Inventor · disambiguated record
Brian Aegerter
Also filed as: AEGERTER BRIAN · AEGERTER BRIAN K
13 granted patents·12 pending applications·336 citations·filing 1999–2017
94Inventor score
Technology areasH10P
Top patents by PatentIndex Score
25 records- 0193US6632292B1Selective treatment of microelectronic workpiece surfacesSEMITOOL INC·Filed 2000·Granted Oct 14, 2003·62 cites·24 claims
- 0291US6423642B1Reactor for processing a semiconductor waferSEMITOOL INC·Filed 1999·Granted Jul 23, 2002·78 cites·38 claims
- 0385US7429537B2Methods and apparatus for rinsing and dryingSEMITOOL INC·Filed 2005·Granted Sep 30, 2008·11 cites·15 claims
- 0485US7399713B2Selective treatment of microelectric workpiece surfacesSEMITOOL INC·Filed 2003·Granted Jul 15, 2008·26 cites·42 claims
- 0585US6413436B1Selective treatment of the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Jul 2, 2002·61 cites·17 claims
- 0678US7102763B2Methods and apparatus for processing microelectronic workpieces using metrologySEMITOOL INC·Filed 2001·Granted Sep 5, 2006·22 cites·69 claims
- 0777US6794291B2Reactor for processing a semiconductor waferSEMITOOL INC·Filed 2002·Granted Sep 21, 2004·13 cites·26 claims
- 0876US6900132B2Single workpiece processing systemSEMITOOL INC·Filed 2003·Granted May 31, 2005·22 cites·26 claims
- 0975US6692613B2Reactor for processing a semiconductor waferSEMITOOL INC·Filed 2002·Granted Feb 17, 2004·11 cites·11 claims
- 1073US7337663B2Sonic energy process chamberSEMITOOL INC·Filed 2005·Granted Mar 4, 2008·4 cites·24 claims
- 1173US6447633B1Reactor for processing a semiconductor waferSEMITOOL INC·Filed 2000·Granted Sep 10, 2002·10 cites·39 claims
- 1269US10373864B2Systems and methods for wetting substratesAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·1 cites·19 claims
- 1367US6774056B2Sonic immersion process system and methodsSEMITOOL INC·Filed 2002·Granted Aug 10, 2004·15 cites·18 claims
- 1447US2005233589A1Processes for removing residue from a workpieceAEGERTER BRIAN K·Filed 2005·Application pending·0 cites
- 1547US2005217707A1Selective processing of microelectronic workpiece surfacesAEGERTER BRIAN K·Filed 2005·Application pending·0 cites
- 1645US2005032391A1Method for processing a semiconductor waferSEMITOOL INC·Filed 2004·Application pending·0 cites
- 1743US2008029123A1Sonic and chemical wafer processorAEGERTER BRIAN·Filed 2006·Application pending·0 cites
- 1841US2002144973A1Selective treatment of the surface of a microelectronic workpieceSEMITOOL INC·Filed 2002·Application pending·0 cites
- 1941US2002168863A1Selective treatment of the surface of a microelectronic workpieceSEMITOOL INC·Filed 2002·Application pending·0 cites
- 2041US2004035448A1Selective treatment of microelectronic workpiece surfacesFiled 2003·Application pending·0 cites
- 2140US2006118132A1Cleaning with electrically charged aerosolsBERGMAN ERIC J·Filed 2004·Application pending·0 cites
- 2240US2007000527A1Workpiece support for use in a process vessel and system for treating microelectronic workpiecesAEGERTER BRIAN K·Filed 2005·Application pending·0 cites
- 2340US2005034745A1Processing a workpiece with ozone and a halogenated additiveSEMITOOL INC·Filed 2004·Application pending·0 cites
- 2439US2005020001A1Selective treatment of the surface of a microelectronic workpieceFiled 2004·Application pending·0 cites
- 2534US2007193607A1Methods and apparatus for cleaning edges of a substrateGHEKIERE JOHN·Filed 2007·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →