Inventor · disambiguated record
Jenspeter Rau
Also filed as: RAU JENSPETER
7 granted patents·6 pending applications·36 citations·filing 2002–2023
81Inventor score
Files withINFINEON TECHNOLOGIES AG8FRESENIUS MEDICAL CARE DEUTSCHLAND GMBH2FRESENIUS MEDICAL CARE AG1FRESENIUS MEDICAL CARE AG & CO KGAA1HOLFELD CHRISTIAN1
Top patents by PatentIndex Score
13 records- 0183US7408646B2Method and apparatus for determining local variation of the reflection or transmission behavior over a mask surfaceINFINEON TECHNOLOGIES AG·Filed 2005·Granted Aug 5, 2008·8 cites·7 claims
- 0268US7090948B2Reflection mask and method for fabricating the reflection maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 15, 2006·11 cites·17 claims
- 0362US7029808B2Photosensitive coating material for a substrate and process for exposing the coated substrateINFINEON TECHNOLOGIES AG·Filed 2003·Granted Apr 18, 2006·6 cites·3 claims
- 0458US2025339592A1Blood treatment deviceFRESENIUS MEDICAL CARE AG·Filed 2023·Application pending·0 cites
- 0557US7229723B2Method for forming an opening in a light-absorbing layer on a maskINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jun 12, 2007·7 cites·12 claims
- 0651US6707123B2EUV reflection maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Mar 16, 2004·4 cites·5 claims
- 0750US2021322657A1Container and dialysis machine comprising a containerFRESENIUS MEDICAL CARE DEUTSCHLAND GMBH·Filed 2021·Application pending·0 cites
- 0844US2016243298A1Blood treatment apparatus with increased patient safety and methodFRESENIUS MEDICAL CARE DEUTSCHLAND GMBH·Filed 2014·Application pending·0 cites
- 0943US2023149609A1Holder for Lines of a Blood Treatment ApparatusFRESENIUS MEDICAL CARE AG & CO KGAA·Filed 2021·Application pending·0 cites
- 1039US7060399B2Reflective mirror for lithographic exposure and production methodINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jun 13, 2006·0 cites·8 claims
- 1133US2006147839A1Photosensitive coating material for a substrateINFINEON TECHNOLOGIES AG·Filed 2006·Application pending·0 cites
- 1231US2005244723A1Lithography mask for the fabrication of semiconductor componentsHOLFELD CHRISTIAN·Filed 2005·Application pending·0 cites
- 1330US7400379B2Apparatus for measuring an exposure intensity on a waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 15, 2008·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →