Inventor · disambiguated record
Cheng-Guo Chen
Also filed as: CHEN CHENG-GUO
23 granted patents·4 pending applications·69 citations·filing 2009–2022
94Inventor score
Top patents by PatentIndex Score
27 records- 0192US8895396B1Epitaxial Process of forming stress inducing epitaxial layers in source and drain regions of PMOS and NMOS structuresUNITED MICROELECTRONICS CORP·Filed 2013·Granted Nov 25, 2014·14 cites·18 claims
- 0287US8993384B2Semiconductor device and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Mar 31, 2015·7 cites·9 claims
- 0386US8981487B2Fin-shaped field-effect transistor (FinFET)UNITED MICROELECTRONICS CORP·Filed 2013·Granted Mar 17, 2015·7 cites·8 claims
- 0485US12278282B2High-electron mobility transistor and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2022·Granted Apr 15, 2025·1 cites·20 claims
- 0584US9960083B1Method for fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2016·Granted May 1, 2018·5 cites·10 claims
- 0684US9384962B2Oxygen treatment of replacement work-function metals in CMOS transistor gatesHWANG GUANG-YAW·Filed 2011·Granted Jul 5, 2016·7 cites·22 claims
- 0783US8003461B1Method of fabricating efuse structure, resistor sturcture and transistor sturctureUNITED MICROELECTRONICS CORP·Filed 2010·Granted Aug 23, 2011·7 cites·17 claims
- 0877US10276663B2Tunneling transistor and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2016·Granted Apr 30, 2019·3 cites·7 claims
- 0977US8802524B2Method of manufacturing semiconductor device having metal gatesLIAO PO-JUI·Filed 2011·Granted Aug 12, 2014·5 cites·20 claims
- 1076US8765591B2Semiconductor device having metal gate and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jul 1, 2014·3 cites·12 claims
- 1172US9184254B2Field-effect transistor and fabricating method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Nov 10, 2015·2 cites·13 claims
- 1270US8268712B2Method of forming metal gate structure and method of forming metal gate transistorHSU CHE-HUA·Filed 2010·Granted Sep 18, 2012·2 cites·20 claims
- 1369US10707305B2Method of fabricating tunneling transistorUNITED MICROELECTRONICS CORP·Filed 2019·Granted Jul 7, 2020·1 cites·6 claims
- 1463US9159798B2Replacement gate process and device manufactured using the sameUNITED MICROELECTRONICS CORP·Filed 2013·Granted Oct 13, 2015·1 cites·13 claims
- 1562US9070710B2Semiconductor processUNITED MICROELECTRONICS CORP·Filed 2013·Granted Jun 30, 2015·1 cites·20 claims
- 1662US8232152B2Removing method of a hard maskHSU CHE-HUA·Filed 2010·Granted Jul 31, 2012·2 cites·8 claims
- 1761US12283637B2MOS capacitor and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2022·Granted Apr 22, 2025·0 cites·7 claims
- 1861US8564063B2Semiconductor device having metal gate and manufacturing method thereofFU SSU-I·Filed 2010·Granted Oct 22, 2013·1 cites·7 claims
- 1954US2022181505A1Mos capacitor and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2021·Application pending·0 cites
- 2052US8252515B2Method for removing photoresistCHIEN CHIN-CHENG·Filed 2009·Granted Aug 28, 2012·0 cites·13 claims
- 2151US9318609B2Semiconductor device with epitaxial structureUNITED MICROELECTRONICS CORP·Filed 2015·Granted Apr 19, 2016·0 cites·10 claims
- 2251US9312352B2Field-effect transistor and fabricating method thereofUNITED MICROELECTRONICS CORP·Filed 2015·Granted Apr 12, 2016·0 cites·8 claims
- 2350US8492259B2Method of forming metal gate structureHSU CHE-HUA·Filed 2012·Granted Jul 23, 2013·0 cites·18 claims
- 2450US2014339652A1Semiconductor device with oxygen-containing metal gatesUNITED MICROELECTRONICS CORP·Filed 2014·Application pending·0 cites
- 2548US2015380506A1Replacement gate process and device manufactured using the sameUNITED MICROELECTRONICS CORP·Filed 2015·Application pending·0 cites
- 2638US8486842B2Method of selectively removing patterned hard maskHSU CHE-HUA·Filed 2010·Granted Jul 16, 2013·0 cites·16 claims
- 2737US2012142157A1Method of fabricating a semiconductor structureCHEN CHENG-GUO·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →