Inventor · disambiguated record
Manish Deopura
Also filed as: DEOPURA MANISH
8 granted patents·3 pending applications·289 citations·filing 2004–2016
90Inventor score
Top patents by PatentIndex Score
11 records- 0198US7704125B2Customized polishing pads for CMP and methods of fabrication and use thereofNEXPLANAR CORP·Filed 2005·Granted Apr 27, 2010·60 cites·32 claims
- 0297US10220487B2Customized polishing pads for CMP and methods of fabrication and use thereofNEXPLANAR CORP·Filed 2016·Granted Mar 5, 2019·15 cites·3 claims
- 0397US9278424B2Customized polishing pads for CMP and methods of fabrication and use thereofNEXPLANAR CORP·Filed 2014·Granted Mar 8, 2016·32 cites·21 claims
- 0495US8932116B2Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designsDEOPURA MANISH·Filed 2012·Granted Jan 13, 2015·28 cites·5 claims
- 0595US8715035B2Customized polishing pads for CMP and methods of fabrication and use thereofROY PRADIP K·Filed 2006·Granted May 6, 2014·42 cites·48 claims
- 0695US8287793B2Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designsDEOPURA MANISH·Filed 2007·Granted Oct 16, 2012·36 cites·11 claims
- 0791US8864859B2Customized polishing pads for CMP and methods of fabrication and use thereofROY PRADIP K·Filed 2007·Granted Oct 21, 2014·29 cites·25 claims
- 0889US7377840B2Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designsNEOPAD TECHNOLOGIES CORP·Filed 2004·Granted May 27, 2008·47 cites·7 claims
- 0958US2015093977A1Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designsDEOPURA MANISH·Filed 2014·Application pending·0 cites
- 1054US2011014482A1Ductile multilayer silicone resin filmsDOW CORNING·Filed 2007·Application pending·0 cites
- 1143US2006189269A1Customized polishing pads for CMP and methods of fabrication and use thereofROY PRADIP K·Filed 2005·Application pending·0 cites
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