Inventor · disambiguated record
Damon F. Kvamme
Also filed as: KVAMME DAMON · KVAMME DAMON F · KVAMME DAMON FLOYD
30 granted patents·2 pending applications·1,644 citations·filing 1993–2023
97Inventor score
Top patents by PatentIndex Score
32 records- 0199US5572598AAutomated photomask inspection apparatusKLA INSTR CORP·Filed 1994·Granted Nov 5, 1996·294 cites·49 claims
- 0298US5563702AAutomated photomask inspection apparatus and methodKLA INSTR CORP·Filed 1994·Granted Oct 8, 1996·386 cites·41 claims
- 0397US7352457B2Multiple beam inspection apparatus and methodKLA TENCOR CORP·Filed 2006·Granted Apr 1, 2008·66 cites·21 claims
- 0497US6363166B1Automated photomask inspection apparatusKLA TENCOR CORP·Filed 2000·Granted Mar 26, 2002·94 cites·32 claims
- 0597US6052478AAutomated photomask inspection apparatusKLA TENCOR CORP·Filed 1996·Granted Apr 18, 2000·166 cites·46 claims
- 0696US7738093B2Methods for detecting and classifying defects on a reticleKLA TENCOR CORP·Filed 2008·Granted Jun 15, 2010·42 cites·21 claims
- 0796US5737072AAutomated photomask inspection apparatus and methodKLA INSTR CORP·Filed 1996·Granted Apr 7, 1998·221 cites·41 claims
- 0895US6636301B1Multiple beam inspection apparatus and methodKLA TENCOR CORP·Filed 2000·Granted Oct 21, 2003·113 cites·26 claims
- 0994US6879390B1Multiple beam inspection apparatus and methodKLA TENCOR TECH CORP·Filed 2000·Granted Apr 12, 2005·55 cites·43 claims
- 1092US5471372ALighting system for commercial refrigerator doorsARDCO INC·Filed 1993·Granted Nov 28, 1995·85 cites·29 claims
- 1191US9448343B2Segmented mirror apparatus for imaging and method of using the sameKLA TENCOR CORP·Filed 2013·Granted Sep 20, 2016·8 cites·23 claims
- 1288US8842272B2Apparatus for EUV imaging and methods of using sameWACK DANIEL C·Filed 2012·Granted Sep 23, 2014·9 cites·18 claims
- 1387US10168273B1Methods and apparatus for polarizing reticle inspectionKLA TENCOR CORP·Filed 2017·Granted Jan 1, 2019·5 cites·20 claims
- 1487US9574992B1Single wavelength ellipsometry with improved spot size capabilityKLA TENCOR CORP·Filed 2016·Granted Feb 21, 2017·5 cites·20 claims
- 1585US6727512B2Method and system for detecting phase defects in lithographic masks and semiconductor wafersKLA TENCOR TECH CORP·Filed 2002·Granted Apr 27, 2004·27 cites·43 claims
- 1684US7075638B2Multiple beam inspection apparatus and methodKLA TENOR TECHNOLOGIES CORP·Filed 2005·Granted Jul 11, 2006·10 cites·39 claims
- 1782US11733605B2EUV in-situ linearity calibration for TDI image sensors using test photomasksKLA CORP·Filed 2020·Granted Aug 22, 2023·1 cites·11 claims
- 1881US7292393B2Variable illuminator and speckle buster apparatusKLA TENCOR TECH CORP·Filed 2005·Granted Nov 6, 2007·11 cites·20 claims
- 1979US11112691B2Inspection system with non-circular pupilKLA TENCOR CORP·Filed 2019·Granted Sep 7, 2021·2 cites·36 claims
- 2077US2023341760A1EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test PhotomasksKLA CORP·Filed 2023·Application pending·0 cites
- 2174US6584218B2Automated photomask inspection apparatusKLA TENCOR CORP·Filed 2001·Granted Jun 24, 2003·8 cites·1 claims
- 2272US7486393B2Multiple beam inspection apparatus and methodKLA TENCOR·Filed 2007·Granted Feb 3, 2009·2 cites·19 claims
- 2371US6646281B1Differential detector coupled with defocus for improved phase defect sensitivityKLA TENCOR CORP·Filed 2002·Granted Nov 11, 2003·11 cites·39 claims
- 2465US9318870B2Deep ultra-violet light sources for wafer and reticle inspection systemsLEI GANG·Filed 2012·Granted Apr 19, 2016·2 cites·10 claims
- 2564US9625810B2Source multiplexing illumination for mask inspectionWANG DAIMIAN·Filed 2012·Granted Apr 18, 2017·1 cites·17 claims
- 2660US6952256B2Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pelliclesKLA TENCOR TECH CORP·Filed 2003·Granted Oct 4, 2005·3 cites·29 claims
- 2754US7926959B1Beam conditioning to reduce spatial coherenceKLA TENCOR CORP·Filed 2008·Granted Apr 19, 2011·1 cites·24 claims
- 2853US5394272AHigh-magnification wide-field-of-view telemicroscopic lens configurationGEN SCIENTIFIC CORP·Filed 1993·Granted Feb 28, 1995·16 cites·7 claims
- 2952US9046500B2Adaptable illuminating apparatus, system, and method for extreme ultra-violet lightKLA TENCOR CORP·Filed 2013·Granted Jun 2, 2015·0 cites·30 claims
- 3051US9151718B2Illumination system with time multiplexed sources for reticle inspectionKLA TENCOR CORP·Filed 2013·Granted Oct 6, 2015·0 cites·32 claims
- 3149US11624904B2Vapor as a protectant and lifetime extender in optical systemsKLA CORP·Filed 2019·Granted Apr 11, 2023·0 cites·12 claims
- 3238US2015192459A1Extreme ultra-violet (euv) inspection systemsKLA TENCOR CORP·Filed 2015·Application pending·0 cites
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