Inventor · disambiguated record
Michitaka Aita
Also filed as: AITA MICHITAKA
11 granted patents·4 pending applications·8 citations·filing 2013–2023
81Inventor score
Files withTOKYO ELECTRON LTD15
Top patents by PatentIndex Score
15 records- 0177US10665428B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted May 26, 2020·2 cites·5 claims
- 0277US9761418B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Sep 12, 2017·4 cites·5 claims
- 0363US10312057B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 4, 2019·1 cites·5 claims
- 0462US9574270B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Feb 21, 2017·1 cites·4 claims
- 0558US2024079208A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0648US12168825B2Film formation method and film formation deviceTOKYO ELECTRON LTD·Filed 2020·Granted Dec 17, 2024·0 cites·5 claims
- 0747US10815568B2Gas distribution device and processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 27, 2020·0 cites·9 claims
- 0845US10490443B2Selective film forming method and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2018·Granted Nov 26, 2019·0 cites·8 claims
- 0944US9646867B2Plasma processing apparatus, power supply unit and mounting table systemTOKYO ELECTRON LTD·Filed 2014·Granted May 9, 2017·0 cites·14 claims
- 1043US9343270B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 17, 2016·0 cites·9 claims
- 1139US9324542B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Apr 26, 2016·0 cites·4 claims
- 1237US2017358835A1Microwave plasma processing apparatus and microwave plasma processing methodTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1335US10504698B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Dec 10, 2019·0 cites·8 claims
- 1432US2016358756A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1531US2015294839A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →