Inventor · disambiguated record
Kazuki Kasahara
Also filed as: KASAHARA KAZUKI
12 granted patents·12 pending applications·19 citations·filing 2010–2025
85Inventor score
Top patents by PatentIndex Score
24 records- 0187US8609319B2Radiation-sensitive resin composition and resist film formed using the sameKIMURA TORU·Filed 2011·Granted Dec 17, 2013·6 cites·17 claims
- 0282US8728706B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundASANO YUUSUKE·Filed 2012·Granted May 20, 2014·4 cites·7 claims
- 0378US9513548B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundJSR CORP·Filed 2014·Granted Dec 6, 2016·2 cites·12 claims
- 0474US2025321484A1Method for forming resist pattern and radiation-sensitive resin compositionJSR CORP·Filed 2025·Application pending·0 cites
- 0573US9104102B2Radiation-sensitive resin compositionMATSUDA YASUHIKO·Filed 2012·Granted Aug 11, 2015·2 cites·11 claims
- 0672US8968980B2Radiation-sensitive resin composition and compoundMARUYAMA KEN·Filed 2011·Granted Mar 3, 2015·2 cites·7 claims
- 0769US9046765B2Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist filmJSR CORP·Filed 2013·Granted Jun 2, 2015·2 cites·18 claims
- 0865US2025251662A1Radical scavenger additives for metal oxide based resists and precursor solutionsINPRIA CORP·Filed 2025·Application pending·0 cites
- 0963US12372869B2Method for forming resist pattern and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jul 29, 2025·0 cites·17 claims
- 1063US2024085785A1Additives for metal oxide photoresists, positive tone development with additives, and double bake double develop processingINPRIA CORP·Filed 2023·Application pending·0 cites
- 1162US9158196B2Radiation-sensitive resin composition and pattern-forming methodJSR CORP·Filed 2013·Granted Oct 13, 2015·1 cites·12 claims
- 1256US10048586B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundJSR CORP·Filed 2016·Granted Aug 14, 2018·0 cites·19 claims
- 1349US2021318613A9Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2020·Application pending·0 cites
- 1447US10108088B2Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2017·Granted Oct 23, 2018·0 cites·20 claims
- 1542US9329474B2Photoresist composition and resist pattern-forming methodJSR CORP·Filed 2013·Granted May 3, 2016·0 cites·15 claims
- 1641US10120277B2Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2017·Granted Nov 6, 2018·0 cites·20 claims
- 1741US2019094691A1Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2018·Application pending·0 cites
- 1841US2018356725A1Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2018·Application pending·0 cites
- 1940US2013095428A1Radiation-sensitive resin compositionJSR CORP·Filed 2012·Application pending·0 cites
- 2038US2012183902A1Radiation-sensitive resin compositionNAKAGAWA HIROKI·Filed 2011·Application pending·0 cites
- 2136US2019033713A1Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2018·Application pending·0 cites
- 2236US2011014569A1Radiation-sensitive resin composition and polymerJSR CORP·Filed 2010·Application pending·0 cites
- 2334US2011212401A1Radiation-sensitive resin composition, and resist pattern formation methodJSR CORP·Filed 2011·Application pending·0 cites
- 2434US2011223537A1Radiation-sensitive resin composition and polymerJSR CORP·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →