Inventor · disambiguated record
John Trow
Also filed as: TROW JOHN · TROW JOHN R
27 granted patents·4 pending applications·3,884 citations·filing 1992–2004
98Inventor score
Files withAPPLIED MATERIALS INC28
Top patents by PatentIndex Score
31 records- 0198US6252354B1RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT controlAPPLIED MATERIALS INC·Filed 1996·Granted Jun 26, 2001·337 cites·72 claims
- 0298US6054013AParallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion densityAPPLIED MATERIALS INC·Filed 1996·Granted Apr 25, 2000·596 cites·19 claims
- 0398US5187454AElectronically tuned matching network using predictor-corrector control systemAPPLIED MATERIALS INC·Filed 1992·Granted Feb 16, 1993·165 cites·38 claims
- 0497US6518195B1Plasma reactor using inductive RF coupling, and processesAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·162 cites·8 claims
- 0597US5556501ASilicon scavenger in an inductively coupled RF plasma reactorAPPLIED MATERIALS INC·Filed 1993·Granted Sep 17, 1996·396 cites·15 claims
- 0696US6488807B1Magnetic confinement in a plasma reactor having an RF bias electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Dec 3, 2002·145 cites·6 claims
- 0796US6077384APlasma reactor having an inductive antenna coupling power through a parallel plate electrodeAPPLIED MATERIALS INC·Filed 1996·Granted Jun 20, 2000·237 cites·67 claims
- 0896US6074512AInductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·236 cites·101 claims
- 0995US6623596B1Plasma reactor having an inductive antenna coupling power through a parallel plate electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Sep 23, 2003·84 cites·136 claims
- 1095US5824607APlasma confinement for an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 1997·Granted Oct 20, 1998·144 cites·24 claims
- 1194US5346579AMagnetic field enhanced plasma processing chamberAPPLIED MATERIALS INC·Filed 1993·Granted Sep 13, 1994·96 cites·8 claims
- 1293US6545420B1Plasma reactor using inductive RF coupling, and processesAPPLIED MATERIALS INC·Filed 1995·Granted Apr 8, 2003·135 cites·13 claims
- 1393US6444085B1Inductively coupled RF plasma reactor having an antenna adjacent a window electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Sep 3, 2002·54 cites·59 claims
- 1493US6068784AProcess used in an RF coupled plasma reactorAPPLIED MATERIALS INC·Filed 1993·Granted May 30, 2000·173 cites·28 claims
- 1593US5350479AElectrostatic chuck for high power plasma processingAPPLIED MATERIALS INC·Filed 1992·Granted Sep 27, 1994·199 cites·32 claims
- 1692US6634313B2High-frequency electrostatically shielded toroidal plasma and radical sourceAPPLIED MATERIALS INC·Filed 2001·Granted Oct 21, 2003·42 cites·19 claims
- 1792US6251792B1Plasma etch processesAPPLIED MATERIALS INC·Filed 1997·Granted Jun 26, 2001·122 cites·18 claims
- 1892US6165311AInductively coupled RF plasma reactor having an overhead solenoidal antennaAPPLIED MATERIALS INC·Filed 1996·Granted Dec 26, 2000·98 cites·64 claims
- 1990US6524432B1Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion densityAPPLIED MATERIALS INC·Filed 2000·Granted Feb 25, 2003·49 cites·72 claims
- 2089US6736931B2Inductively coupled RF plasma reactor and plasma chamber enclosure structure thereforFiled 2001·Granted May 18, 2004·34 cites·24 claims
- 2189US6454898B1Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 2000·Granted Sep 24, 2002·43 cites·28 claims
- 2289US5349313AVariable RF power splitterAPPLIED MATERIALS INC·Filed 1993·Granted Sep 20, 1994·53 cites·15 claims
- 2384US5574410AElectronically tuned matching networks using adjustable inductance elements and resonant tank circuitsAPPLIED MATERIALS INC·Filed 1994·Granted Nov 12, 1996·66 cites·20 claims
- 2484US5392018AElectronically tuned matching networks using adjustable inductance elements and resonant tank circuitsAPPLIED MATERIALS INC·Filed 1992·Granted Feb 21, 1995·70 cites·7 claims
- 2582US5583737AElectrostatic chuck usable in high density plasmaAPPLIED MATERIALS INC·Filed 1995·Granted Dec 10, 1996·57 cites·14 claims
- 2679US5539609AElectrostatic chuck usable in high density plasmaAPPLIED MATERIALS INC·Filed 1993·Granted Jul 23, 1996·60 cites·15 claims
- 2771US5572170AElectronically tuned matching networks using adjustable inductance elements and resonant tank circuitsAPPLIED MATERIALS INC·Filed 1995·Granted Nov 5, 1996·31 cites·12 claims
- 2845US2004163764A1Inductively coupled RF plasma reactor and plasma chamber enclosure structure thereforAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2939US2004237897A1High-Frequency electrostatically shielded toroidal plasma and radical sourceFiled 2003·Application pending·0 cites
- 3036US2003029837A1Dielectric etch plasma chamber utilizing a magnetic filter to optimize plasma characteristicsAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 3130US2002004309A1Processes used in an inductively coupled plasma reactorFiled 1999·Application pending·0 cites
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