Inventor · disambiguated record
Naoto Noda
Also filed as: NODA NAOTO
13 granted patents·13 pending applications·7 citations·filing 2005–2025
84Inventor score
Files withSHINETSU CHEMICAL CO17AIR LIQUIDE4L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude2LAIR LIQUIDE SA POUR IETUDE ET IEXPLOITATION DES PRECEDES GEORGES CLAUDE1SAITOU RYUUICHI1
Top patents by PatentIndex Score
26 records- 0191US11155488B2Apparatus and method for manufacturing porous glass preform for optical fiberSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 26, 2021·3 cites·11 claims
- 0285US9633838B2Vapor deposition of silicon-containing films using penta-substituted disilanesL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2015·Granted Apr 25, 2017·4 cites·5 claims
- 0383US12509387B2Apparatus and method for producing porous glass preformSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 30, 2025·0 cites·3 claims
- 0482US11897807B2Manufacturing apparatus and manufacturing method of porous glass base material for optical fiberSHINETSU CHEMICAL CO·Filed 2022·Granted Feb 13, 2024·0 cites·6 claims
- 0578US2024294417A1Manufacturing method of porous glass base material for optical fiber and manufacturing apparatusSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 0677US11667557B2Apparatus and method for producing porous glass preformSHINETSU CHEMICAL CO·Filed 2021·Granted Jun 6, 2023·0 cites·13 claims
- 0777US2025388505A1Porous glass base material manufacturing apparatus, method for manufacturing porous glass base material, and method for manufacturing glass base material for optical fiberSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0872US12371364B2Porous glass base material manufacturing apparatus, method for manufacturing porous glass base material, and method for manufacturing glass base material for optical fiberSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 29, 2025·0 cites·5 claims
- 0972US12043564B2Manufacturing apparatus and manufacturing method of porous glass base material for optical fiberSHINETSU CHEMICAL CO·Filed 2022·Granted Jul 23, 2024·0 cites·6 claims
- 1071US2021395131A1Apparatus and method for manufacturing porous glass preform for optical fiberSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 1167US11999646B2Manufacturing method of porous glass base material for optical fiber and manufacturing apparatusSHINETSU CHEMICAL CO·Filed 2019·Granted Jun 4, 2024·0 cites·6 claims
- 1264US11427495B2Manufacturing apparatus and manufacturing method of porous glass base material for optical fiberSHINETSU CHEMICAL CO·Filed 2020·Granted Aug 30, 2022·0 cites·6 claims
- 1362US2024217857A1Porous glass base material manufacturing system and method for manufacturing glass base materialSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1462US2025376407A1Production method for porous glass preform, production method for transparent glass preform, and production apparatus for porous glass preformSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1561US2025216597A1Single mode optical fiberSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1658US11795098B2Manufacturing method of porous glass base material for optical fiberSHINETSU CHEMICAL CO·Filed 2021·Granted Oct 24, 2023·0 cites·4 claims
- 1758US2025326679A1Manufacturing method of optical fiber base materialSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1857US2022135461A1Manufacturing method and manufacturing apparatus of porous glass base materialSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 1954US2019027357A1Vapor disposition of silicon-containing films using penta-substituted disilanesAIR LIQUIDE·Filed 2018·Application pending·0 cites
- 2051US11482414B2Ultra-low temperature ALD to form high-quality Si-containing filmAIR LIQUIDE·Filed 2019·Granted Oct 25, 2022·0 cites·15 claims
- 2150US2017186597A1Vapor deposition of silicon-containing films using penta-substituted disilanesL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2017·Application pending·0 cites
- 2247US12368042B2Precursors and processes for deposition of Si-containing films using ALD at temperature of 550° C. or higherAIR LIQUIDE·Filed 2019·Granted Jul 22, 2025·0 cites·14 claims
- 2346US2006029734A1Film forming methodTRI CHEMICAL LAB INC·Filed 2005·Application pending·0 cites
- 2445US2018202042A1Alkylamino-substituted halocarbosilane precursorsAIR LIQUIDE·Filed 2016·Application pending·0 cites
- 2538US2019376187A1METHOD FOR FORMING Si-CONTAINING FILMLAIR LIQUIDE SA POUR IETUDE ET IEXPLOITATION DES PRECEDES GEORGES CLAUDE·Filed 2018·Application pending·0 cites
- 2630US8278471B2Method for producing ruthenium compoundSAITOU RYUUICHI·Filed 2011·Granted Oct 2, 2012·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →