Inventor · disambiguated record
Xiangxin Rui
Also filed as: RUI XIANGXIN
47 granted patents·13 pending applications·140 citations·filing 2009–2024
97Inventor score
Top patents by PatentIndex Score
60 records- 0196US11742362B2Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2021·Granted Aug 29, 2023·2 cites·14 claims
- 0295US8318572B1Inexpensive electrode materials to facilitate rutile phase titanium oxideSHANKER SUNIL·Filed 2010·Granted Nov 27, 2012·18 cites·26 claims
- 0392US9105646B2Methods for reproducible flash layer depositionINTERMOLECULAR INC·Filed 2012·Granted Aug 11, 2015·12 cites·15 claims
- 0491US8415657B2Enhanced work function layer supporting growth of rutile phase titanium oxideRUI XIANGXIN·Filed 2010·Granted Apr 9, 2013·13 cites·12 claims
- 0589US10697062B2Gas flow guide design for uniform flow distribution and efficient purgeAPPLIED MATERIALS INC·Filed 2018·Granted Jun 30, 2020·3 cites·19 claims
- 0689US7927947B2Methods for depositing high-K dielectricsINTERMOLECULAR INC·Filed 2009·Granted Apr 19, 2011·10 cites·20 claims
- 0788US8354702B1Inexpensive electrode materials to facilitate rutile phase titanium oxideELPIDA MEMORY INC·Filed 2010·Granted Jan 15, 2013·10 cites·20 claims
- 0887US9012298B2Methods for reproducible flash layer depositionINTERMOLECULAR INC·Filed 2012·Granted Apr 21, 2015·7 cites·12 claims
- 0986US2024347551A1Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1085US12080725B2Hybrid high-K dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2023·Granted Sep 3, 2024·0 cites·20 claims
- 1185US8546236B2High performance dielectric stack for DRAM capacitorINTERMOLECULAR INC·Filed 2013·Granted Oct 1, 2013·5 cites·19 claims
- 1284US8574998B2Leakage reduction in DRAM MIM capacitorsMALHOTRA SANDRA·Filed 2011·Granted Nov 5, 2013·7 cites·15 claims
- 1383US8581319B2Semiconductor stacks including catalytic layersINTERMOLECULAR INC·Filed 2013·Granted Nov 12, 2013·4 cites·17 claims
- 1483US8415227B2High performance dielectric stack for DRAM capacitorMALHOTRA SANDRA·Filed 2011·Granted Apr 9, 2013·5 cites·10 claims
- 1582US12148766B2High-K dielectric materials comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
- 1681US8809160B2Methods for forming high-K crystalline films and related devicesCHEN HANHONG·Filed 2011·Granted Aug 19, 2014·4 cites·20 claims
- 1780US8486780B2Doped electrode for dram applicationsRUI XIANGXIN·Filed 2011·Granted Jul 16, 2013·5 cites·17 claims
- 1879US8815695B2Methods to improve leakage for ZrO2 based high K MIM capacitorINTERMOLECULAR INC·Filed 2012·Granted Aug 26, 2014·4 cites·19 claims
- 1979US8476141B2High performance dielectric stack for DRAM capacitorINTERMOLECULAR INC·Filed 2013·Granted Jul 2, 2013·3 cites·9 claims
- 2078US8815677B2Method of processing MIM capacitors to reduce leakage currentCHEN HANHONG·Filed 2011·Granted Aug 26, 2014·5 cites·14 claims
- 2178US8766346B1Methods to improve leakage of high K materialsINTERMOLECULAR INC·Filed 2012·Granted Jul 1, 2014·4 cites·9 claims
- 2278US8541283B2High performance dielectric stack for DRAM capacitorINTERMOLECULAR INC·Filed 2013·Granted Sep 24, 2013·3 cites·20 claims
- 2376US11145683B2Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2017·Granted Oct 12, 2021·1 cites·11 claims
- 2476US8202808B2Methods of forming strontium titanate filmsMATZ LAURA M·Filed 2010·Granted Jun 19, 2012·3 cites·13 claims
- 2575US8541828B2Methods for depositing high-K dielectricsINTERMOLECULAR INC·Filed 2012·Granted Sep 24, 2013·2 cites·18 claims
- 2674US11894396B2High-K dielectric materials comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·20 claims
- 2774US10158098B2Encapsulating film stacks for OLED applicationsAPPLIED MATERIALS INC·Filed 2017·Granted Dec 18, 2018·1 cites·15 claims
- 2871US9178006B2Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applicationsINTERMOLECULAR INC·Filed 2014·Granted Nov 3, 2015·3 cites·16 claims
- 2970US9847511B2Encapsulating film stacks for OLED applicationsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 19, 2017·1 cites·11 claims
- 3067US11600642B2Layer stack for display applicationsAPPLIED MATERIALS INC·Filed 2021·Granted Mar 7, 2023·0 cites·20 claims
- 3166US8853049B2Single-sided non-noble metal electrode hybrid MIM stack for DRAM devicesDEWEERD WIM·Filed 2011·Granted Oct 7, 2014·2 cites·20 claims
- 3264US11664216B2ALD process and hardware with improved purge efficiencyAPPLIED MATERIALS INC·Filed 2021·Granted May 30, 2023·0 cites·20 claims
- 3364US9082782B2Inexpensive electrode materials to facilitate rutile phase titanium oxideINTERMOLECULAR INC·Filed 2012·Granted Jul 14, 2015·1 cites·16 claims
- 3463US8569819B1Doped electrodes for DRAM applicationsINTERMOLECULAR INC·Filed 2013·Granted Oct 29, 2013·1 cites·16 claims
- 3562US8846468B2Methods to improve leakage of high K materialsINTERMOLECULAR INC·Filed 2012·Granted Sep 30, 2014·1 cites·15 claims
- 3659US2018026055A1Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3758US11239258B2High-k dielectric materials comprising zirconium oxide utilized in display devicesAPPLIED MATERIALS INC·Filed 2017·Granted Feb 1, 2022·0 cites·9 claims
- 3857US2020083052A1High-k gate insulator for a thin-film transistorAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3956US10964533B2ALD process and hardware with improved purge efficiencyAPPLIED MATERIALS INC·Filed 2018·Granted Mar 30, 2021·0 cites·20 claims
- 4055US11049887B2Layer stack for display applicationsAPPLIED MATERIALS INC·Filed 2018·Granted Jun 29, 2021·0 cites·20 claims
- 4154US8975147B2Enhanced work function layer supporting growth of rutile phase titanium oxideINTERMOLECULAR INC·Filed 2012·Granted Mar 10, 2015·0 cites·19 claims
- 4253US8980744B2Inexpensive electrode materials to facilitate rutile phase titanium oxideINTERMOLECULAR INC·Filed 2012·Granted Mar 17, 2015·0 cites·20 claims
- 4352US10655222B2Thin film encapsulation processing system and process kitAPPLIED MATERIALS INC·Filed 2017·Granted May 19, 2020·0 cites·16 claims
- 4452US8574985B2Methods for depositing high-K dielectricsRUI XIANGXIN·Filed 2011·Granted Nov 5, 2013·0 cites·17 claims
- 4551US8574997B2Method of using a catalytic layer to enhance formation of a capacitor stackCHEN HANHONG·Filed 2011·Granted Nov 5, 2013·0 cites·18 claims
- 4651US2013059066A1Method of forming strontium titanate filmsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 4751US2013069202A1Electrode Treatments for Enhanced DRAM PerformanceINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 4851US2013071991A1Electrode Treatments for Enhanced DRAM PerformanceINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 4951US2019206691A1High-k gate insulator for a thin-film transistorAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 5049US10615368B2Encapsulating film stacks for OLED applications with desired profile controlAPPLIED MATERIALS INC·Filed 2018·Granted Apr 7, 2020·0 cites·19 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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