Inventor · disambiguated record
Kazuhide Hasebe
Also filed as: HASEBE KAZUHIDE
97 granted patents·33 pending applications·3,208 citations·filing 1993–2025
99Inventor score
Top patents by PatentIndex Score
130 records- 0198US8722510B2Trench-filling method and film-forming systemWATANABE MASAHISA·Filed 2011·Granted May 13, 2014·489 cites·11 claims
- 0298US8357619B2Film formation method for forming silicon-containing insulating filmTOKYO ELECTRON LTD·Filed 2011·Granted Jan 22, 2013·49 cites·13 claims
- 0398US7923378B2Film formation method and apparatus for forming silicon-containing insulating filmTOKYO ELECTRON LTD·Filed 2009·Granted Apr 12, 2011·61 cites·18 claims
- 0498US7651730B2Method and apparatus for forming silicon oxide filmTOKYO ELECTRON LTD·Filed 2005·Granted Jan 26, 2010·90 cites·14 claims
- 0598US7648895B2Vertical CVD apparatus for forming silicon-germanium filmTOKYO ELECTRON LTD·Filed 2008·Granted Jan 19, 2010·337 cites·14 claims
- 0698US7507676B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2007·Granted Mar 24, 2009·79 cites·10 claims
- 0798US7462571B2Film formation method and apparatus for semiconductor process for forming a silicon nitride filmTOKYO ELECTRON LTD·Filed 2005·Granted Dec 9, 2008·91 cites·15 claims
- 0898US7351668B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2006·Granted Apr 1, 2008·96 cites·22 claims
- 0998US7300885B2Film formation apparatus and method for semiconductor processTOKYO ELECTRON LTD·Filed 2005·Granted Nov 27, 2007·91 cites·20 claims
- 1097US8945339B2Film formation apparatusKAKIMOTO AKINOBU·Filed 2011·Granted Feb 3, 2015·488 cites·8 claims
- 1197US8753984B2Method and apparatus for forming silicon nitride filmMURAKAMI HIROKI·Filed 2011·Granted Jun 17, 2014·35 cites·8 claims
- 1297US8431494B2Film formation method and film formation apparatusMURAKAMI HIROKI·Filed 2011·Granted Apr 30, 2013·21 cites·6 claims
- 1397US8080290B2Film formation method and apparatus for semiconductor processHASEBE KAZUHIDE·Filed 2009·Granted Dec 20, 2011·109 cites·12 claims
- 1497US7758920B2Method and apparatus for forming silicon-containing insulating filmTOKYO ELECTRON LTD·Filed 2006·Granted Jul 20, 2010·81 cites·18 claims
- 1596US8563096B2Vertical film formation apparatus and method for using sameMATSUNAGA MASANOBU·Filed 2010·Granted Oct 22, 2013·31 cites·13 claims
- 1696US8298628B2Low temperature deposition of silicon-containing filmsYANG LIU·Filed 2009·Granted Oct 30, 2012·58 cites·4 claims
- 1796US8257789B2Film formation method in vertical batch CVD apparatusMATSUNAGA MASANOBU·Filed 2009·Granted Sep 4, 2012·81 cites·14 claims
- 1896US8119544B2Film formation method and apparatus for semiconductor processHASEBE KAZUHIDE·Filed 2009·Granted Feb 21, 2012·130 cites·13 claims
- 1996US8034673B2Film formation method and apparatus for forming silicon-containing insulating film doped with metalTOKYO ELECTRON LTD·Filed 2009·Granted Oct 11, 2011·74 cites·17 claims
- 2096US7964241B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2007·Granted Jun 21, 2011·75 cites·10 claims
- 2196US7906168B2Film formation method and apparatus for forming silicon oxide filmTOKYO ELECTRON LTD·Filed 2007·Granted Mar 15, 2011·50 cites·10 claims
- 2294US8178448B2Film formation method and apparatus for semiconductor processNODERA NOBUTAKE·Filed 2010·Granted May 15, 2012·82 cites·16 claims
- 2393US8591989B2SiCN film formation method and apparatusCHOU PAO-HWA·Filed 2012·Granted Nov 26, 2013·15 cites·8 claims
- 2493US8426117B2Mask pattern forming method, fine pattern forming method, and film deposition apparatusHASEBE KAZUHIDE·Filed 2009·Granted Apr 23, 2013·12 cites·17 claims
- 2593US7416978B2Film forming method, film forming system and recording mediumTOKYO ELECTRON LTD·Filed 2005·Granted Aug 26, 2008·14 cites·9 claims
- 2691US9230799B2Method for fabricating semiconductor device and the semiconductor deviceTERAMOTO AKINOBU·Filed 2012·Granted Jan 5, 2016·14 cites·11 claims
- 2791US7220461B2Method and apparatus for forming silicon oxide filmTOKYO ELECTRON LTD·Filed 2004·Granted May 22, 2007·66 cites·11 claims
- 2890US10176992B2Mask pattern forming method, fine pattern forming method, and film deposition apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 8, 2019·5 cites·21 claims
- 2990US9865457B2Nitride film forming method using nitrading active speciesTOKYO ELECTRON LTD·Filed 2016·Granted Jan 9, 2018·6 cites·8 claims
- 3090US7604010B2Film formation apparatus and method of using the sameTOKYO ELECTRON LTD·Filed 2005·Granted Oct 20, 2009·13 cites·12 claims
- 3189US12288671B2Film deposition apparatus for fine pattern formingTOKYO ELECTRON LTD·Filed 2023·Granted Apr 29, 2025·0 cites·25 claims
- 3289US8946065B2Method of forming seed layer and method of forming silicon-containing thin filmTOKYO ELECTRON LTD·Filed 2012·Granted Feb 3, 2015·9 cites·21 claims
- 3389US7993705B2Film formation apparatus and method for using the sameTOKYO ELECTRON LTD·Filed 2007·Granted Aug 9, 2011·15 cites·14 claims
- 3488US11404271B2Film deposition apparatus for fine pattern formingTOKYO ELECTRON LTD·Filed 2018·Granted Aug 2, 2022·2 cites·100 claims
- 3588US10879066B2Mask pattern forming method, fine pattern forming method, and film deposition apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Dec 29, 2020·2 cites·10 claims
- 3688US8343594B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·8 cites·14 claims
- 3787US7713354B2Film forming method, film forming system and recording mediumTOKYO ELECTRON LTD·Filed 2008·Granted May 11, 2010·6 cites·6 claims
- 3886US7989354B2Patterning methodTOKYO ELECTRON LTD·Filed 2008·Granted Aug 2, 2011·9 cites·30 claims
- 3986US6599845B2Oxidizing method and oxidation systemTOKYO ELECTRON LTD·Filed 2001·Granted Jul 29, 2003·31 cites·10 claims
- 4086US2025226177A1Film deposition apparatus for fine pattern formingTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 4183US11881379B2Film deposition apparatus for fine pattern formingTOKYO ELECTRON LTD·Filed 2022·Granted Jan 23, 2024·0 cites·100 claims
- 4283US8025931B2Film formation apparatus for semiconductor process and method for using the sameTOKYO ELECTRON LTD·Filed 2007·Granted Sep 27, 2011·5 cites·12 claims
- 4383US7795158B2Oxidation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2007·Granted Sep 14, 2010·7 cites·11 claims
- 4482US8216648B2Film formation method and apparatusMATSUNAGA MASANOBU·Filed 2010·Granted Jul 10, 2012·6 cites·3 claims
- 4582US6344387B1Wafer boat and film formation methodTOKYO ELECTRON LTD·Filed 2000·Granted Feb 5, 2002·28 cites·12 claims
- 4681US6313047B2MOCVD method of tantalum oxide filmTOKYO ELECTRON LTD·Filed 2001·Granted Nov 6, 2001·27 cites·22 claims
- 4780US9758865B2Silicon film forming method, thin film forming method and cross-sectional shape control methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 12, 2017·4 cites·29 claims
- 4880US8168375B2Patterning methodNAKAJIMA SHIGERU·Filed 2008·Granted May 1, 2012·9 cites·25 claims
- 4979US8168270B2Film formation method and apparatus for semiconductor processHASEBE KAZUHIDE·Filed 2007·Granted May 1, 2012·3 cites·20 claims
- 5078US9263250B2Method and apparatus of forming silicon nitride filmTOKYO ELECTRON LTD·Filed 2014·Granted Feb 16, 2016·3 cites·16 claims
Showing the top 50 of 130 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →