims
- 0672US7169623B2System and method for processing a wafer including stop-on-aluminum processingTEGAL CORP·Filed 2004·Granted Jan 30, 2007·13 cites·85 claims
- 0772US6521081B2Deposition shield for a plasma reactorTEGAL CORP·Filed 2001·Granted Feb 18, 2003·9 cites·6 claims
- 0861US6170431B1Plasma reactor with a deposition shieldTEGAL CORP·Filed 1999·Granted Jan 9, 2001·10 cites·23 claims
- 0961US2012202353A1Nanolayer deposition using plasma treatmentDITIZIO ROBERT ANTHONY·Filed 2012·Application pending·0 cites
- 1059US6173674B1Plasma reactor with a deposition shieldTEGAL CORP·Filed 1999·Granted Jan 16, 2001·9 cites·26 claims
- 1151US6360686B1Plasma reactor with a deposition shieldTEGAL CORP·Filed 1999·Granted Mar 26, 2002·6 cites·24 claims
- 1248US2006186496A1System and method for processing a wafer including stop-on-alumina processingTEGAL CORP·Filed 2006·Application pending·0 cites
- 1339US2007026626A1Integrated decoupling capacitor processTEGAL CORP·Filed 2006·Application pending·0 cites
- 1436US10096473B2Formation of a layer on a semiconductor substrateAIXTRON SE·Filed 2016·Granted Oct 9, 2018·0 cites·1 claims
- 1535US2011207323A1Method of forming and patterning conformal insulation layer in vias and etched structuresDITIZIO ROBERT·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →