Inventor · disambiguated record
Hirohito Anze
Also filed as: ANZE HIROHITO
10 granted patents·3 pending applications·246 citations·filing 1996–2018
88Inventor score
Top patents by PatentIndex Score
13 records- 0193US5863682ACharged particle beam writing method for determining optimal exposure dose prior to pattern drawingTOSHIBA KK·Filed 1997·Granted Jan 26, 1999·107 cites·20 claims
- 0286US6313476B1Charged beam lithography systemTOSHIBA KK·Filed 1999·Granted Nov 6, 2001·56 cites·12 claims
- 0382US9147552B2Charged particle beam writing method and charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2014·Granted Sep 29, 2015·7 cites·18 claims
- 0479US5885747ACharged beam lithography methodTOSHIBA KK·Filed 1996·Granted Mar 23, 1999·63 cites·6 claims
- 0575US6346354B1Pattern writing methodTOSHIBA KK·Filed 2000·Granted Feb 12, 2002·12 cites·10 claims
- 0658US8133402B2Pattern forming method, charged particle beam writing apparatus, and recording medium on which program is recordedOHNISHI TAKAYUKI·Filed 2008·Granted Mar 13, 2012·1 cites·9 claims
- 0753US9581893B2Mask manufacturing method, mask substrate, and charged beam drawing methodNUFLARE TECHNOLOGY INC·Filed 2014·Granted Feb 28, 2017·0 cites·20 claims
- 0847US8367276B2Mask blank and method of manufacturing maskHOYA CORP·Filed 2008·Granted Feb 5, 2013·0 cites·15 claims
- 0942US2007243487A1Forming method of resist pattern and writing method of charged particle beamNUFLARE TECHNOLOGY INC·Filed 2007·Application pending·0 cites
- 1041US9633820B2Method for forming resist film and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2015·Granted Apr 25, 2017·0 cites·13 claims
- 1139US10256073B2Charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2018·Granted Apr 9, 2019·0 cites·8 claims
- 1238US2011186744A1Charged particle beam apparatus and methodNUFLARE TECHNOLOGY INC·Filed 2011·Application pending·0 cites
- 1336US2010178611A1Lithography method of electron beamNUFLARE TECHNOLOGY INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →