Inventor · disambiguated record
Kenric Choi
Also filed as: CHOI KENRIC · CHOI KENRIC T
23 granted patents·12 pending applications·385 citations·filing 2005–2024
94Inventor score
Top patents by PatentIndex Score
35 records- 0197US7976631B2Multi-gas straight channel showerheadAPPLIED MATERIALS INC·Filed 2007·Granted Jul 12, 2011·247 cites·25 claims
- 0295US8343279B2Apparatuses for atomic layer depositionAPPLIED MATERIALS INC·Filed 2005·Granted Jan 1, 2013·26 cites·19 claims
- 0395US7794544B2Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD systemAPPLIED MATERIALS INC·Filed 2007·Granted Sep 14, 2010·49 cites·14 claims
- 0494US7775508B2Ampoule for liquid draw and vapor draw with a continuous level sensorAPPLIED MATERIALS INC·Filed 2006·Granted Aug 17, 2010·28 cites·23 claims
- 0592US12368024B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Jul 22, 2025·2 cites·17 claims
- 0687US8481118B2Multi-gas straight channel showerheadBURROWS BRIAN H·Filed 2011·Granted Jul 9, 2013·14 cites·9 claims
- 0783US9644267B2Multi-gas straight channel showerheadAPPLIED MATERIALS INC·Filed 2013·Granted May 9, 2017·6 cites·20 claims
- 0881US8137468B2Heated valve manifold for ampouleCHOI KENRIC T·Filed 2009·Granted Mar 20, 2012·7 cites·3 claims
- 0980US10752990B2Apparatus and methods to remove residual precursor inside gas lines post-depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 25, 2020·1 cites·16 claims
- 1079US12503766B2Vapor concentration sensors for process chambersAPPLIED MATERIALS INC·Filed 2023·Granted Dec 23, 2025·0 cites·16 claims
- 1179US9347696B2Compact ampoule thermal management systemAPPLIED MATERIALS INC·Filed 2013·Granted May 24, 2016·1 cites·19 claims
- 1278US12228534B2Capacitive sensor for monitoring gas concentrationAPPLIED MATERIALS INC·Filed 2024·Granted Feb 18, 2025·0 cites·19 claims
- 1377US9856561B2Auto-refill ampoule and methods of useAPPLIED MATERIALS INC·Filed 2015·Granted Jan 2, 2018·1 cites·16 claims
- 1469US11156494B2Continuous liquid level measurement detector for closed metal containersAPPLIED MATERIALS INC·Filed 2016·Granted Oct 26, 2021·1 cites·7 claims
- 1567US11628456B2Apparatus for increasing flux from an ampouleAPPLIED MATERIALS INC·Filed 2021·Granted Apr 18, 2023·0 cites·20 claims
- 1667US9279604B2Compact ampoule thermal management systemAPPLIED MATERIALS INC·Filed 2013·Granted Mar 8, 2016·0 cites·19 claims
- 1767US8309874B2Gas heaterHOU TAO·Filed 2008·Granted Nov 13, 2012·2 cites·2 claims
- 1866US11959868B2Capacitive sensor for monitoring gas concentrationAPPLIED MATERIALS INC·Filed 2021·Granted Apr 16, 2024·0 cites·9 claims
- 1965US2024360561A1Control of liquid delivery in auto-refill systemsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2063US11566327B2Methods and apparatus to reduce pressure fluctuations in an ampoule of a chemical delivery systemAPPLIED MATERIALS INC·Filed 2020·Granted Jan 31, 2023·0 cites·13 claims
- 2157US2010119734A1Laminar flow in a precursor source canisterAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2256US11059061B2Apparatus for increasing flux from an ampouleAPPLIED MATERIALS INC·Filed 2018·Granted Jul 13, 2021·0 cites·29 claims
- 2356US9766022B2Gas heaterHOU TAO·Filed 2012·Granted Sep 19, 2017·0 cites·20 claims
- 2456US2005252449A1Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD systemNGUYEN SON T·Filed 2005·Application pending·0 cites
- 2554US11753715B2Apparatus and methods for controlling concentration of precursors to processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Sep 12, 2023·0 cites·20 claims
- 2653US12084771B2Control of liquid delivery in auto-refill systemsAPPLIED MATERIALS INC·Filed 2021·Granted Sep 10, 2024·0 cites·11 claims
- 2752US2010215854A1Hvpe showerhead designBURROWS BRIAN H·Filed 2010·Application pending·0 cites
- 2850US2013019960A1Reactant Delivery System For ALD/CVD ProcessesAPPLIED MATERIALS INC·Filed 2012·Application pending·0 cites
- 2950US2008276860A1Cross flow apparatus and method for hydride vapor phase depositionBURROWS BRIAN H·Filed 2007·Application pending·0 cites
- 3047US2012135609A1Apparatus and Process for Atomic Layer DepositionYUDOVSKY JOSEPH·Filed 2010·Application pending·0 cites
- 3147US2008314311A1Hvpe showerhead designBURROWS BRIAN H·Filed 2007·Application pending·0 cites
- 3246US2012201959A1In-Situ Hydroxylation SystemCHOI KENRIC·Filed 2012·Application pending·0 cites
- 3343US2010305884A1Methods for determining the quantity of precursor in an ampouleAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3442US2009194026A1Processing system for fabricating compound nitride semiconductor devicesBURROWS BRIAN H·Filed 2008·Application pending·0 cites
- 3537US2013087099A1In-Situ Hydroxylation ApparatusCHOI KENRIC·Filed 2012·Application pending·0 cites
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