Inventor · disambiguated record
Alexander Kohl
Also filed as: KOHL ALEXANDER
30 granted patents·7 pending applications·319 citations·filing 2001–2018
97Inventor score
Top patents by PatentIndex Score
37 records- 0198US9599904B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 21, 2017·15 cites·20 claims
- 0295US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 0391US6580570B2Mounting apparatus for an optical elementZEISS STIFTUNG·Filed 2001·Granted Jun 17, 2003·60 cites·42 claims
- 0488US8467031B2Illumination system for illuminating a mask in a microlithographic exposure apparatusSCHUBERT ERICH·Filed 2010·Granted Jun 18, 2013·6 cites·28 claims
- 0588US7193794B2Adjustment arrangement of an optical elementZEISS CARL SMT AG·Filed 2004·Granted Mar 20, 2007·29 cites·110 claims
- 0688US6879379B2Projection lens and microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2003·Granted Apr 12, 2005·27 cites·51 claims
- 0787US9310694B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 12, 2016·3 cites·27 claims
- 0887US7710542B2Imaging device in a projection exposure machineZEISS CARL SMT AG·Filed 2007·Granted May 4, 2010·7 cites·23 claims
- 0986US7961294B2Imaging device in a projection exposure facilityZEISS CARL SMT GMBH·Filed 2008·Granted Jun 14, 2011·6 cites·21 claims
- 1084US7486382B2Imaging device in a projection exposure machineZEISS CARL SMT AG·Filed 2005·Granted Feb 3, 2009·8 cites·19 claims
- 1182US10191382B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jan 29, 2019·1 cites·18 claims
- 1282US6816325B1Mounting apparatus for an optical elementZEISS CARL SMT AG·Filed 2003·Granted Nov 9, 2004·26 cites·45 claims
- 1380US7027237B2Method for improving the imaging properties of at least two optical elements and photolithographic fabrication methodZEISS CARL SMT AG·Filed 2005·Granted Apr 11, 2006·9 cites·10 claims
- 1478US7304717B2Imaging device in a projection exposure facilityZEISS CARL SMT AG·Filed 2002·Granted Dec 4, 2007·12 cites·21 claims
- 1577US8085382B2Microlithographic projection exposure apparatus illumination opticsKOHL ALEXANDER·Filed 2007·Granted Dec 27, 2011·3 cites·76 claims
- 1673US9223226B2Microlithographic projection exposure apparatus illumination opticsKOHL ALEXANDER·Filed 2011·Granted Dec 29, 2015·1 cites·16 claims
- 1773US7079331B2Device for holding a beam splitter elementZEISS CARL SMT AG·Filed 2005·Granted Jul 18, 2006·7 cites·29 claims
- 1872US9052611B2Microlithographic projection exposure apparatus illumination opticsKOHL ALEXANDER·Filed 2011·Granted Jun 9, 2015·1 cites·32 claims
- 1971US6963449B2Method for improving the imaging properties of at least two optical elements and photolithographic fabrication methodZEISS CARL SMT AG·Filed 2004·Granted Nov 8, 2005·11 cites·10 claims
- 2067US6728021B1Optical component and method of inducing a desired alteration of an optical property thereinZEISS CARL SMT AG·Filed 2002·Granted Apr 27, 2004·8 cites·14 claims
- 2166US6943965B2Method for correcting oscillation-induced imaging errors in an objectiveZEISS CARL SMT AG·Filed 2003·Granted Sep 13, 2005·8 cites·24 claims
- 2264US7656595B2Adjustment arrangement of an optical elementZEISS CARL SMT AG·Filed 2008·Granted Feb 2, 2010·1 cites·27 claims
- 2362US9977333B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted May 22, 2018·0 cites·12 claims
- 2462US7457059B2Adjustment arrangement of an optical elementZEISS CARL SMT AG·Filed 2006·Granted Nov 25, 2008·2 cites·49 claims
- 2559US9470981B2Microlithographic projection exposure apparatus illumination opticsZEISS CARL SMT GMBH·Filed 2015·Granted Oct 18, 2016·0 cites·18 claims
- 2658US2009141258A1Imaging Device in a Projection Exposure MachineZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 2756US6842294B2Catadioptric objectiveZEISS CARL SMT AG·Filed 2002·Granted Jan 11, 2005·5 cites·2 claims
- 2852US2008100930A1Optical measuring system, and a projection objectiveZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 2952US2006146427A1Method for improving the imaging properties of at least two optical elements and photolithographic fabrication methodKURZ BIRGIT·Filed 2006·Application pending·0 cites
- 3050US8514371B2Imaging device in a projection exposure facilityHUMMEL WOLFGANG·Filed 2011·Granted Aug 20, 2013·0 cites·20 claims
- 3149US2005134967A1Projection lens and microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 3245US7170585B2Projection lens and microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jan 30, 2007·0 cites·29 claims
- 3341US2004257675A1Optical measuring system, and a projection objectiveZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 3440US2005286121A1Objective, especially a projection objective for microlithographyZEISS CARL SMT AG·Filed 2003·Application pending·0 cites
- 3540US2006012893A1Objective, in particular a projection objective in microlithographyWEBER ULRICH·Filed 2003·Application pending·0 cites
- 3639US7014328B2Apparatus for tilting a carrier for optical elementsZEISS CARL SMT AG·Filed 2002·Granted Mar 21, 2006·0 cites·33 claims
- 3735US7123427B2Objective, particularly a projection objective for use in semiconductor lithographyZEISS CARL SMT AG·Filed 2002·Granted Oct 17, 2006·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →