Inventor · disambiguated record
Mark Yam
Also filed as: YAM MARK
48 granted patents·7 pending applications·2,413 citations·filing 1994–2021
99Inventor score
Top patents by PatentIndex Score
55 records- 0198US7279721B2Dual wavelength thermal flux laser annealAPPLIED MATERIALS INC·Filed 2005·Granted Oct 9, 2007·46 cites·21 claims
- 0298US6151446AApparatus and method for thermally processing substrates including a processor using multiple detection signalsAPPLIED MATERIALS INC·Filed 1999·Granted Nov 21, 2000·443 cites·57 claims
- 0397US6987240B2Thermal flux processing by scanningAPPLIED MATERIALS INC·Filed 2002·Granted Jan 17, 2006·183 cites·45 claims
- 0496US7595208B2Method of laser annealing using two wavelengths of radiationAPPLIED MATERIALS INC·Filed 2007·Granted Sep 29, 2009·22 cites·20 claims
- 0594US8137465B1Single-chamber sequential curing of semiconductor wafersSHRINIVASAN KRISHNA·Filed 2005·Granted Mar 20, 2012·588 cites·32 claims
- 0694US5660472AMethod and apparatus for measuring substrate temperaturesAPPLIED MATERIALS INC·Filed 1994·Granted Aug 26, 1997·181 cites·28 claims
- 0792US8829393B2Scanned laser light sourceJENNINGS DEAN C·Filed 2012·Granted Sep 9, 2014·10 cites·8 claims
- 0890US8518838B2Method of thermal processing structures formed on a substrateCAREY PAUL·Filed 2012·Granted Aug 27, 2013·10 cites·20 claims
- 0990US5762419AMethod and apparatus for infrared pyrometer calibration in a thermal processing systemAPPLIED MATERIALS INC·Filed 1996·Granted Jun 9, 1998·81 cites·11 claims
- 1089US10857623B2Annealing apparatus using two wavelengths of radiationAPPLIED MATERIALS INC·Filed 2017·Granted Dec 8, 2020·2 cites·20 claims
- 1189US7772134B2Method of annealing using two wavelengths of continuous wave laser radiationAPPLIED MATERIALS INC·Filed 2009·Granted Aug 10, 2010·7 cites·18 claims
- 1289US5755511AMethod and apparatus for measuring substrate temperaturesAPPLIED MATERIALS INC·Filed 1996·Granted May 26, 1998·107 cites·17 claims
- 1388US8951348B1Single-chamber sequential curing of semiconductor wafersSHRINIVASAN KRISHNAN·Filed 2012·Granted Feb 10, 2015·8 cites·20 claims
- 1488US8242407B2Annealing apparatus using two wavelengths of continuous wave laser radiationJENNINGS DEAN·Filed 2010·Granted Aug 14, 2012·5 cites·20 claims
- 1588US7872209B2Thermal flux processing by scanning a focused line beamAPPLIED MATERIALS INC·Filed 2007·Granted Jan 18, 2011·8 cites·14 claims
- 1688US6406179B2Sensor for measuring a substrate temperatureAPPLIED MATERIALS INC·Filed 2001·Granted Jun 18, 2002·35 cites·8 claims
- 1787US9839976B2Annealing apparatus using two wavelengths of radiationAPPLIED MATERIALS INC·Filed 2014·Granted Dec 12, 2017·3 cites·13 claims
- 1887US7875829B2Thermal flux processing by scanning a focused line beamAPPLIED MATERIALS INC·Filed 2006·Granted Jan 25, 2011·7 cites·24 claims
- 1986US7569463B2Method of thermal processing structures formed on a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Aug 4, 2009·9 cites·25 claims
- 2086US5848842AMethod of calibrating a temperature measurement systemAPPLIED MATERIALS INC·Filed 1996·Granted Dec 15, 1998·76 cites·12 claims
- 2185US8907247B2Annealing apparatus using two wavelengths of laser radiationJENNINGS DEAN·Filed 2012·Granted Dec 9, 2014·3 cites·17 claims
- 2285US7078302B2Gate electrode dopant activation method for semiconductor manufacturing including a laser annealAPPLIED MATERIALS INC·Filed 2004·Granted Jul 18, 2006·28 cites·33 claims
- 2385US6183130B1Apparatus for substrate temperature measurement using a reflecting cavity and detectorAPPLIED MATERIALS INC·Filed 1998·Granted Feb 6, 2001·71 cites·28 claims
- 2485US6179466B1Method and apparatus for measuring substrate temperaturesAPPLIED MATERIALS INC·Filed 1998·Granted Jan 30, 2001·87 cites·24 claims
- 2581US7109087B2Absorber layer for DSA processingAPPLIED MATERIALS INC·Filed 2003·Granted Sep 19, 2006·20 cites·23 claims
- 2681US6179465B1Method and apparatus for infrared pyrometer calibration in a thermal processing system using multiple light sourcesAPPLIED MATERIALS INC·Filed 1997·Granted Jan 30, 2001·60 cites·15 claims
- 2781US5820261AMethod and apparatus for infrared pyrometer calibration in a rapid thermal processing systemAPPLIED MATERIALS INC·Filed 1995·Granted Oct 13, 1998·52 cites·26 claims
- 2880US8178819B2Thermal flux processing by scanning a focused line beamJENNINGS DEAN C·Filed 2005·Granted May 15, 2012·4 cites·16 claims
- 2980US7041931B2Stepped reflector plateAPPLIED MATERIALS INC·Filed 2002·Granted May 9, 2006·24 cites·32 claims
- 3080US6500266B1Heater temperature uniformity qualification toolAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·30 cites·25 claims
- 3178US6345909B1Apparatus for infrared pyrometer calibration in a thermal processing systemAPPLIED MATERIALS INC·Filed 1999·Granted Feb 12, 2002·39 cites·1 claims
- 3277US11945045B2Annealing apparatus using two wavelengths of radiationAPPLIED MATERIALS INC·Filed 2020·Granted Apr 2, 2024·0 cites·19 claims
- 3373US7611976B2Gate electrode dopant activation method for semiconductor manufacturingAPPLIED MATERIALS INC·Filed 2006·Granted Nov 3, 2009·3 cites·43 claims
- 3472US10141191B2Method of thermal processing structures formed on a substrateCAREY PAUL·Filed 2010·Granted Nov 27, 2018·2 cites·17 claims
- 3571US8288685B2Thermal flux processing by scanning a focused line beamJENNINGS DEAN C·Filed 2010·Granted Oct 16, 2012·1 cites·12 claims
- 3671US6226453B1Temperature probe with fiber optic coreAPPLIED MATERIALS INC·Filed 1997·Granted May 1, 2001·38 cites·20 claims
- 3771US6007241AApparatus and method for measuring substrate temperatureAPPLIED MATERIALS INC·Filed 1998·Granted Dec 28, 1999·36 cites·37 claims
- 3863US10840100B2Method of thermal processing structures formed on a substrateAPPLIED MATERIALS INC·Filed 2018·Granted Nov 17, 2020·0 cites·20 claims
- 3961US9737959B2Thermal processing by scanning a laser line beamAPPLIED MATERIALS INC·Filed 2014·Granted Aug 22, 2017·0 cites·17 claims
- 4060US8890024B2Annealing apparatus using two wavelengths of continuous wave laser radiationJENNINGS DEAN·Filed 2012·Granted Nov 18, 2014·0 cites·10 claims
- 4160US8653408B2Annealing apparatus using two wavelengths of continuous wave laser radiationJENNINGS DEAN·Filed 2012·Granted Feb 18, 2014·0 cites·18 claims
- 4259US8765618B2Annealing apparatus using two wavelengths of continuous wave laser radiationJENNINGS DEAN·Filed 2012·Granted Jul 1, 2014·0 cites·18 claims
- 4359US6056433AMethod and apparatus for infrared pyrometer calibration in a thermal processing systemAPPLIED MATERIALS INC·Filed 1998·Granted May 2, 2000·18 cites·17 claims
- 4459US5938335ASelf-calibrating temperature probeAPPLIED MATERIALS INC·Filed 1996·Granted Aug 17, 1999·23 cites·38 claims
- 4558US6086245AApparatus for infrared pyrometer calibration in a thermal processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Jul 11, 2000·19 cites·24 claims
- 4657US7262106B2Absorber layer for DSA processingAPPLIED MATERIALS INC·Filed 2004·Granted Aug 28, 2007·4 cites·29 claims
- 4756US6424880B1Multi-computer chamber control system, method and mediumAPPLIED MATERIALS INC·Filed 1999·Granted Jul 23, 2002·18 cites·24 claims
- 4855US2008230154A1Absorber layer for dsa processingAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4954US2007114214A1Scanning laser light sourceAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 5052US2006292808A1Absorber layer for dsa processingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
Showing the top 50 of 55 patent records by PatentIndex Score.
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