Inventor · disambiguated record
Kunihiro Hosono
Also filed as: HOSONO KUNIHIRO
15 granted patents·3 pending applications·359 citations·filing 1989–2005
94Inventor score
Top patents by PatentIndex Score
18 records- 0193US5093572AScanning electron microscope for observation of cross section and method of observing cross section employing the sameMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Mar 3, 1992·94 cites·16 claims
- 0286US6340543B1Photomask, manufacturing method thereof, and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jan 22, 2002·49 cites·16 claims
- 0382US5382484AMethod of correcting defects in the pattern of phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1993·Granted Jan 17, 1995·39 cites·20 claims
- 0477US5085957AMethod of repairing a maskMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Feb 4, 1992·31 cites·3 claims
- 0575US6620557B1Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Sep 16, 2003·18 cites·15 claims
- 0674US4887283AX-ray mask and exposure method employing the sameMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Dec 12, 1989·28 cites·21 claims
- 0772US5272116AMethod for pattern defect correction of a photomaskMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Dec 21, 1993·26 cites·15 claims
- 0870US5767974AApparatus and method for identifying photomask pattern defectsMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Jun 16, 1998·41 cites·6 claims
- 0968US5464713APhase shift mask and method for repairing a defect of a phase shift maskMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Nov 7, 1995·20 cites·15 claims
- 1063US6503852B2Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Jan 7, 2003·7 cites·13 claims
- 1153US6841314B2Method of manufacturing a photomaskRENESAS TECH CORP·Filed 2002·Granted Jan 11, 2005·3 cites·5 claims
- 1250US6433437B1Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Aug 13, 2002·2 cites·3 claims
- 1342US7001470B2Cleaning process for photomasksRENESAS TECH CORP·Filed 2002·Granted Feb 21, 2006·1 cites·3 claims
- 1442US2005274392A1Cleaning process for photomasksRENESAS TECH CORP·Filed 2005·Application pending·0 cites
- 1538US2005255389A1Phase shift mask and method of producing the sameRENESAS TECH CORP·Filed 2005·Application pending·0 cites
- 1637US6537709B2Photo mask having film formed from halftone material, method of manufacturing photo mask, and method of manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Mar 25, 2003·0 cites·12 claims
- 1736US6338923B1Photolithography mask having monitoring marks and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jan 15, 2002·0 cites·12 claims
- 1835US2004039584A1Method of selecting mask manufacturer of photomaskMITSUBISHI ELECTRIC CORP·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →